SG11202110430VA - Graded interface in bragg reflector - Google Patents
Graded interface in bragg reflectorInfo
- Publication number
- SG11202110430VA SG11202110430VA SG11202110430VA SG11202110430VA SG11202110430VA SG 11202110430V A SG11202110430V A SG 11202110430VA SG 11202110430V A SG11202110430V A SG 11202110430VA SG 11202110430V A SG11202110430V A SG 11202110430VA SG 11202110430V A SG11202110430V A SG 11202110430VA
- Authority
- SG
- Singapore
- Prior art keywords
- bragg reflector
- graded interface
- graded
- interface
- bragg
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/52—Reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- Physical Vapour Deposition (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201962836135P | 2019-04-19 | 2019-04-19 | |
US16/850,665 US11327394B2 (en) | 2019-04-19 | 2020-04-16 | Graded interface in bragg reflector |
PCT/US2020/028669 WO2020214909A1 (en) | 2019-04-19 | 2020-04-17 | Graded interface in bragg reflector |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202110430VA true SG11202110430VA (en) | 2021-11-29 |
Family
ID=72832347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202110430VA SG11202110430VA (en) | 2019-04-19 | 2020-04-17 | Graded interface in bragg reflector |
Country Status (5)
Country | Link |
---|---|
US (2) | US11327394B2 (en) |
JP (1) | JP2022528988A (en) |
KR (1) | KR20210143937A (en) |
SG (1) | SG11202110430VA (en) |
WO (1) | WO2020214909A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11366059B2 (en) * | 2020-06-05 | 2022-06-21 | Applied Materials Inc. | System and method to measure refractive index at specific wavelengths |
CN112241088B (en) * | 2020-10-15 | 2021-09-03 | Tcl华星光电技术有限公司 | Miniature light-emitting diode lamp panel, backlight module and preparation method thereof |
KR20230059597A (en) | 2021-10-26 | 2023-05-03 | 주식회사 엘지에너지솔루션 | Battery pack |
CN114959581A (en) * | 2022-03-17 | 2022-08-30 | 武汉大学 | Preparation method of solar spectrum absorption coating and coating |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6132566A (en) | 1998-07-30 | 2000-10-17 | Applied Materials, Inc. | Apparatus and method for sputtering ionized material in a plasma |
US6396900B1 (en) | 2001-05-01 | 2002-05-28 | The Regents Of The University Of California | Multilayer films with sharp, stable interfaces for use in EUV and soft X-ray application |
US6740209B2 (en) | 2001-07-27 | 2004-05-25 | Anelva Corporation | Multilayer film deposition apparatus, and method and apparatus for manufacturing perpendicular-magnetic-recording media |
US6606199B2 (en) * | 2001-10-10 | 2003-08-12 | Honeywell International Inc. | Graded thickness optical element and method of manufacture therefor |
US7674360B2 (en) | 2003-12-12 | 2010-03-09 | Applied Materials, Inc. | Mechanism for varying the spacing between sputter magnetron and target |
JP2005234209A (en) | 2004-02-19 | 2005-09-02 | Shin Etsu Chem Co Ltd | Method for producing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask and method for transferring pattern |
TWI427334B (en) | 2007-02-05 | 2014-02-21 | Zeiss Carl Smt Gmbh | Reflective optical element for euv lithography devices |
JP5590113B2 (en) | 2010-03-02 | 2014-09-17 | 旭硝子株式会社 | Reflective mask blank for EUV lithography and manufacturing method thereof |
KR101625382B1 (en) | 2010-04-29 | 2016-05-30 | (주)에스앤에스텍 | Reflective Type EUV Blankmask, Photomask and Its Manufacturing Method |
TWI554630B (en) | 2010-07-02 | 2016-10-21 | 應用材料股份有限公司 | Deposition apparatus and methods to reduce deposition asymmetry |
WO2012068467A2 (en) * | 2010-11-19 | 2012-05-24 | University Of Delaware | Hybrid dielectric - metallic back surface reflector for photovoltaic applications |
US8426085B2 (en) | 2010-12-02 | 2013-04-23 | Intermolecular, Inc. | Method and apparatus for EUV mask having diffusion barrier |
US20130062610A1 (en) * | 2011-09-14 | 2013-03-14 | Andrew Clark | Lattice matched crystalline reflector |
US8658333B2 (en) | 2012-06-04 | 2014-02-25 | Nanya Technology Corporation | Reflective mask |
KR20150088866A (en) | 2012-11-30 | 2015-08-03 | 캐논 아네르바 가부시키가이샤 | Sputtering device and substrate treatment device |
US9812303B2 (en) | 2013-03-01 | 2017-11-07 | Applied Materials, Inc. | Configurable variable position closed track magnetron |
US20140272684A1 (en) | 2013-03-12 | 2014-09-18 | Applied Materials, Inc. | Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor |
US9261774B2 (en) | 2013-11-22 | 2016-02-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity |
US9739913B2 (en) | 2014-07-11 | 2017-08-22 | Applied Materials, Inc. | Extreme ultraviolet capping layer and method of manufacturing and lithography thereof |
US9581890B2 (en) | 2014-07-11 | 2017-02-28 | Applied Materials, Inc. | Extreme ultraviolet reflective element with multilayer stack and method of manufacturing thereof |
US10468238B2 (en) | 2015-08-21 | 2019-11-05 | Applied Materials, Inc. | Methods and apparatus for co-sputtering multiple targets |
US10431440B2 (en) | 2015-12-20 | 2019-10-01 | Applied Materials, Inc. | Methods and apparatus for processing a substrate |
US10504705B2 (en) | 2017-09-15 | 2019-12-10 | Applied Materials, Inc. | Physical vapor deposition chamber with static magnet assembly and methods of sputtering |
TWI821300B (en) | 2018-06-19 | 2023-11-11 | 美商應用材料股份有限公司 | Deposition system with shield mount |
-
2020
- 2020-04-16 US US16/850,665 patent/US11327394B2/en active Active
- 2020-04-17 WO PCT/US2020/028669 patent/WO2020214909A1/en active Application Filing
- 2020-04-17 SG SG11202110430VA patent/SG11202110430VA/en unknown
- 2020-04-17 JP JP2021560940A patent/JP2022528988A/en active Pending
- 2020-04-17 KR KR1020217037598A patent/KR20210143937A/en active Search and Examination
-
2022
- 2022-03-30 US US17/708,593 patent/US11720013B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
KR20210143937A (en) | 2021-11-29 |
WO2020214909A1 (en) | 2020-10-22 |
JP2022528988A (en) | 2022-06-16 |
US20200333700A1 (en) | 2020-10-22 |
US20220221786A1 (en) | 2022-07-14 |
US11720013B2 (en) | 2023-08-08 |
TW202104957A (en) | 2021-02-01 |
US11327394B2 (en) | 2022-05-10 |
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