SG139674A1 - Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG139674A1 SG139674A1 SG200705299-6A SG2007052996A SG139674A1 SG 139674 A1 SG139674 A1 SG 139674A1 SG 2007052996 A SG2007052996 A SG 2007052996A SG 139674 A1 SG139674 A1 SG 139674A1
- Authority
- SG
- Singapore
- Prior art keywords
- lithographic apparatus
- substrate table
- calibrating
- lateral
- device manufacturing
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 3
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 6
- 238000005259 measurement Methods 0.000 abstract 3
- 230000009977 dual effect Effects 0.000 abstract 1
- 230000000694 effects Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
- G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
LITHOGRAPHIC APPARATUS, METHOD OF CALIBRATING A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral minor when the substrate table is at the measurement station.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/494,794 US7804582B2 (en) | 2006-07-28 | 2006-07-28 | Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG139674A1 true SG139674A1 (en) | 2008-02-29 |
Family
ID=38698866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200705299-6A SG139674A1 (en) | 2006-07-28 | 2007-07-17 | Lithographic apparatus, method of calibrating a lithographic apparatus and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US7804582B2 (en) |
EP (1) | EP1882988A2 (en) |
JP (2) | JP4953955B2 (en) |
KR (1) | KR20080011125A (en) |
CN (1) | CN101149569B (en) |
SG (1) | SG139674A1 (en) |
TW (2) | TWI373065B (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101416031A (en) * | 2006-03-29 | 2009-04-22 | 约翰尼斯海登海恩博士股份有限公司 | Method for holding a scale on a carrier and arrangement having a carrier and a scale |
US8068208B2 (en) * | 2006-12-01 | 2011-11-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for improving immersion scanner overlay performance |
NL1036096A1 (en) * | 2007-11-06 | 2009-05-07 | Asml Netherlands Bv | Lithographic method. |
JP4897006B2 (en) * | 2008-03-04 | 2012-03-14 | エーエスエムエル ネザーランズ ビー.ブイ. | Method for providing alignment mark, device manufacturing method, and lithographic apparatus |
US8773635B2 (en) * | 2008-12-19 | 2014-07-08 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
DE102011005885A1 (en) * | 2011-03-22 | 2012-09-27 | Carl Zeiss Smt Gmbh | lithography apparatus |
US8779556B2 (en) * | 2011-05-27 | 2014-07-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure designs and methods for integrated circuit alignment |
US9341951B2 (en) * | 2012-12-21 | 2016-05-17 | Ultratech, Inc. | Wynn-dyson imaging system with reduced thermal distortion |
GB201315715D0 (en) * | 2013-09-04 | 2013-10-16 | Metryx Ltd | Method and device for determining information relating to the mass of a semiconductor wafer |
US9857694B2 (en) * | 2014-04-28 | 2018-01-02 | Asml Netherlands B.V. | Estimating deformation of a patterning device and/or a change in its position |
CN112162465B (en) * | 2015-03-31 | 2023-06-20 | 株式会社尼康 | Exposure apparatus, method for manufacturing flat panel display, method for manufacturing device, and exposure method |
WO2017185069A1 (en) * | 2016-04-21 | 2017-10-26 | Molecular Vista, Inc. | System and method for optical drift correction |
KR20180029145A (en) | 2016-09-09 | 2018-03-20 | 삼성전자주식회사 | substrate processing apparatus |
CN113496910B (en) * | 2020-03-19 | 2024-02-06 | 长鑫存储技术有限公司 | Temperature correcting sheet and application method thereof |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4509852A (en) | 1980-10-06 | 1985-04-09 | Werner Tabarelli | Apparatus for the photolithographic manufacture of integrated circuit elements |
US5260771A (en) * | 1988-03-07 | 1993-11-09 | Hitachi, Ltd. | Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same |
JP2816272B2 (en) * | 1992-05-12 | 1998-10-27 | 株式会社日立製作所 | Positioning device |
