SG157327A1 - Substrate table, lithographic apparatus and device manufacturing method - Google Patents

Substrate table, lithographic apparatus and device manufacturing method

Info

Publication number
SG157327A1
SG157327A1 SG200903480-2A SG2009034802A SG157327A1 SG 157327 A1 SG157327 A1 SG 157327A1 SG 2009034802 A SG2009034802 A SG 2009034802A SG 157327 A1 SG157327 A1 SG 157327A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
substrate table
openings
provision
Prior art date
Application number
SG200903480-2A
Other languages
English (en)
Inventor
Henricus Jozef Castelijns
Kate Nicolaas Ten
Sergei Shulepov
Petrus Martinus Gerardus Arts
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG157327A1 publication Critical patent/SG157327A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG200903480-2A 2008-06-02 2009-05-21 Substrate table, lithographic apparatus and device manufacturing method SG157327A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12906108P 2008-06-02 2008-06-02

Publications (1)

Publication Number Publication Date
SG157327A1 true SG157327A1 (en) 2009-12-29

Family

ID=40873754

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200903480-2A SG157327A1 (en) 2008-06-02 2009-05-21 Substrate table, lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US20090296068A1 (de)
EP (1) EP2131242A1 (de)
JP (1) JP2009295978A (de)
KR (1) KR101043358B1 (de)
CN (1) CN101598907B (de)
SG (1) SG157327A1 (de)
TW (1) TW201003326A (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036835A1 (nl) * 2008-05-08 2009-11-11 Asml Netherlands Bv Lithographic Apparatus and Method.
NL1036924A1 (nl) * 2008-06-02 2009-12-03 Asml Netherlands Bv Substrate table, lithographic apparatus and device manufacturing method.
SG159467A1 (en) * 2008-09-02 2010-03-30 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method
NL2004305A (en) 2009-03-13 2010-09-14 Asml Netherlands Bv Substrate table, immersion lithographic apparatus and device manufacturing method.
NL2005120A (en) * 2009-09-21 2011-03-22 Asml Netherlands Bv Lithographic apparatus, coverplate and device manufacturing method.
NL2005126A (en) * 2009-09-21 2011-03-22 Asml Netherlands Bv Lithographic apparatus, coverplate and device manufacturing method.
NL2005666A (en) * 2009-12-18 2011-06-21 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2005874A (en) * 2010-01-22 2011-07-25 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
NL2006127A (en) * 2010-02-17 2011-08-18 Asml Netherlands Bv A substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus.
NL1038213C2 (en) * 2010-03-04 2012-10-08 Mapper Lithography Ip Bv Substrate support structure, clamp preparation unit, and lithography system.
EP2856261B1 (de) * 2012-05-29 2020-11-11 ASML Netherlands B.V. Objekthalter, lithographischer apparat und lithographisches verfahren
NL2010817A (en) 2012-05-29 2013-12-02 Asml Netherlands Bv A support apparatus, a lithographic apparatus and a device manufacturing method.
EP3213149B1 (de) * 2014-10-28 2018-07-25 ASML Netherlands B.V. Substrattisch, lithographievorrichtung, inspektionsgerät und verfahren zur herstellung einer vorrichtung
US10578959B2 (en) 2015-04-29 2020-03-03 Asml Netherlands B.V. Support apparatus, lithographic apparatus and device manufacturing method
WO2016207122A1 (en) 2015-06-23 2016-12-29 Asml Netherlands B.V. Support apparatus, lithographic apparatus and device manufacturing method

Family Cites Families (36)

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US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
AU2002318912A1 (en) * 2000-12-08 2003-03-03 Deflex Llc Apparatus, process and method for mounting and treating a substrate
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP3953460B2 (ja) * 2002-11-12 2007-08-08 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ投影装置
EP1420300B1 (de) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
EP1429188B1 (de) 2002-11-12 2013-06-19 ASML Netherlands B.V. Lithographischer Projektionsapparat
SG135052A1 (en) 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN1771463A (zh) * 2003-04-10 2006-05-10 株式会社尼康 用于沉浸光刻装置收集液体的溢出通道
TWI295414B (en) * 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR100965877B1 (ko) * 2003-06-13 2010-06-24 삼성전자주식회사 고효율 프로젝션 시스템 및 칼라화상 형성방법
EP1498778A1 (de) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
US7175968B2 (en) * 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
JP2005159322A (ja) * 2003-10-31 2005-06-16 Nikon Corp 定盤、ステージ装置及び露光装置並びに露光方法
EP1699073B1 (de) * 2003-12-15 2010-12-08 Nikon Corporation Bühnensystem, belichtungsvorrichtung und belichtungsverfahren
US7394521B2 (en) * 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7898642B2 (en) * 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005122219A1 (ja) * 2004-06-09 2005-12-22 Nikon Corporation 基板保持装置及びそれを備える露光装置、露光方法、デバイス製造方法、並びに撥液プレート
JP4543767B2 (ja) * 2004-06-10 2010-09-15 株式会社ニコン 露光装置及びデバイス製造方法
KR101330922B1 (ko) * 2004-06-21 2013-11-18 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG10201801998TA (en) * 2004-09-17 2018-04-27 Nikon Corp Substrate holding device, exposure apparatus, and device manufacturing method
US7782440B2 (en) * 2004-11-18 2010-08-24 Carl Zeiss Smt Ag Projection lens system of a microlithographic projection exposure installation
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20090226846A1 (en) * 2005-03-30 2009-09-10 Nikon Corporation Exposure Apparatus, Exposure Method, and Device Manufacturing Method
WO2007052659A1 (ja) * 2005-11-01 2007-05-10 Nikon Corporation 露光装置、露光方法、及びデバイス製造方法
US7804577B2 (en) * 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7446859B2 (en) * 2006-01-27 2008-11-04 International Business Machines Corporation Apparatus and method for reducing contamination in immersion lithography
US8027019B2 (en) * 2006-03-28 2011-09-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7532309B2 (en) * 2006-06-06 2009-05-12 Nikon Corporation Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid
US7656502B2 (en) 2006-06-22 2010-02-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7791709B2 (en) * 2006-12-08 2010-09-07 Asml Netherlands B.V. Substrate support and lithographic process
JP2009033111A (ja) * 2007-05-28 2009-02-12 Nikon Corp 露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
NL1035942A1 (nl) * 2007-09-27 2009-03-30 Asml Netherlands Bv Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus.
NL1036186A1 (nl) * 2007-12-03 2009-06-04 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
NL1036924A1 (nl) * 2008-06-02 2009-12-03 Asml Netherlands Bv Substrate table, lithographic apparatus and device manufacturing method.

Also Published As

Publication number Publication date
EP2131242A1 (de) 2009-12-09
KR101043358B1 (ko) 2011-06-21
CN101598907A (zh) 2009-12-09
JP2009295978A (ja) 2009-12-17
KR20090125713A (ko) 2009-12-07
US20090296068A1 (en) 2009-12-03
CN101598907B (zh) 2011-11-30
TW201003326A (en) 2010-01-16

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