SG135142A1 - Top coat for lithography processes - Google Patents

Top coat for lithography processes

Info

Publication number
SG135142A1
SG135142A1 SG200701297-4A SG2007012974A SG135142A1 SG 135142 A1 SG135142 A1 SG 135142A1 SG 2007012974 A SG2007012974 A SG 2007012974A SG 135142 A1 SG135142 A1 SG 135142A1
Authority
SG
Singapore
Prior art keywords
top coat
lithography processes
silicon
containing polymer
optionally
Prior art date
Application number
SG200701297-4A
Inventor
Scott Jeffrey Weigel
Peng Zhang
Thomas Albert Braymer
Gene Everad Parris
Original Assignee
Air Prod & Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Prod & Chem filed Critical Air Prod & Chem
Publication of SG135142A1 publication Critical patent/SG135142A1/en

Links

Abstract

The present invention provides a top coat composition comprising a silicon- containing polymer prepared by hydrolysis and condensation of at least one silica source; a solvent; optionally a catalyst; and optionally water, wherein the silicon-containing polymer depolymerizes upon exposure to an aqueous base-containing solution.
SG200701297-4A 2006-02-22 2007-02-22 Top coat for lithography processes SG135142A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77661006P 2006-02-22 2006-02-22
US50055007P 2007-02-15 2007-02-15

Publications (1)

Publication Number Publication Date
SG135142A1 true SG135142A1 (en) 2007-09-28

Family

ID=38800879

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200701297-4A SG135142A1 (en) 2006-02-22 2007-02-22 Top coat for lithography processes

Country Status (1)

Country Link
SG (1) SG135142A1 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0482821B1 (en) * 1990-10-16 1998-09-30 Mitsui Chemicals, Inc. Use of a highly light-transmitting dust protective film, process for preparation thereof and dust protective member
US5939197A (en) * 1996-11-04 1999-08-17 The Boeing Company Sol-gel coated metal
US5944866A (en) * 1997-09-26 1999-08-31 Lucent Technologies Inc. Fabrication including sol-gel processing
EP0940452A1 (en) * 1998-03-06 1999-09-08 BetzDearborn, Inc. Stabilized composition for treatment of metal surfaces
US6258514B1 (en) * 1999-03-10 2001-07-10 Lsi Logic Corporation Top surface imaging technique using a topcoat delivery system
US20060046205A1 (en) * 2004-07-22 2006-03-02 Jung-Hwan Hah Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
US20060063384A1 (en) * 2004-09-23 2006-03-23 Jung-Hwan Hah Mask patterns for semiconductor device fabrication and related methods and structures

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0482821B1 (en) * 1990-10-16 1998-09-30 Mitsui Chemicals, Inc. Use of a highly light-transmitting dust protective film, process for preparation thereof and dust protective member
US5939197A (en) * 1996-11-04 1999-08-17 The Boeing Company Sol-gel coated metal
US5944866A (en) * 1997-09-26 1999-08-31 Lucent Technologies Inc. Fabrication including sol-gel processing
EP0940452A1 (en) * 1998-03-06 1999-09-08 BetzDearborn, Inc. Stabilized composition for treatment of metal surfaces
US6258514B1 (en) * 1999-03-10 2001-07-10 Lsi Logic Corporation Top surface imaging technique using a topcoat delivery system
US20060046205A1 (en) * 2004-07-22 2006-03-02 Jung-Hwan Hah Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
US20060063384A1 (en) * 2004-09-23 2006-03-23 Jung-Hwan Hah Mask patterns for semiconductor device fabrication and related methods and structures

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SG135142A1 (en) Top coat for lithography processes