SG11201906706UA - Shutter device and control method therefor, mask aligner and exposure dose control method therefor - Google Patents
Shutter device and control method therefor, mask aligner and exposure dose control method thereforInfo
- Publication number
- SG11201906706UA SG11201906706UA SG11201906706UA SG11201906706UA SG11201906706UA SG 11201906706U A SG11201906706U A SG 11201906706UA SG 11201906706U A SG11201906706U A SG 11201906706UA SG 11201906706U A SG11201906706U A SG 11201906706UA SG 11201906706U A SG11201906706U A SG 11201906706UA
- Authority
- SG
- Singapore
- Prior art keywords
- control method
- method therefor
- assembly
- guide track
- coil assembly
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B9/00—Exposure-making shutters; Diaphragms
- G03B9/08—Shutters
- G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
- G03B9/18—More than two members
- G03B9/22—More than two members each moving in one direction to open and then in opposite direction to close, e.g. iris type
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/005—Diaphragms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
- G02B26/023—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light comprising movable attenuating elements, e.g. neutral density filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B9/00—Exposure-making shutters; Diaphragms
- G03B9/08—Shutters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B9/00—Exposure-making shutters; Diaphragms
- G03B9/08—Shutters
- G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B9/00—Exposure-making shutters; Diaphragms
- G03B9/08—Shutters
- G03B9/10—Blade or disc rotating or pivoting about axis normal to its plane
- G03B9/14—Two separate members moving in opposite directions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B9/00—Exposure-making shutters; Diaphragms
- G03B9/58—Means for varying duration of "open" period of shutter
- G03B9/60—Means for varying duration of "open" period of shutter by varying speed of movement of obturating members
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B9/00—Exposure-making shutters; Diaphragms
- G03B9/58—Means for varying duration of "open" period of shutter
- G03B9/62—Means for varying duration of "open" period of shutter by varying interval of time between end of opening movement and beginning of closing movement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K33/00—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system
- H02K33/12—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system with armatures moving in alternate directions by alternate energisation of two coil systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Power Engineering (AREA)
- Shutters For Cameras (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Operating, Guiding And Securing Of Roll- Type Closing Members (AREA)
Abstract
Disclosed are a shutter device and a control method therefor, a mask aligner and an exposure dose control method therefor. The shutter device comprises: a light blocking unit and a voice coil motor (), wherein the voice coil motor (100) comprises a permanent magnet module (110), a guide track assembly (120) and a coil assembly (130). The coil assembly (130) is arranged on the guide track assembly (120). The permanent magnet module (110) generates a magnetic field inside the guide track assembly (120). The light blocking unit comprises two shutter blades (200). The shutter blades (200) are connected to the coil assembly (130). After being energised, the coil assembly (130) generates magnetic fields the opposite of or the same as the magnetic field in the guide track assembly (120), so that the coil assembly (130) moves forwards or reversely along the guide track assembly (120) to drive the opening or closing of the two shutter blades (200). By means of directly connecting the coil assembly (130) of the voice coil motor (100) to the light blocking unit, the opening and closing time of the shutter blades (200) is greatly reduced, thus increasing a small-dose exposure yield and increasing the light source utilisation rate in unit time. 20
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710061013.3A CN108345157B (en) | 2017-01-25 | 2017-01-25 | Shutter device and its control method, litho machine and its exposure dose control method |
PCT/CN2018/074089 WO2018137676A1 (en) | 2017-01-25 | 2018-01-25 | Shutter device and control method therefor, mask aligner and exposure dose control method therefor |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201906706UA true SG11201906706UA (en) | 2019-08-27 |
