SG11201803506UA - Polishing pad with foundation layer and window attached thereto - Google Patents
Polishing pad with foundation layer and window attached theretoInfo
- Publication number
- SG11201803506UA SG11201803506UA SG11201803506UA SG11201803506UA SG11201803506UA SG 11201803506U A SG11201803506U A SG 11201803506UA SG 11201803506U A SG11201803506U A SG 11201803506UA SG 11201803506U A SG11201803506U A SG 11201803506UA SG 11201803506U A SG11201803506U A SG 11201803506UA
- Authority
- SG
- Singapore
- Prior art keywords
- polishing pad
- foundation layer
- window attached
- window
- attached
- Prior art date
Links
- 238000005498 polishing Methods 0.000 title 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/12—Lapping plates for working plane surfaces
- B24B37/16—Lapping plates for working plane surfaces characterised by the shape of the lapping plate surface, e.g. grooved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/26—Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/931,737 US9868185B2 (en) | 2015-11-03 | 2015-11-03 | Polishing pad with foundation layer and window attached thereto |
PCT/US2016/059985 WO2017079196A1 (en) | 2015-11-03 | 2016-11-02 | Polishing pad with foundation layer and window attached thereto |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201803506UA true SG11201803506UA (en) | 2018-05-30 |
Family
ID=58637174
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201803506UA SG11201803506UA (en) | 2015-11-03 | 2016-11-02 | Polishing pad with foundation layer and window attached thereto |
Country Status (9)
Country | Link |
---|---|
US (1) | US9868185B2 (en) |
EP (1) | EP3370917A4 (en) |
JP (1) | JP7000320B2 (en) |
KR (1) | KR102634723B1 (en) |
CN (1) | CN108349060B (en) |
MY (1) | MY191753A (en) |
SG (1) | SG11201803506UA (en) |
TW (1) | TWI632986B (en) |
WO (1) | WO2017079196A1 (en) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8961266B2 (en) * | 2013-03-15 | 2015-02-24 | Applied Materials, Inc. | Polishing pad with secondary window seal |
TWI549781B (en) * | 2015-08-07 | 2016-09-21 | 智勝科技股份有限公司 | Polishing pad, polishing system and polishing method |
TWI593511B (en) * | 2016-06-08 | 2017-08-01 | 智勝科技股份有限公司 | Polishing pad and polishing method |
US10864612B2 (en) * | 2016-12-14 | 2020-12-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Polishing pad and method of using |
TWI650202B (en) * | 2017-08-22 | 2019-02-11 | 智勝科技股份有限公司 | Polishing pad, manufacturing method of a polishing pad and polishing method |
TW202122572A (en) | 2019-08-09 | 2021-06-16 | 日商宇部興產股份有限公司 | Method for producing exosome |
CN113246015B (en) * | 2021-05-25 | 2022-09-20 | 万华化学集团电子材料有限公司 | Polishing pad with end point detection window and application thereof |
KR102623920B1 (en) * | 2021-07-27 | 2024-01-10 | 에스케이엔펄스 주식회사 | Polishing pad and preparing method of semiconductor device using the same |
KR102624629B1 (en) * | 2021-11-19 | 2024-01-15 | 에스케이하이닉스 주식회사 | Window insert type polishing pad and method for manufacturing the same |
CN115056137A (en) * | 2022-06-20 | 2022-09-16 | 万华化学集团电子材料有限公司 | Polishing pad with grinding consistency end point detection window and application thereof |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5893796A (en) * | 1995-03-28 | 1999-04-13 | Applied Materials, Inc. | Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus |
US6719818B1 (en) * | 1995-03-28 | 2004-04-13 | Applied Materials, Inc. | Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations |
US5966766A (en) * | 1997-10-06 | 1999-10-19 | Advanced Micro Devices, Inc. | Apparatus and method for cleaning semiconductor wafer |
US6832950B2 (en) * | 2002-10-28 | 2004-12-21 | Applied Materials, Inc. | Polishing pad with window |
US6994607B2 (en) | 2001-12-28 | 2006-02-07 | Applied Materials, Inc. | Polishing pad with window |
US6524164B1 (en) * | 1999-09-14 | 2003-02-25 | Applied Materials, Inc. | Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus |
WO2001023141A1 (en) * | 1999-09-29 | 2001-04-05 | Rodel Holdings, Inc. | Polishing pad |
US8485862B2 (en) * | 2000-05-19 | 2013-07-16 | Applied Materials, Inc. | Polishing pad for endpoint detection and related methods |
TWI220405B (en) | 2002-11-19 | 2004-08-21 | Iv Technologies Co Ltd | Method of fabricating a polishing pad having a detection window thereon |
JP4744087B2 (en) * | 2003-02-06 | 2011-08-10 | 東洋ゴム工業株式会社 | Polishing pad and semiconductor device manufacturing method |
US6997777B2 (en) | 2003-06-17 | 2006-02-14 | Cabot Microelectronics Corporation | Ultrasonic welding method for the manufacture of a polishing pad comprising an optically transmissive region |
US8066552B2 (en) * | 2003-10-03 | 2011-11-29 | Applied Materials, Inc. | Multi-layer polishing pad for low-pressure polishing |
US6984163B2 (en) * | 2003-11-25 | 2006-01-10 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Polishing pad with high optical transmission window |
