SG178675A1 - A lithographic apparatus and device manufacturing method - Google Patents

A lithographic apparatus and device manufacturing method Download PDF

Info

Publication number: SG178675A1
Authority: SG; Singapore
Prior art keywords: mark; emitter; outlet; sensor; lithographic apparatus
Prior art date: 2010-08-24

Application number

SG2011057411A

Other languages

English (en)

Inventor

Jan Steven Christiaan Westerlaken

Der Pasch Engelbertus Antonius Fransiscus Van

Peter Paul Steijaert

De Mast Franciscus Van

Gerardus Arnoldus Hendricus Franciscus Janssen

Original Assignee

Asml Netherlands Bv

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2010-08-24

Filing date

2011-08-10

Publication date

2012-03-29

2011-08-10 Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv

2012-03-29 Publication of SG178675A1 publication Critical patent/SG178675A1/en

Links

238000004519 manufacturing process Methods 0.000 title claims description 13
239000012530 fluid Substances 0.000 claims abstract description 69
230000001143 conditioned effect Effects 0.000 claims abstract description 28
239000000758 substrate Substances 0.000 claims description 135
239000007788 liquid Substances 0.000 claims description 130
230000005855 radiation Effects 0.000 claims description 57
238000007654 immersion Methods 0.000 claims description 30
239000007789 gas Substances 0.000 description 105
238000000059 patterning Methods 0.000 description 28
230000004888 barrier function Effects 0.000 description 15
230000033001 locomotion Effects 0.000 description 14
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238000000671 immersion lithography Methods 0.000 description 3
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230000005499 meniscus Effects 0.000 description 3
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239000010409 thin film Substances 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
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239000010453 quartz Substances 0.000 description 2
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VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
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238000012546 transfer Methods 0.000 description 2
239000004215 Carbon black (E152) Substances 0.000 description 1
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238000003491 array Methods 0.000 description 1
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Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70608—Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70681—Metrology strategies
- G03F7/70683—Mark designs
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Public Health (AREA)
Epidemiology (AREA)
Health & Medical Sciences (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Atmospheric Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Manufacturing & Machinery (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Length Measuring Devices By Optical Means (AREA)

SG2011057411A 2010-08-24 2011-08-10 A lithographic apparatus and device manufacturing method SG178675A1 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US37665310P	2010-08-24	2010-08-24

Publications (1)

Publication Number	Publication Date
SG178675A1 true SG178675A1 (en)	2012-03-29

Family

ID=44652114

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SG2011057411A SG178675A1 (en)	2010-08-24	2011-08-10	A lithographic apparatus and device manufacturing method

Country Status (7)

Country	Link
US (5)	US8988650B2 (zh)
EP (1)	EP2423749B1 (zh)
JP (1)	JP5318923B2 (zh)
KR (1)	KR101317740B1 (zh)
CN (1)	CN102375347B (zh)
SG (1)	SG178675A1 (zh)
TW (1)	TWI448834B (zh)

Families Citing this family (10)

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NL2006127A (en)	2010-02-17	2011-08-18	Asml Netherlands Bv	A substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus.
EP2423749B1 (en)	2010-08-24	2013-09-11	ASML Netherlands BV	A lithographic apparatus and device manufacturing method
NL2010642A (en)	2012-05-17	2013-11-20	Asml Netherlands Bv	Thermal conditioning unit, lithographic apparatus and device manufacturing method.
US9453801B2 (en)	2012-05-25	2016-09-27	Kla-Tencor Corporation	Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems
US9662688B2 (en)	2012-07-09	2017-05-30	Kla-Tencor Corporation	Apparatus and method for cross-flow purge for optical components in a chamber
WO2014044477A1 (en)	2012-09-18	2014-03-27	Asml Netherlands B.V.	Stage system and lithographic apparatus comprising such stage system
EP3108301B1 (en) *	2014-02-20	2018-07-18	ASML Netherlands B.V.	Lithographic apparatus and device manufacturing method
JP6496017B2 (ja)	2014-11-13	2019-04-03	エーエスエムエルネザーランズビー．ブイ．	リソグラフィ装置およびデバイス製造方法
US10459345B2 (en) *	2015-03-06	2019-10-29	Asml Netherlands B.V.	Focus-dose co-optimization based on overlapping process window
NL2016399A (en) *	2015-04-20	2016-10-24	Asml Netherlands Bv	Lithographic Apparatus and Method in a Lithographic Process.