JPH0636997A (en) * | 1992-07-15 | 1994-02-10 | Hitachi Ltd | Electron beam lithography apparatus |
US6645701B1 (en) * | 1995-11-22 | 2003-11-11 | Nikon Corporation | Exposure method and exposure apparatus |
JPH1083954A (en) * | 1996-09-09 | 1998-03-31 | Nikon Corp | Exposure device |
JPH11155110A (en) * | 1997-11-21 | 1999-06-08 | Nec Corp | Program list display device and its method |
WO2001090686A1 (en) * | 2000-05-19 | 2001-11-29 | Zygo Corporation | In-situ mirror characterization |
JP2002118050A (en) * | 2000-10-10 | 2002-04-19 | Canon Inc | Stage device, aligner, method for manufacturing semiconductor device, semiconductor manufacturing plant, and maintenance method for the aligner |
US6842248B1 (en) * | 2000-11-28 | 2005-01-11 | Nikon Corporation | System and method for calibrating mirrors of a stage assembly |
JP2002365016A (en) * | 2001-06-07 | 2002-12-18 | Nikon Corp | Position measurement method using interferometer, interference type position measurement apparatus, algner and exposure method |
EP1304597A1 (en) | 2001-10-19 | 2003-04-23 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20030146928A1 (en) * | 2002-01-31 | 2003-08-07 | Paul Finster | Method and system for optimal grid alignment |
US8255968B2 (en) * | 2002-04-15 | 2012-08-28 | Universal Electronics, Inc. | System and method for adaptively controlling the recording of program material using a program guide |
TWI246114B (en) * | 2002-09-24 | 2005-12-21 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
EP1420298B1 (en) | 2002-11-12 | 2013-02-20 | ASML Netherlands B.V. | Lithographic apparatus |
EP1420300B1 (en) | 2002-11-12 | 2015-07-29 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TWI230837B (en) * | 2002-12-16 | 2005-04-11 | Asml Netherlands Bv | Lithographic apparatus with alignment subsystem, device manufacturing method using alignment, and alignment structure |
TWI338323B (en) * | 2003-02-17 | 2011-03-01 | Nikon Corp | Stage device, exposure device and manufacguring method of devices |
US7213963B2 (en) * | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TWI536430B (en) | 2003-06-19 | 2016-06-01 | 尼康股份有限公司 | An exposure apparatus, an exposure method, and an element manufacturing method |
US7250237B2 (en) | 2003-12-23 | 2007-07-31 | Asml Netherlands B.V. | Optimized correction of wafer thermal deformations in a lithographic process |
JP2005252246A (en) * | 2004-02-04 | 2005-09-15 | Nikon Corp | Exposure device and exposure method, method of controlling position and method of fabricating the device |
US7304715B2 (en) | 2004-08-13 | 2007-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
-
2006
- 2006-07-28 US US11/494,794 patent/US7804582B2/en active Active
-
2007
- 2007-07-17 SG SG200705299-6A patent/SG139674A1/en unknown
- 2007-07-17 EP EP07252830A patent/EP1882988A2/en not_active Withdrawn
- 2007-07-19 TW TW096126364A patent/TWI373065B/en active
- 2007-07-19 TW TW100122064A patent/TWI424284B/en active
- 2007-07-20 JP JP2007189082A patent/JP4953955B2/en active Active
- 2007-07-27 CN CN2007101821053A patent/CN101149569B/en active Active
- 2007-07-27 KR KR1020070075888A patent/KR20080011125A/en not_active Application Discontinuation
-
2012
- 2012-03-13 JP JP2012055728A patent/JP5485321B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2008034845A (en) | 2008-02-14 |
JP4953955B2 (en) | 2012-06-13 |
TWI373065B (en) | 2012-09-21 |
TWI424284B (en) | 2014-01-21 |
JP5485321B2 (en) | 2014-05-07 |
TW201135377A (en) | 2011-10-16 |
JP2012147003A (en) | 2012-08-02 |
CN101149569A (en) | 2008-03-26 |
KR20080011125A (en) | 2008-01-31 |
CN101149569B (en) | 2011-05-11 |
EP1882988A2 (en) | 2008-01-30 |
TW200818258A (en) | 2008-04-16 |
US20080024748A1 (en) | 2008-01-31 |
US7804582B2 (en) | 2010-09-28 |
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