SG157327A1 - Substrate table, lithographic apparatus and device manufacturing method - Google Patents
Substrate table, lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG157327A1 SG157327A1 SG200903480-2A SG2009034802A SG157327A1 SG 157327 A1 SG157327 A1 SG 157327A1 SG 2009034802 A SG2009034802 A SG 2009034802A SG 157327 A1 SG157327 A1 SG 157327A1
- Authority
- SG
- Singapore
- Prior art keywords
- device manufacturing
- lithographic apparatus
- substrate table
- openings
- provision
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12906108P | 2008-06-02 | 2008-06-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG157327A1 true SG157327A1 (en) | 2009-12-29 |
Family
ID=40873754
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200903480-2A SG157327A1 (en) | 2008-06-02 | 2009-05-21 | Substrate table, lithographic apparatus and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US20090296068A1 (de) |
EP (1) | EP2131242A1 (de) |
JP (1) | JP2009295978A (de) |
KR (1) | KR101043358B1 (de) |
CN (1) | CN101598907B (de) |
SG (1) | SG157327A1 (de) |
TW (1) | TW201003326A (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1036835A1 (nl) * | 2008-05-08 | 2009-11-11 | Asml Netherlands Bv | Lithographic Apparatus and Method. |
NL1036924A1 (nl) * | 2008-06-02 | 2009-12-03 | Asml Netherlands Bv | Substrate table, lithographic apparatus and device manufacturing method. |
SG159467A1 (en) * | 2008-09-02 | 2010-03-30 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method |
NL2004305A (en) | 2009-03-13 | 2010-09-14 | Asml Netherlands Bv | Substrate table, immersion lithographic apparatus and device manufacturing method. |
NL2005120A (en) * | 2009-09-21 | 2011-03-22 | Asml Netherlands Bv | Lithographic apparatus, coverplate and device manufacturing method. |
NL2005126A (en) * | 2009-09-21 | 2011-03-22 | Asml Netherlands Bv | Lithographic apparatus, coverplate and device manufacturing method. |
NL2005666A (en) * | 2009-12-18 | 2011-06-21 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
NL2005874A (en) * | 2010-01-22 | 2011-07-25 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
NL2006127A (en) * | 2010-02-17 | 2011-08-18 | Asml Netherlands Bv | A substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. |
NL1038213C2 (en) * | 2010-03-04 | 2012-10-08 | Mapper Lithography Ip Bv | Substrate support structure, clamp preparation unit, and lithography system. |
EP2856261B1 (de) * | 2012-05-29 | 2020-11-11 | ASML Netherlands B.V. | Objekthalter, lithographischer apparat und lithographisches verfahren |
NL2010817A (en) | 2012-05-29 | 2013-12-02 | Asml Netherlands Bv | A support apparatus, a lithographic apparatus and a device manufacturing method. |
EP3213149B1 (de) * | 2014-10-28 | 2018-07-25 | ASML Netherlands B.V. | Substrattisch, lithographievorrichtung, inspektionsgerät und verfahren zur herstellung einer vorrichtung |
US10578959B2 (en) | 2015-04-29 | 2020-03-03 | Asml Netherlands B.V. | Support apparatus, lithographic apparatus and device manufacturing method |
WO2016207122A1 (en) | 2015-06-23 | 2016-12-29 | Asml Netherlands B.V. | Support apparatus, lithographic apparatus and device manufacturing method |
Family Cites Families (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4509852A (en) | 1980-10-06 | 1985-04-09 | Werner Tabarelli | Apparatus for the photolithographic manufacture of integrated circuit elements |
AU2747999A (en) | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
AU2002318912A1 (en) * | 2000-12-08 | 2003-03-03 | Deflex Llc | Apparatus, process and method for mounting and treating a substrate |
SG121822A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
JP3953460B2 (ja) * | 2002-11-12 | 2007-08-08 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ投影装置 |
EP1420300B1 (de) | 2002-11-12 | 2015-07-29 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
EP1429188B1 (de) | 2002-11-12 | 2013-06-19 | ASML Netherlands B.V. | Lithographischer Projektionsapparat |