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US7728951B2 (en)	2005-09-29	2010-06-01	Asml Netherlands B.V.	Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus
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US7253875B1 (en) *	2006-03-03	2007-08-07	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US7924399B2 (en) *	2006-03-27	2011-04-12	Asml Netherlands B.V.	Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods
US8634053B2 (en)	2006-12-07	2014-01-21	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US8687166B2 (en) *	2007-05-24	2014-04-01	Asml Netherlands B.V.	Lithographic apparatus having an encoder position sensor system
NL1036715A1 (nl)	2008-04-16	2009-10-19	Asml Netherlands Bv	Lithographic apparatus.
EP2131241B1 (en)	2008-05-08	2019-07-31	ASML Netherlands B.V.	Fluid handling structure, lithographic apparatus and device manufacturing method
US8421993B2 (en)	2008-05-08	2013-04-16	Asml Netherlands B.V.	Fluid handling structure, lithographic apparatus and device manufacturing method
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NL2003846A (en)	2008-12-19	2010-06-22	Asml Netherlands Bv	Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless.
NL2003845A (en)	2008-12-19	2010-06-22	Asml Netherlands Bv	Lithographic apparatus, and patterning device for use in a lithographic process.
NL2006127A (en)	2010-02-17	2011-08-18	Asml Netherlands Bv	A substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus.
EP2423749B1 (en) *	2010-08-24	2013-09-11	ASML Netherlands BV	A lithographic apparatus and device manufacturing method
WO2014044477A1 (en)	2012-09-18	2014-03-27	Asml Netherlands B.V.	Stage system and lithographic apparatus comprising such stage system
EP3108301B1 (en)	2014-02-20	2018-07-18	ASML Netherlands B.V.	Lithographic apparatus and device manufacturing method

2011
- 2011-07-20 EP EP11174617.8A patent/EP2423749B1/en not_active Not-in-force
- 2011-08-04 TW TW100127800A patent/TWI448834B/zh active
- 2011-08-10 SG SG2011057411A patent/SG178675A1/en unknown
- 2011-08-16 CN CN201110234447.1A patent/CN102375347B/zh active Active
- 2011-08-17 JP JP2011178217A patent/JP5318923B2/ja active Active
- 2011-08-22 US US13/214,289 patent/US8988650B2/en active Active
- 2011-08-22 KR KR1020110083463A patent/KR101317740B1/ko active IP Right Grant
2015
- 2015-03-13 US US14/657,772 patent/US9529277B2/en active Active
2016
- 2016-12-21 US US15/387,461 patent/US9891542B2/en active Active
2018
- 2018-02-12 US US15/894,223 patent/US10216102B2/en active Active
2019
- 2019-02-25 US US16/284,089 patent/US10620553B2/en active Active

Also Published As

Publication number	Publication date
US20190235398A1 (en)	2019-08-01
US20150185624A1 (en)	2015-07-02
US20170242349A1 (en)	2017-08-24
US10620553B2 (en)	2020-04-14
US20120052447A1 (en)	2012-03-01
CN102375347A (zh)	2012-03-14
US20180164705A1 (en)	2018-06-14
JP2012049531A (ja)	2012-03-08
EP2423749B1 (en)	2013-09-11
US9529277B2 (en)	2016-12-27
US10216102B2 (en)	2019-02-26
KR101317740B1 (ko)	2013-10-15
KR20120019381A (ko)	2012-03-06
US9891542B2 (en)	2018-02-13
EP2423749A1 (en)	2012-02-29
CN102375347B (zh)	2014-12-10
JP5318923B2 (ja)	2013-10-16
TW201219992A (en)	2012-05-16
TWI448834B (zh)	2014-08-11
US8988650B2 (en)	2015-03-24

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US10620553B2 (en)	2020-04-14	Lithographic apparatus and device manufacturing method
US10649346B2 (en)	2020-05-12	Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus
US10649341B2 (en)	2020-05-12	Lithographic apparatus
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US8638417B2 (en)	2014-01-28	Fluid handling structure, lithographic apparatus and a device manufacturing method
US8436984B2 (en)	2013-05-07	Lithographic apparatus and method of irradiating at least two target portions
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