SG135142A1 - Top coat for lithography processes - Google Patents
Top coat for lithography processesInfo
- Publication number
- SG135142A1 SG135142A1 SG200701297-4A SG2007012974A SG135142A1 SG 135142 A1 SG135142 A1 SG 135142A1 SG 2007012974 A SG2007012974 A SG 2007012974A SG 135142 A1 SG135142 A1 SG 135142A1
- Authority
- SG
- Singapore
- Prior art keywords
- top coat
- lithography processes
- silicon
- containing polymer
- optionally
- Prior art date
Links
Abstract
The present invention provides a top coat composition comprising a silicon- containing polymer prepared by hydrolysis and condensation of at least one silica source; a solvent; optionally a catalyst; and optionally water, wherein the silicon-containing polymer depolymerizes upon exposure to an aqueous base-containing solution.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US77661006P | 2006-02-22 | 2006-02-22 | |
US50055007P | 2007-02-15 | 2007-02-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG135142A1 true SG135142A1 (en) | 2007-09-28 |
Family
ID=38800879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200701297-4A SG135142A1 (en) | 2006-02-22 | 2007-02-22 | Top coat for lithography processes |
Country Status (1)
Country | Link |
---|---|
SG (1) | SG135142A1 (en) |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0482821B1 (en) * | 1990-10-16 | 1998-09-30 | Mitsui Chemicals, Inc. | Use of a highly light-transmitting dust protective film, process for preparation thereof and dust protective member |
US5939197A (en) * | 1996-11-04 | 1999-08-17 | The Boeing Company | Sol-gel coated metal |
US5944866A (en) * | 1997-09-26 | 1999-08-31 | Lucent Technologies Inc. | Fabrication including sol-gel processing |
EP0940452A1 (en) * | 1998-03-06 | 1999-09-08 | BetzDearborn, Inc. | Stabilized composition for treatment of metal surfaces |
US6258514B1 (en) * | 1999-03-10 | 2001-07-10 | Lsi Logic Corporation | Top surface imaging technique using a topcoat delivery system |
US20060046205A1 (en) * | 2004-07-22 | 2006-03-02 | Jung-Hwan Hah | Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device |
US20060063384A1 (en) * | 2004-09-23 | 2006-03-23 | Jung-Hwan Hah | Mask patterns for semiconductor device fabrication and related methods and structures |
-
2007
- 2007-02-22 SG SG200701297-4A patent/SG135142A1/en unknown
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0482821B1 (en) * | 1990-10-16 | 1998-09-30 | Mitsui Chemicals, Inc. | Use of a highly light-transmitting dust protective film, process for preparation thereof and dust protective member |
US5939197A (en) * | 1996-11-04 | 1999-08-17 | The Boeing Company | Sol-gel coated metal |
US5944866A (en) * | 1997-09-26 | 1999-08-31 | Lucent Technologies Inc. | Fabrication including sol-gel processing |
EP0940452A1 (en) * | 1998-03-06 | 1999-09-08 | BetzDearborn, Inc. | Stabilized composition for treatment of metal surfaces |
US6258514B1 (en) * | 1999-03-10 | 2001-07-10 | Lsi Logic Corporation | Top surface imaging technique using a topcoat delivery system |
US20060046205A1 (en) * | 2004-07-22 | 2006-03-02 | Jung-Hwan Hah | Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device |
US20060063384A1 (en) * | 2004-09-23 | 2006-03-23 | Jung-Hwan Hah | Mask patterns for semiconductor device fabrication and related methods and structures |
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SG135142A1 (en) | Top coat for lithography processes |