SU1446580A1 - Non-absorbing oxide-film component resistant to laser beams - Google Patents

Non-absorbing oxide-film component resistant to laser beams Download PDF

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Publication number
SU1446580A1
SU1446580A1 SU847773549A SU7773549A SU1446580A1 SU 1446580 A1 SU1446580 A1 SU 1446580A1 SU 847773549 A SU847773549 A SU 847773549A SU 7773549 A SU7773549 A SU 7773549A SU 1446580 A1 SU1446580 A1 SU 1446580A1
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SU
USSR - Soviet Union
Prior art keywords
oxide
metal
layer
resistant
laser radiation
Prior art date
Application number
SU847773549A
Other languages
Russian (ru)
Inventor
Гельмут Бернитский
Рейнхард Доле
Эрик Гаккер
Ганс Лаут
Юргень Мейер
Рейнхард Др.Вольф
Original Assignee
Феб Карл Цейсс Йена (Инопредприятие)
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Application filed by Феб Карл Цейсс Йена (Инопредприятие) filed Critical Феб Карл Цейсс Йена (Инопредприятие)
Application granted granted Critical
Publication of SU1446580A1 publication Critical patent/SU1446580A1/en

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • G02B1/105—
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

Изобретение относитс  к оптическому приборостроению и позвол ет повысить стойкость к лазерному излучение непоглощающих оксидно-пленочных элементов. Устойчивый к. воздействию лазерного излучени  неабсорвирукнций оксидно-пленочный элемент состоит из подложки с нанесенным на нее слоем окисла металла, причем количество атомов кислорода, св занных в слое, на 2-8% больше, чем количество атомов кислорода, которое необходимо i дл  сохранени  стехиометрического соотношени  кислород - металл оксидного соединени  металла наивысшей валентности.The invention relates to optical instrument making and allows increasing the resistance to laser radiation of non-absorbing oxide-film elements. A non-absorptive oxide-film element that is resistant to laser radiation consists of a substrate with a layer of metal oxide deposited on it, with the number of oxygen atoms bound in the layer 2-8% more than the number of oxygen atoms i need to maintain stoichiometric The ratio of oxygen is the metal of the oxide compound of the metal of the highest valence.

Description

(Л(L

СWITH

рR

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Изобретение относитс  к оптическому приборостроению, в частности к устойчивым к лазерному излучению непоглощакщим оксидно-пленочным эпементам, например, зеркал, фильтров и делителей излучени The invention relates to optical instrument making, in particular to laser radiation resistant non-absorbing oxide film films, for example, mirrors, filters and radiation dividers.

Известны неабсорбирующие оксидно- пле о чные элементы, устойчивые к воэдействию лазерного излучени , содержащие дополнитедьный слой оптической толщиной с низким показателем прелс 4лени , улучшающий стойкость к воздействию лазерного излучени  Ш.Н Lowdermilk ei al. Thin Solid Films, 73, 19«0, c. 155),Nonabsorbing oxide-film elements that are resistant to laser radiation are known, which contain an additional layer of optical thickness with a low light intensity of 4 hr, which improves the resistance to the effects of laser radiation W. H Lowdermilk ei al. Thin Solid Films, 73, 19 “0, c. 155)

Эта конструкци  свйзана со зкачи- тельньми затратами при изготовлении и контроле и обладает незначительной э44 ективндстью.This design is associated with accounting costs in the manufacture and control and has an insignificant efficiency.

Известен также устой 1ивый к зоз действию лазерного иэлучеш    еаб- сорбирующий оксйдно-п1 «еночнйЕй опти- ческий элемент, состоедий по крайней мере из одного окисла металла, нанесённого на подлошсу (S«Ha Apfel В Thin Solid Films, 73, 1580, с. t67) It is also known to be resistant to the action of a laser and an effective absorbing oxide – 1 ен optical optical element consisting of at least one metal oxide deposited on the subthrax (S Ha Ha Apfel B Thin Solid Films, 73, 1580, p. t67)

Недостатками йзввстйой конструкции  вл ютс  ййзкие эксплуа-Гациокные качества, а также низка  стойкость к воэдействш) лазерного излучени .The disadvantages of this design are low explosive properties, as well as low resistance to high-intensity laser radiation.

Цель изобретени  - повышение стой Кости к воздействию лазерного иэлу- ени .The purpose of the invention is to increase the stability of Bones to the effects of laser and radiation.

