SU1446580A1 - Non-absorbing oxide-film component resistant to laser beams - Google Patents
Non-absorbing oxide-film component resistant to laser beams Download PDFInfo
- Publication number
- SU1446580A1 SU1446580A1 SU847773549A SU7773549A SU1446580A1 SU 1446580 A1 SU1446580 A1 SU 1446580A1 SU 847773549 A SU847773549 A SU 847773549A SU 7773549 A SU7773549 A SU 7773549A SU 1446580 A1 SU1446580 A1 SU 1446580A1
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- oxide
- metal
- layer
- resistant
- laser radiation
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- G02B1/105—
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Изобретение относитс к оптическому приборостроению и позвол ет повысить стойкость к лазерному излучение непоглощающих оксидно-пленочных элементов. Устойчивый к. воздействию лазерного излучени неабсорвирукнций оксидно-пленочный элемент состоит из подложки с нанесенным на нее слоем окисла металла, причем количество атомов кислорода, св занных в слое, на 2-8% больше, чем количество атомов кислорода, которое необходимо i дл сохранени стехиометрического соотношени кислород - металл оксидного соединени металла наивысшей валентности.The invention relates to optical instrument making and allows increasing the resistance to laser radiation of non-absorbing oxide-film elements. A non-absorptive oxide-film element that is resistant to laser radiation consists of a substrate with a layer of metal oxide deposited on it, with the number of oxygen atoms bound in the layer 2-8% more than the number of oxygen atoms i need to maintain stoichiometric The ratio of oxygen is the metal of the oxide compound of the metal of the highest valence.
Description
(Л(L
СWITH
рR
0000
Изобретение относитс к оптическому приборостроению, в частности к устойчивым к лазерному излучению непоглощакщим оксидно-пленочным эпементам, например, зеркал, фильтров и делителей излучени The invention relates to optical instrument making, in particular to laser radiation resistant non-absorbing oxide film films, for example, mirrors, filters and radiation dividers.
Известны неабсорбирующие оксидно- пле о чные элементы, устойчивые к воэдействию лазерного излучени , содержащие дополнитедьный слой оптической толщиной с низким показателем прелс 4лени , улучшающий стойкость к воздействию лазерного излучени Ш.Н Lowdermilk ei al. Thin Solid Films, 73, 19«0, c. 155),Nonabsorbing oxide-film elements that are resistant to laser radiation are known, which contain an additional layer of optical thickness with a low light intensity of 4 hr, which improves the resistance to the effects of laser radiation W. H Lowdermilk ei al. Thin Solid Films, 73, 19 “0, c. 155)
Эта конструкци свйзана со зкачи- тельньми затратами при изготовлении и контроле и обладает незначительной э44 ективндстью.This design is associated with accounting costs in the manufacture and control and has an insignificant efficiency.
Известен также устой 1ивый к зоз действию лазерного иэлучеш еаб- сорбирующий оксйдно-п1 «еночнйЕй опти- ческий элемент, состоедий по крайней мере из одного окисла металла, нанесённого на подлошсу (S«Ha Apfel В Thin Solid Films, 73, 1580, с. t67) It is also known to be resistant to the action of a laser and an effective absorbing oxide – 1 ен optical optical element consisting of at least one metal oxide deposited on the subthrax (S Ha Ha Apfel B Thin Solid Films, 73, 1580, p. t67)
Недостатками йзввстйой конструкции вл ютс ййзкие эксплуа-Гациокные качества, а также низка стойкость к воэдействш) лазерного излучени .The disadvantages of this design are low explosive properties, as well as low resistance to high-intensity laser radiation.
Цель изобретени - повышение стой Кости к воздействию лазерного иэлу- ени .The purpose of the invention is to increase the stability of Bones to the effects of laser and radiation.
Указанна цель достигаетс тем, что количество атомов кислорода .(Св занных в слое, на 2-8% больше, чемThis goal is achieved by the fact that the number of oxygen atoms (bound in a layer is 2–8% more than
количество атомов кислорода, которое необходимо дл сохранени стехиомет- рического соотношени кислород - ме- талл оксидного соединени металла наивысшей валентности.the amount of oxygen atoms that is necessary to maintain the stoichiometric oxygen-metal ratio of the oxide compound of the metal of the highest valence.
Устойчивый к воздействию лазерного изпуче и неабсорбирующий оксидно- пленочный оптический элемент состоитLaser-resistant and non-absorbing oxide-film optical element consists of
из одного сло TajOyCSb Oj SiOa нанесенного на подложку из Стекла, Количество атомов кислорода, св занных в слое, на 2% больше, чем это требуетс по стехиометрическому соотношению кислород - тантал (ниобий, кремний). Количество атомов кислорода , св занных в слое , на 8Z больше, ZrOj, - На 5% больше, чем это требуетс по стехида етрическому со отношению ,from one layer of TajOyCSb Oj SiOa deposited on a glass substrate, the number of oxygen atoms bound in the layer is 2% more than what is required by the stoichiometric ratio of oxygen to tantalum (niobium, silicon). The number of oxygen atoms bound in the layer is 8Z more, ZrOj, - 5% more than it is required for the ethylene stehide ratio,
Claims (1)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DD83255865A DD230651A3 (en) | 1983-10-21 | 1983-10-21 | LASER RADIATION-RESISTANT ABSORPTION-FREE OXIDIC LAYERING STOCK ELEMENT |
Publications (1)
Publication Number | Publication Date |
---|---|
SU1446580A1 true SU1446580A1 (en) | 1988-12-23 |
Family
ID=5551256
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SU847773549A SU1446580A1 (en) | 1983-10-21 | 1984-09-03 | Non-absorbing oxide-film component resistant to laser beams |
Country Status (4)
Country | Link |
---|---|
CH (1) | CH665292A5 (en) |
DD (1) | DD230651A3 (en) |
DE (1) | DE3430580C2 (en) |
SU (1) | SU1446580A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8800911A (en) * | 1987-09-30 | 1989-04-17 | Pelt & Hooykaas | OPTICAL ELEMENT FOR TREATING LIGHT, METHOD FOR MANUFACTURING SUCH OPTICAL ELEMENT AND SUCH OPTICAL ELEMENTS INCLUDING LASER SETUP. |
WO1998014801A1 (en) * | 1996-09-30 | 1998-04-09 | Corning Incorporated | Strengthened optical glass filter |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE970607C (en) * | 1950-09-27 | 1958-10-09 | Alois Vogt Dr | Mechanically and chemically resistant, hard, practically absorption-free and highly refractive, thin layer for optical purposes |
DE2658417A1 (en) * | 1976-12-23 | 1978-06-29 | Leybold Heraeus Gmbh & Co Kg | PROCESS FOR THE PRODUCTION OF ANTIREFLEX COATING ON POLYDIAETHYLENGLYCOL DIALLYLCARBONATE, OPTICAL BODIES PRODUCED BY THE PROCESS AND USE OF THE OPTICAL BODY |
-
1983
- 1983-10-21 DD DD83255865A patent/DD230651A3/en not_active IP Right Cessation
-
1984
- 1984-08-20 DE DE3430580A patent/DE3430580C2/en not_active Expired - Fee Related
- 1984-09-03 SU SU847773549A patent/SU1446580A1/en active
- 1984-10-19 CH CH5031/84A patent/CH665292A5/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE3430580C2 (en) | 1995-03-30 |
CH665292A5 (en) | 1988-04-29 |
DD230651A3 (en) | 1985-12-04 |
DE3430580A1 (en) | 1985-05-02 |
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