SG11202000910YA - Ultrasonic cleaning device and ultrasonic cleaning system - Google Patents

Ultrasonic cleaning device and ultrasonic cleaning system

Info

Publication number
SG11202000910YA
SG11202000910YA SG11202000910YA SG11202000910YA SG11202000910YA SG 11202000910Y A SG11202000910Y A SG 11202000910YA SG 11202000910Y A SG11202000910Y A SG 11202000910YA SG 11202000910Y A SG11202000910Y A SG 11202000910YA SG 11202000910Y A SG11202000910Y A SG 11202000910YA
Authority
SG
Singapore
Prior art keywords
ultrasonic cleaning
cleaning device
cleaning system
ultrasonic
cleaning
Prior art date
Application number
SG11202000910YA
Inventor
Keisuke Ohata
Noriyuki Sakamoto
Original Assignee
Kaijo Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaijo Kk filed Critical Kaijo Kk
Publication of SG11202000910YA publication Critical patent/SG11202000910YA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • B08B3/123Cleaning travelling work, e.g. webs, articles on a conveyor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/041Cleaning travelling work
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2240/00Type of materials or objects being cleaned

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
SG11202000910YA 2017-10-25 2018-08-21 Ultrasonic cleaning device and ultrasonic cleaning system SG11202000910YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017206352A JP6763843B2 (en) 2017-10-25 2017-10-25 Ultrasonic cleaning equipment and ultrasonic cleaning system
PCT/JP2018/030784 WO2019082483A1 (en) 2017-10-25 2018-08-21 Ultrasonic cleaning device and ultrasonic cleaning system

Publications (1)

Publication Number Publication Date
SG11202000910YA true SG11202000910YA (en) 2020-05-28

Family

ID=66246469

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202000910YA SG11202000910YA (en) 2017-10-25 2018-08-21 Ultrasonic cleaning device and ultrasonic cleaning system

Country Status (7)

Country Link
US (1) US11618060B2 (en)
JP (1) JP6763843B2 (en)
KR (1) KR102265639B1 (en)
CN (1) CN210497445U (en)
SG (1) SG11202000910YA (en)
TW (2) TWI712454B (en)
WO (1) WO2019082483A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102216351B1 (en) 2020-08-21 2021-02-17 (주)네온테크 Semiconductor Chip Washing Machine And Semiconductor Chip Making Method Using The Same
KR102370323B1 (en) 2020-08-27 2022-03-04 김신자 Ultrasonic device for substrate cleaning and cleaning system using the same
JP7282472B2 (en) * 2020-09-28 2023-05-29 株式会社カイジョー ultrasonic shower cleaner
JPWO2022064680A1 (en) * 2020-09-28 2022-03-31
CN112371673A (en) * 2020-11-30 2021-02-19 东莞市伟基再生资源集中处理中心有限公司 Automatic belt cleaning device of printing ink bucket

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03258381A (en) 1990-03-07 1991-11-18 Shimada Phys & Chem Ind Co Ltd Ultrasonic cleaning machine
JPH03259523A (en) * 1990-03-09 1991-11-19 Hitachi Ltd Washing equipment
JPH08168730A (en) * 1994-10-21 1996-07-02 Mk Seiko Co Ltd Flowing water type ultrasonic washing apparatus
DE19629705A1 (en) * 1996-07-24 1998-01-29 Joachim Dr Scheerer Ultrasonic cleaning especially of wafer
JPH1133506A (en) * 1997-07-24 1999-02-09 Tadahiro Omi Fluid treatment device and cleaning treatment system
JPH10296199A (en) * 1997-04-30 1998-11-10 Shibaura Eng Works Co Ltd Ultrasonic washing device
JP3722337B2 (en) * 1998-05-28 2005-11-30 忠弘 大見 Wet processing equipment
JP3256198B2 (en) 1999-06-23 2002-02-12 株式会社カイジョー Ultrasonic shower cleaning equipment
JP2001198538A (en) * 2000-01-20 2001-07-24 Kaijo Corp Ultrasonic cleaning device
JP2003181394A (en) * 2001-12-14 2003-07-02 Honda Electronic Co Ltd Ultrasonic cleaning method and device used in the same
JP2003320330A (en) * 2002-05-07 2003-11-11 Honda Electronic Co Ltd Ultrasonic cleaning apparatus
JP3984196B2 (en) 2003-06-24 2007-10-03 アルプス電気株式会社 Ultrasonic vibration device and wet processing device using the same
JP2005013960A (en) * 2003-06-30 2005-01-20 Tokyo Ohka Kogyo Co Ltd Apparatus and method for cleaning substrate
JP3927936B2 (en) 2003-09-09 2007-06-13 株式会社カイジョー Single wafer cleaning method and cleaning apparatus
JP4036815B2 (en) * 2003-10-31 2008-01-23 シャープ株式会社 Cleaning device
JP5072062B2 (en) * 2006-03-13 2012-11-14 栗田工業株式会社 Method, apparatus and apparatus for producing hydrogen gas-dissolved cleaning water
JP2009061359A (en) * 2007-09-04 2009-03-26 Shimada Phys & Chem Ind Co Ltd Ultrasonic cleaning apparatus
JP5183777B2 (en) * 2011-07-12 2013-04-17 株式会社カイジョー Ultrasonic cleaning apparatus and ultrasonic cleaning method
KR101336996B1 (en) * 2012-02-29 2013-12-04 주식회사 듀라소닉 Ultrasonic washing apparatus for large area panel
JP5701822B2 (en) * 2012-06-20 2015-04-15 東レエンジニアリング株式会社 Cleaning apparatus and cleaning method
KR101599250B1 (en) * 2014-03-19 2016-03-03 주식회사 듀라소닉 Ultrasonic washing apparatus for large area panel

Also Published As

Publication number Publication date
TWI712454B (en) 2020-12-11
KR102265639B1 (en) 2021-06-17
TW201916944A (en) 2019-05-01
US20210331215A1 (en) 2021-10-28
JP6763843B2 (en) 2020-09-30
TWI756611B (en) 2022-03-01
US11618060B2 (en) 2023-04-04
KR20190113878A (en) 2019-10-08
CN210497445U (en) 2020-05-12
JP2019076847A (en) 2019-05-23
WO2019082483A1 (en) 2019-05-02
TW202014251A (en) 2020-04-16

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