Указанна  цель достигаетс  тем, что количество атомов кислорода .(Св занных в слое, на 2-8% больше, чемThis goal is achieved by the fact that the number of oxygen atoms (bound in a layer is 2–8% more than

количество атомов кислорода, которое необходимо дл  сохранени  стехиомет- рического соотношени  кислород - ме- талл оксидного соединени  металла наивысшей валентности.the amount of oxygen atoms that is necessary to maintain the stoichiometric oxygen-metal ratio of the oxide compound of the metal of the highest valence.

Устойчивый к воздействию лазерного изпуче и  неабсорбирующий оксидно- пленочный оптический элемент состоитLaser-resistant and non-absorbing oxide-film optical element consists of

из одного сло  TajOyCSb Oj SiOa нанесенного на подложку из Стекла, Количество атомов кислорода, св занных в слое, на 2% больше, чем это требуетс  по стехиометрическому соотношению кислород - тантал (ниобий, кремний). Количество атомов кислорода , св занных в слое , на 8Z больше, ZrOj, - На 5% больше, чем это требуетс  по стехида етрическому со отношению ,from one layer of TajOyCSb Oj SiOa deposited on a glass substrate, the number of oxygen atoms bound in the layer is 2% more than what is required by the stoichiometric ratio of oxygen to tantalum (niobium, silicon). The number of oxygen atoms bound in the layer is 8Z more, ZrOj, - 5% more than it is required for the ethylene stehide ratio,

Claims (1)

Формула изобретени Invention Formula Устойчивый к воздействию лазерао- го излучени  неабсорбирующий оксидно- пленочный элемент, состо щий пи крайней мере из одного сло  окисла металла , нанесенного на подложку, о т л н- чающийс  тем, что, с цезхью повьшени  стойкости к воздействио лазерного излучени , количество ато- мое кислорода, св занных s слое, на 2-8% больше, чем количество атомов кислорода, которое необходимо дл  сохранени  стехиометрического соотношени  кислород - металл оксидного соединени  металла наивысшей валентности .. ,A laser-resistant, non-absorbing oxide-film element, consisting of at least one layer of metal oxide deposited on a substrate, is due to the fact that the amount of resistance to laser radiation is higher than that of the laser radiation. my oxygen bound by the s layer is 2-8% more than the number of oxygen atoms that is needed to maintain the stoichiometric oxygen-metal ratio of the oxide compound of the highest valence metal ..,
SU847773549A 1983-10-21 1984-09-03 Non-absorbing oxide-film component resistant to laser beams SU1446580A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD83255865A DD230651A3 (en) 1983-10-21 1983-10-21 LASER RADIATION-RESISTANT ABSORPTION-FREE OXIDIC LAYERING STOCK ELEMENT

Publications (1)

Publication Number Publication Date
SU1446580A1 true SU1446580A1 (en) 1988-12-23

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ID=5551256

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SU847773549A SU1446580A1 (en) 1983-10-21 1984-09-03 Non-absorbing oxide-film component resistant to laser beams

Country Status (4)

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CH (1) CH665292A5 (en)
DD (1) DD230651A3 (en)
DE (1) DE3430580C2 (en)
SU (1) SU1446580A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8800911A (en) * 1987-09-30 1989-04-17 Pelt & Hooykaas OPTICAL ELEMENT FOR TREATING LIGHT, METHOD FOR MANUFACTURING SUCH OPTICAL ELEMENT AND SUCH OPTICAL ELEMENTS INCLUDING LASER SETUP.
WO1998014801A1 (en) * 1996-09-30 1998-04-09 Corning Incorporated Strengthened optical glass filter

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE970607C (en) * 1950-09-27 1958-10-09 Alois Vogt Dr Mechanically and chemically resistant, hard, practically absorption-free and highly refractive, thin layer for optical purposes
DE2658417A1 (en) * 1976-12-23 1978-06-29 Leybold Heraeus Gmbh & Co Kg PROCESS FOR THE PRODUCTION OF ANTIREFLEX COATING ON POLYDIAETHYLENGLYCOL DIALLYLCARBONATE, OPTICAL BODIES PRODUCED BY THE PROCESS AND USE OF THE OPTICAL BODY

Also Published As

Publication number Publication date
DE3430580C2 (en) 1995-03-30
CH665292A5 (en) 1988-04-29
DD230651A3 (en) 1985-12-04
DE3430580A1 (en) 1985-05-02

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