US7179151B1 (en) | 2006-03-27 | 2007-02-20 | Freescale Semiconductor, Inc. | Polishing pad, a polishing apparatus, and a process for using the polishing pad |
JP2007307639A (en) * | 2006-05-17 | 2007-11-29 | Toyo Tire & Rubber Co Ltd | Polishing pad |
JP5274798B2 (en) * | 2007-08-20 | 2013-08-28 | 東洋ゴム工業株式会社 | Polishing pad and manufacturing method thereof |
CN102281990A (en) * | 2009-01-16 | 2011-12-14 | 应用材料股份有限公司 | Polishing pad and system with window support |
US8585790B2 (en) * | 2009-04-23 | 2013-11-19 | Applied Materials, Inc. | Treatment of polishing pad window |
US8393940B2 (en) * | 2010-04-16 | 2013-03-12 | Applied Materials, Inc. | Molding windows in thin pads |
JP5893479B2 (en) * | 2011-04-21 | 2016-03-23 | 東洋ゴム工業株式会社 | Laminated polishing pad |
JP5945874B2 (en) | 2011-10-18 | 2016-07-05 | 富士紡ホールディングス株式会社 | Polishing pad and manufacturing method thereof |
US9067297B2 (en) | 2011-11-29 | 2015-06-30 | Nexplanar Corporation | Polishing pad with foundation layer and polishing surface layer |
KR101685678B1 (en) * | 2011-11-29 | 2016-12-12 | 넥스플래너 코퍼레이션 | Polishing pad with foundation layer and polishing surface layer |
JP5389973B2 (en) * | 2012-04-11 | 2014-01-15 | 東洋ゴム工業株式会社 | Multilayer polishing pad and manufacturing method thereof |
US9597769B2 (en) | 2012-06-04 | 2017-03-21 | Nexplanar Corporation | Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layer |
US9186772B2 (en) | 2013-03-07 | 2015-11-17 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad with broad spectrum, endpoint detection window and method of polishing therewith |
US8961266B2 (en) | 2013-03-15 | 2015-02-24 | Applied Materials, Inc. | Polishing pad with secondary window seal |
US9102034B2 (en) * | 2013-08-30 | 2015-08-11 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Method of chemical mechanical polishing a substrate |
US9259820B2 (en) * | 2014-03-28 | 2016-02-16 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Chemical mechanical polishing pad with polishing layer and window |
-
2015
- 2015-11-03 US US14/931,737 patent/US9868185B2/en active Active
-
2016
- 2016-11-02 CN CN201680066823.1A patent/CN108349060B/en active Active
- 2016-11-02 SG SG11201803506UA patent/SG11201803506UA/en unknown
- 2016-11-02 MY MYPI2018701707A patent/MY191753A/en unknown
- 2016-11-02 KR KR1020187015272A patent/KR102634723B1/en active IP Right Grant
- 2016-11-02 TW TW105135433A patent/TWI632986B/en active
- 2016-11-02 EP EP16862819.6A patent/EP3370917A4/en active Pending
- 2016-11-02 WO PCT/US2016/059985 patent/WO2017079196A1/en active Application Filing
- 2016-11-02 JP JP2018521513A patent/JP7000320B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP7000320B2 (en) | 2022-01-19 |
US9868185B2 (en) | 2018-01-16 |
EP3370917A4 (en) | 2019-08-21 |
CN108349060B (en) | 2021-01-05 |
JP2018533489A (en) | 2018-11-15 |
KR102634723B1 (en) | 2024-02-08 |
CN108349060A (en) | 2018-07-31 |
MY191753A (en) | 2022-07-14 |
US20170120417A1 (en) | 2017-05-04 |
WO2017079196A1 (en) | 2017-05-11 |
EP3370917A1 (en) | 2018-09-12 |
KR20180064550A (en) | 2018-06-14 |
TWI632986B (en) | 2018-08-21 |
TW201726315A (en) | 2017-08-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG11201803506UA (en) | Polishing pad with foundation layer and window attached thereto | |
DE102015003240A8 (en) | CHEMICAL-MECHANICAL POLISHING CUSHION WITH POLISHING LAYER AND WINDOW | |
SG11201608219WA (en) | Polishing pads and systems and methods of making and using the same | |
SG11201705917PA (en) | Low density polishing pad | |
IL263480B (en) | Polishing pad and polishing method using same | |
GB201408727D0 (en) | Improved plasmonic structures and devices | |
SG11201609296XA (en) | Polishing pad and method for manufacturing the same | |
GB201401617D0 (en) | Novel combination and use | |
EP2974829A4 (en) | Polishing pad and polishing method | |
EP3203096A4 (en) | Bearing and bearing pad | |
HK1249447A1 (en) | Igfbp3 and uses thereof | |
HK1243950A1 (en) | Novel combination and use | |
TWI560599B (en) | Touch panel and bonding pad structure thereof | |
SG11201707842PA (en) | Polishing pad | |
SG11201607461PA (en) | Polishing composition and polishing method using the same | |
SG11201608128UA (en) | Polishing composition and polishing method | |
EP3326751A4 (en) | Polishing pad and polishing method | |
GB2514927B (en) | Thiamethoxam and uses thereof | |
ZA201703649B (en) | Track pads and track assembly | |
GB201710979D0 (en) | Formulation and layer | |
GB2551806B (en) | Interface with buffered and direct pathways | |
SG11201705563QA (en) | Method for raising polishing pad and polishing method | |
GB201610711D0 (en) | Interacting with application beneath transparent layer | |
GB2545300B (en) | Layer Pad with Raised Formations | |
GB201813934D0 (en) | Thiamethoxam and uses thereof |