SG135052A1 (en) | 2002-11-12 | 2007-09-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
CN1771463A (zh) * | 2003-04-10 | 2006-05-10 | 株式会社尼康 | 用于沉浸光刻装置收集液体的溢出通道 |
TWI295414B (en) * | 2003-05-13 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
KR100965877B1 (ko) * | 2003-06-13 | 2010-06-24 | 삼성전자주식회사 | 고효율 프로젝션 시스템 및 칼라화상 형성방법 |
EP1498778A1 (de) * | 2003-06-27 | 2005-01-19 | ASML Netherlands B.V. | Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung |
US7175968B2 (en) * | 2003-07-28 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and a substrate |
JP2005159322A (ja) * | 2003-10-31 | 2005-06-16 | Nikon Corp | 定盤、ステージ装置及び露光装置並びに露光方法 |
EP1699073B1 (de) * | 2003-12-15 | 2010-12-08 | Nikon Corporation | Bühnensystem, belichtungsvorrichtung und belichtungsverfahren |
US7394521B2 (en) * | 2003-12-23 | 2008-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7898642B2 (en) * | 2004-04-14 | 2011-03-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2005122219A1 (ja) * | 2004-06-09 | 2005-12-22 | Nikon Corporation | 基板保持装置及びそれを備える露光装置、露光方法、デバイス製造方法、並びに撥液プレート |
JP4543767B2 (ja) * | 2004-06-10 | 2010-09-15 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
KR101330922B1 (ko) * | 2004-06-21 | 2013-11-18 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
US7701550B2 (en) * | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
SG10201801998TA (en) * | 2004-09-17 | 2018-04-27 | Nikon Corp | Substrate holding device, exposure apparatus, and device manufacturing method |
US7782440B2 (en) * | 2004-11-18 | 2010-08-24 | Carl Zeiss Smt Ag | Projection lens system of a microlithographic projection exposure installation |
US7397533B2 (en) | 2004-12-07 | 2008-07-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20090226846A1 (en) * | 2005-03-30 | 2009-09-10 | Nikon Corporation | Exposure Apparatus, Exposure Method, and Device Manufacturing Method |
WO2007052659A1 (ja) * | 2005-11-01 | 2007-05-10 | Nikon Corporation | 露光装置、露光方法、及びデバイス製造方法 |
US7804577B2 (en) * | 2005-11-16 | 2010-09-28 | Asml Netherlands B.V. | Lithographic apparatus |
US7446859B2 (en) * | 2006-01-27 | 2008-11-04 | International Business Machines Corporation | Apparatus and method for reducing contamination in immersion lithography |
US8027019B2 (en) * | 2006-03-28 | 2011-09-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7532309B2 (en) * | 2006-06-06 | 2009-05-12 | Nikon Corporation | Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid |
US7656502B2 (en) | 2006-06-22 | 2010-02-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7791709B2 (en) * | 2006-12-08 | 2010-09-07 | Asml Netherlands B.V. | Substrate support and lithographic process |
JP2009033111A (ja) * | 2007-05-28 | 2009-02-12 | Nikon Corp | 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法 |
NL1035942A1 (nl) * | 2007-09-27 | 2009-03-30 | Asml Netherlands Bv | Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus. |
NL1036186A1 (nl) * | 2007-12-03 | 2009-06-04 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL1036924A1 (nl) * | 2008-06-02 | 2009-12-03 | Asml Netherlands Bv | Substrate table, lithographic apparatus and device manufacturing method. |
-
2009
- 2009-05-19 EP EP09160570A patent/EP2131242A1/de not_active Withdrawn
- 2009-05-21 SG SG200903480-2A patent/SG157327A1/en unknown
- 2009-05-26 JP JP2009126047A patent/JP2009295978A/ja active Pending
- 2009-06-01 US US12/476,008 patent/US20090296068A1/en not_active Abandoned
- 2009-06-01 TW TW098118082A patent/TW201003326A/zh unknown
- 2009-06-01 KR KR1020090048204A patent/KR101043358B1/ko not_active IP Right Cessation
- 2009-06-02 CN CN2009102031319A patent/CN101598907B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP2131242A1 (de) | 2009-12-09 |
KR101043358B1 (ko) | 2011-06-21 |
CN101598907A (zh) | 2009-12-09 |
JP2009295978A (ja) | 2009-12-17 |
KR20090125713A (ko) | 2009-12-07 |
US20090296068A1 (en) | 2009-12-03 |
CN101598907B (zh) | 2011-11-30 |
TW201003326A (en) | 2010-01-16 |
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