SG124382A1 - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- SG124382A1 SG124382A1 SG200600383A SG200600383A SG124382A1 SG 124382 A1 SG124382 A1 SG 124382A1 SG 200600383 A SG200600383 A SG 200600383A SG 200600383 A SG200600383 A SG 200600383A SG 124382 A1 SG124382 A1 SG 124382A1
- Authority
- SG
- Singapore
- Prior art keywords
- resin composition
- photosensitive resin
- photosensitive
- composition
- resin
- Prior art date
Links
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050007725A KR101068111B1 (en) | 2005-01-27 | 2005-01-27 | Photosensitive resin composition |
Publications (1)
Publication Number | Publication Date |
---|---|
SG124382A1 true SG124382A1 (en) | 2006-08-30 |
Family
ID=36844585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200600383A SG124382A1 (en) | 2005-01-27 | 2006-01-19 | Photosensitive resin composition |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4669789B2 (en) |
KR (1) | KR101068111B1 (en) |
CN (1) | CN1811596A (en) |
SG (1) | SG124382A1 (en) |
TW (1) | TWI413856B (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7799509B2 (en) * | 2005-06-04 | 2010-09-21 | Samsung Electronics Co., Ltd. | Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same |
KR101506535B1 (en) * | 2007-02-28 | 2015-03-27 | 제이엔씨 주식회사 | Positive photosensitive resin composition |
KR100911889B1 (en) | 2007-07-16 | 2009-08-11 | 한국전기연구원 | Photosensitive resin composition with organic~inorganic hybrid and liquid display devices using |
JP5187492B2 (en) * | 2007-11-22 | 2013-04-24 | Jsr株式会社 | Curable resin composition, protective film and method for forming protective film |
JP5108480B2 (en) * | 2007-11-28 | 2012-12-26 | 東京応化工業株式会社 | Photosensitive resin composition for interlayer insulation film |
JP5176768B2 (en) * | 2008-08-06 | 2013-04-03 | Jsr株式会社 | Positive photosensitive insulating resin composition |
JP5451048B2 (en) * | 2008-12-05 | 2014-03-26 | 株式会社ダイセル | Copolymer and photosensitive resin composition |
JP5411589B2 (en) * | 2009-06-11 | 2014-02-12 | 株式会社ダイセル | Copolymer, resin composition containing the copolymer, and cured product thereof |
JP5441542B2 (en) * | 2009-07-22 | 2014-03-12 | 富士フイルム株式会社 | Positive photosensitive resin composition, cured film, interlayer insulating film, organic EL display device, and liquid crystal display device |
TW201310166A (en) * | 2011-08-31 | 2013-03-01 | Everlight Chem Ind Corp | Resin and composition thereof for manufacture insulator layer and over coat |
KR101344873B1 (en) * | 2011-10-17 | 2013-12-30 | 이근수 | Copolymer compositions, heat-resistant resin obtained therefrom and manufacturing method thereof |
JP5935297B2 (en) * | 2011-11-09 | 2016-06-15 | Jnc株式会社 | Positive photosensitive composition |
JP2013160825A (en) * | 2012-02-02 | 2013-08-19 | Sumitomo Chemical Co Ltd | Photosensitive resin composition |
JP6458236B2 (en) * | 2014-09-26 | 2019-01-30 | ナトコ株式会社 | Alkali-soluble resin, photosensitive resin composition and use thereof |
JP6536067B2 (en) * | 2015-02-19 | 2019-07-03 | Jsr株式会社 | METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE, RADIATION-SENSITIVE RESIN COMPOSITION, AND LIQUID CRYSTAL DISPLAY DEVICE |
JP7063049B2 (en) | 2018-03-28 | 2022-05-09 | Jsr株式会社 | Radiation-sensitive compositions and their uses |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55159441A (en) * | 1979-05-31 | 1980-12-11 | Toray Ind Inc | Lithographic plate material not requiring wetting water |
JPH01126643A (en) * | 1987-11-12 | 1989-05-18 | Nippon Zeon Co Ltd | Pattern forming material |
JPH08320567A (en) * | 1995-05-25 | 1996-12-03 | Toyo Ink Mfg Co Ltd | Photo soldering resist composition |
JP3562599B2 (en) * | 1995-08-18 | 2004-09-08 | 大日本インキ化学工業株式会社 | Photoresist composition |
JP3965868B2 (en) * | 2000-06-12 | 2007-08-29 | Jsr株式会社 | Interlayer insulation film and microlens |
JP2002116536A (en) * | 2000-10-06 | 2002-04-19 | Jsr Corp | Radiation sensitive resin composition, its cured body and element |
JP4815663B2 (en) * | 2000-10-17 | 2011-11-16 | 旭硝子株式会社 | Curable composition |
KR100784672B1 (en) * | 2001-08-20 | 2007-12-12 | 주식회사 동진쎄미켐 | Photosensitive resin composition |
KR100809544B1 (en) * | 2001-10-24 | 2008-03-04 | 주식회사 동진쎄미켐 | Photosensitive resin composition comprising quinonediazide sulfate ester compound |
JP2003167350A (en) * | 2001-12-04 | 2003-06-13 | Toyobo Co Ltd | Photoresist composition and method for curing the same |
JP2003195499A (en) | 2001-12-25 | 2003-07-09 | Tamura Kaken Co Ltd | Photosensitive resin composition and printed wiring board |
KR100824356B1 (en) * | 2002-01-09 | 2008-04-22 | 삼성전자주식회사 | Photoresist Composition And Method of Manufacturing Pattern Using The Same |
DE602004024846D1 (en) * | 2003-04-07 | 2010-02-11 | Toray Industries | Composition of positive-type photosensitive resin |
JP4483371B2 (en) * | 2003-04-07 | 2010-06-16 | 東レ株式会社 | Photosensitive resin composition |
-
2005
- 2005-01-27 KR KR1020050007725A patent/KR101068111B1/en active IP Right Grant
-
2006
- 2006-01-18 TW TW095101865A patent/TWI413856B/en active
- 2006-01-19 SG SG200600383A patent/SG124382A1/en unknown
- 2006-01-19 JP JP2006010981A patent/JP4669789B2/en active Active
- 2006-01-27 CN CNA2006100022538A patent/CN1811596A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
KR101068111B1 (en) | 2011-09-27 |
JP2006209112A (en) | 2006-08-10 |
KR20060087032A (en) | 2006-08-02 |
JP4669789B2 (en) | 2011-04-13 |
TW200632548A (en) | 2006-09-16 |
TWI413856B (en) | 2013-11-01 |
CN1811596A (en) | 2006-08-02 |
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