SG139674A1 - Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method

Info

Publication number
SG139674A1
SG139674A1 SG200705299-6A SG2007052996A SG139674A1 SG 139674 A1 SG139674 A1 SG 139674A1 SG 2007052996 A SG2007052996 A SG 2007052996A SG 139674 A1 SG139674 A1 SG 139674A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
substrate table
calibrating
lateral
device manufacturing
Prior art date
Application number
SG200705299-6A
Inventor
Koen Jacobus Johannes Mar Zaal
Joost Jeroen Ottens
Judocus Marie Dom Stoeldraijer
Kort Antonius Johannes De
De Mast Franciscus Van
Jong Marteijn De
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG139674A1 publication Critical patent/SG139674A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)

Abstract

LITHOGRAPHIC APPARATUS, METHOD OF CALIBRATING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral minor when the substrate table is at the measurement station.
SG200705299-6A 2006-07-28 2007-07-17 Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method SG139674A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/494,794 US7804582B2 (en) 2006-07-28 2006-07-28 Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG139674A1 true SG139674A1 (en) 2008-02-29

Family

ID=38698866

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200705299-6A SG139674A1 (en) 2006-07-28 2007-07-17 Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US7804582B2 (en)
EP (1) EP1882988A2 (en)
JP (2) JP4953955B2 (en)
KR (1) KR20080011125A (en)
CN (1) CN101149569B (en)
SG (1) SG139674A1 (en)
TW (2) TWI373065B (en)

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CN101416031A (en) * 2006-03-29 2009-04-22 约翰尼斯海登海恩博士股份有限公司 Method for holding a scale on a carrier and arrangement having a carrier and a scale
US8068208B2 (en) * 2006-12-01 2011-11-29 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for improving immersion scanner overlay performance
NL1036096A1 (en) * 2007-11-06 2009-05-07 Asml Netherlands Bv Lithographic method.
JP4897006B2 (en) * 2008-03-04 2012-03-14 エーエスエムエル ネザーランズ ビー．ブイ． Method for providing alignment mark, device manufacturing method, and lithographic apparatus
US8773635B2 (en) * 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
DE102011005885A1 (en) * 2011-03-22 2012-09-27 Carl Zeiss Smt Gmbh lithography apparatus
US8779556B2 (en) * 2011-05-27 2014-07-15 Taiwan Semiconductor Manufacturing Company, Ltd. Structure designs and methods for integrated circuit alignment
US9341951B2 (en) * 2012-12-21 2016-05-17 Ultratech, Inc. Wynn-dyson imaging system with reduced thermal distortion
GB201315715D0 (en) * 2013-09-04 2013-10-16 Metryx Ltd Method and device for determining information relating to the mass of a semiconductor wafer
US9857694B2 (en) * 2014-04-28 2018-01-02 Asml Netherlands B.V. Estimating deformation of a patterning device and/or a change in its position
CN112162465B (en) * 2015-03-31 2023-06-20 株式会社尼康 Exposure apparatus, method for manufacturing flat panel display, method for manufacturing device, and exposure method
WO2017185069A1 (en) * 2016-04-21 2017-10-26 Molecular Vista, Inc. System and method for optical drift correction
KR20180029145A (en) 2016-09-09 2018-03-20 삼성전자주식회사 substrate processing apparatus
CN113496910B (en) * 2020-03-19 2024-02-06 长鑫存储技术有限公司 Temperature correcting sheet and application method thereof

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US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
US5260771A (en) * 1988-03-07 1993-11-09 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
JP2816272B2 (en) * 1992-05-12 1998-10-27 株式会社日立製作所 Positioning device
JPH0636997A (en) * 1992-07-15 1994-02-10 Hitachi Ltd Electron beam lithography apparatus
US6645701B1 (en) * 1995-11-22 2003-11-11 Nikon Corporation Exposure method and exposure apparatus
JPH1083954A (en) * 1996-09-09 1998-03-31 Nikon Corp Exposure device
JPH11155110A (en) * 1997-11-21 1999-06-08 Nec Corp Program list display device and its method
WO2001090686A1 (en) * 2000-05-19 2001-11-29 Zygo Corporation In-situ mirror characterization
JP2002118050A (en) * 2000-10-10 2002-04-19 Canon Inc Stage device, aligner, method for manufacturing semiconductor device, semiconductor manufacturing plant, and maintenance method for the aligner
US6842248B1 (en) * 2000-11-28 2005-01-11 Nikon Corporation System and method for calibrating mirrors of a stage assembly
JP2002365016A (en) * 2001-06-07 2002-12-18 Nikon Corp Position measurement method using interferometer, interference type position measurement apparatus, algner and exposure method
EP1304597A1 (en) 2001-10-19 2003-04-23 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US20030146928A1 (en) * 2002-01-31 2003-08-07 Paul Finster Method and system for optimal grid alignment
US8255968B2 (en) * 2002-04-15 2012-08-28 Universal Electronics, Inc. System and method for adaptively controlling the recording of program material using a program guide
TWI246114B (en) * 2002-09-24 2005-12-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
EP1420298B1 (en) 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI230837B (en) * 2002-12-16 2005-04-11 Asml Netherlands Bv Lithographic apparatus with alignment subsystem, device manufacturing method using alignment, and alignment structure
TWI338323B (en) * 2003-02-17 2011-03-01 Nikon Corp Stage device, exposure device and manufacguring method of devices
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI536430B (en) 2003-06-19 2016-06-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
US7250237B2 (en) 2003-12-23 2007-07-31 Asml Netherlands B.V. Optimized correction of wafer thermal deformations in a lithographic process
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Also Published As

Publication number Publication date
JP2008034845A (en) 2008-02-14
JP4953955B2 (en) 2012-06-13
TWI373065B (en) 2012-09-21
TWI424284B (en) 2014-01-21
JP5485321B2 (en) 2014-05-07
TW201135377A (en) 2011-10-16
JP2012147003A (en) 2012-08-02
CN101149569A (en) 2008-03-26
KR20080011125A (en) 2008-01-31
CN101149569B (en) 2011-05-11
EP1882988A2 (en) 2008-01-30
TW200818258A (en) 2008-04-16
US20080024748A1 (en) 2008-01-31
US7804582B2 (en) 2010-09-28

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