Family
ID=62962438
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201906706UA SG11201906706UA (en) | 2017-01-25 | 2018-01-25 | Shutter device and control method therefor, mask aligner and exposure dose control method therefor |
Country Status (8)
Country | Link |
---|---|
US (1) | US10983415B2 (en) |
EP (1) | EP3575861B1 (en) |
JP (1) | JP6909858B2 (en) |
KR (1) | KR102259532B1 (en) |
CN (1) | CN108345157B (en) |
SG (1) | SG11201906706UA (en) |
TW (1) | TWI658338B (en) |
WO (1) | WO2018137676A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112782938B (en) * | 2019-11-05 | 2022-10-14 | 上海微电子装备(集团)股份有限公司 | Movable slit device and photoetching system |
CN113037978B (en) * | 2021-03-12 | 2023-05-02 | 新思考电机有限公司 | Shutter driving device, shutter, imaging device, and electronic component |
TWI804212B (en) * | 2022-02-25 | 2023-06-01 | 大立光電股份有限公司 | Controllable aperture stop, compact camera module and electronic device |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH558542A (en) * | 1973-07-19 | 1975-01-31 | Sinar Ag Schaffhausen | LOCKING DEVICE FOR PHOTOGRAPHIC CAMERA. |
US4265530A (en) * | 1979-06-05 | 1981-05-05 | Polaroid Corporation | Shutter blade drive system |
JPS564127A (en) * | 1979-06-22 | 1981-01-17 | Canon Inc | Electromagnetic drive shutter |
US4839679A (en) * | 1987-06-18 | 1989-06-13 | General Electric Corp. | Dual voice coil shutter |
CN2075349U (en) * | 1989-08-31 | 1991-04-17 | 袁凯鸿 | Camera shutter system |
JP2856584B2 (en) | 1991-11-27 | 1999-02-10 | キヤノン株式会社 | Camera with shutter device |
US5706120A (en) * | 1996-04-24 | 1998-01-06 | Eastman Kodak Company | Device for controlling an amount of light allowed to reach a photosensitive surface |
GB9714134D0 (en) * | 1997-07-05 | 1997-09-10 | Lumonics Ltd | Method and apparatus for actuating a shutter |
US6046836A (en) * | 1998-03-06 | 2000-04-04 | Electro-Optical Products Corporation | Low frequency optical shutter |
JP3862438B2 (en) * | 1998-12-28 | 2006-12-27 | キヤノン株式会社 | Scanning exposure apparatus, scanning exposure method, and device manufacturing method |
US7513702B2 (en) * | 2005-11-16 | 2009-04-07 | Va, Inc. | Non-contact shutter activation system and method |
JP5154766B2 (en) * | 2006-04-24 | 2013-02-27 | キヤノン電子株式会社 | Optical path switching device and camera incorporating the same |
US7771132B2 (en) * | 2006-08-04 | 2010-08-10 | Tamron Co., Ltd. | Shutter unit, shutter unit with built-in lens, and imaging apparatus |
CN102073192B (en) * | 2009-11-23 | 2015-09-09 | Lg伊诺特有限公司 | Shutter device |
CN102087476A (en) * | 2009-12-08 | 2011-06-08 | 上海微电子装备有限公司 | Shutter device for exposure subsystem of photoetching machine |
CN102540633A (en) * | 2011-12-27 | 2012-07-04 | 中国科学院长春光学精密机械与物理研究所 | Quick opening and retaining control system for electromagnetic mechanical shutter |
CA2892158C (en) * | 2012-11-26 | 2020-12-08 | Thorlabs, Inc. | Bi-stable electromagnetically controlled shutter |
CN105807572B (en) * | 2014-12-31 | 2018-03-30 | 上海微电子装备(集团)股份有限公司 | A kind of self-damping shutter device for exposure subsystem of photoetching machine |
CN108663871B (en) * | 2017-03-31 | 2021-06-25 | 上海微电子装备(集团)股份有限公司 | Shutter device |
US10771710B2 (en) * | 2018-10-22 | 2020-09-08 | Raytheon Company | Shutter assembly for managing light relative to a photosensitive device |
-
2017
- 2017-01-25 CN CN201710061013.3A patent/CN108345157B/en active Active
-
2018
- 2018-01-25 WO PCT/CN2018/074089 patent/WO2018137676A1/en unknown
- 2018-01-25 KR KR1020197024058A patent/KR102259532B1/en active IP Right Grant
- 2018-01-25 JP JP2019539864A patent/JP6909858B2/en active Active
- 2018-01-25 US US16/480,639 patent/US10983415B2/en active Active
- 2018-01-25 SG SG11201906706UA patent/SG11201906706UA/en unknown
- 2018-01-25 TW TW107102609A patent/TWI658338B/en active
- 2018-01-25 EP EP18744361.9A patent/EP3575861B1/en active Active
Also Published As
Publication number | Publication date |
---|---|
TW201842409A (en) | 2018-12-01 |
EP3575861B1 (en) | 2022-10-05 |
JP6909858B2 (en) | 2021-07-28 |
US20190391463A1 (en) | 2019-12-26 |
US10983415B2 (en) | 2021-04-20 |
KR102259532B1 (en) | 2021-06-02 |
EP3575861A1 (en) | 2019-12-04 |
JP2020505642A (en) | 2020-02-20 |
WO2018137676A1 (en) | 2018-08-02 |
CN108345157B (en) | 2019-07-23 |
EP3575861A4 (en) | 2020-02-12 |
CN108345157A (en) | 2018-07-31 |
KR20190102292A (en) | 2019-09-03 |
TWI658338B (en) | 2019-05-01 |
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