SG47806A1 - Treatment apparatus - Google Patents

Treatment apparatus

Info

Publication number
SG47806A1
SG47806A1 SG1996004460A SG1996004460A SG47806A1 SG 47806 A1 SG47806 A1 SG 47806A1 SG 1996004460 A SG1996004460 A SG 1996004460A SG 1996004460 A SG1996004460 A SG 1996004460A SG 47806 A1 SG47806 A1 SG 47806A1
Authority
SG
Singapore
Prior art keywords
treatment apparatus
treatment
Prior art date
Application number
SG1996004460A
Inventor
Hiroyuki Iwai
Ryotchi Okura
Takanobu Asano
Tamotsu Tanifuji
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of SG47806A1 publication Critical patent/SG47806A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769—Storage means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Warehouses Or Storage Devices (AREA)
SG1996004460A 1993-12-03 1994-06-06 Treatment apparatus SG47806A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33952993A JP3543987B2 (en) 1993-12-03 1993-12-03 Processing equipment

Publications (1)

Publication Number Publication Date
SG47806A1 true SG47806A1 (en) 1998-04-17

Family

ID=18328346

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996004460A SG47806A1 (en) 1993-12-03 1994-06-06 Treatment apparatus

Country Status (3)

Country Link
JP (1) JP3543987B2 (en)
GB (1) GB2284706B (en)
SG (1) SG47806A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100203782B1 (en) * 1996-09-05 1999-06-15 윤종용 Heat treatment apparatus for semiconductor wafer
KR100403663B1 (en) 1999-07-14 2003-10-30 동경 엘렉트론 주식회사 Open/close device for open/close lid of untreated object storing box and treating system for untreated object
KR100745867B1 (en) 2000-08-23 2007-08-02 동경 엘렉트론 주식회사 Vertical heat treatment system and method for transferring object to be treated
FR2902235B1 (en) * 2006-06-09 2008-10-31 Alcatel Sa DEVICE FOR TRANSPORTING, STORING AND TRANSFERRING SUBSTRATES
JP4884180B2 (en) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 Substrate processing apparatus and substrate processing method
JP5277572B2 (en) * 2007-06-26 2013-08-28 大日本印刷株式会社 Plate-like material storage and transfer system and plate-like material storage and transfer method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5254170A (en) * 1989-08-07 1993-10-19 Asm Vt, Inc. Enhanced vertical thermal reactor system
US5766360A (en) * 1992-03-27 1998-06-16 Kabushiki Kaisha Toshiba Substrate processing apparatus and substrate processing method

Also Published As

Publication number Publication date
JP3543987B2 (en) 2004-07-21
GB9411291D0 (en) 1994-07-27
JPH07161797A (en) 1995-06-23
GB2284706A (en) 1995-06-14
GB2284706B (en) 1997-07-09

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