SG11201609890VA - Imprint apparatus and method of manufacturing article - Google Patents
Imprint apparatus and method of manufacturing articleInfo
- Publication number
- SG11201609890VA SG11201609890VA SG11201609890VA SG11201609890VA SG11201609890VA SG 11201609890V A SG11201609890V A SG 11201609890VA SG 11201609890V A SG11201609890V A SG 11201609890VA SG 11201609890V A SG11201609890V A SG 11201609890VA SG 11201609890V A SG11201609890V A SG 11201609890VA
- Authority
- SG
- Singapore
- Prior art keywords
- imprint apparatus
- manufacturing article
- article
- manufacturing
- imprint
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014119110A JP6415120B2 (en) | 2014-06-09 | 2014-06-09 | Imprint apparatus and article manufacturing method |
PCT/JP2015/064668 WO2015190259A1 (en) | 2014-06-09 | 2015-05-15 | Imprint apparatus and method of manufacturing article |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201609890VA true SG11201609890VA (en) | 2016-12-29 |
Family
ID=54833364
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201609890VA SG11201609890VA (en) | 2014-06-09 | 2015-05-15 | Imprint apparatus and method of manufacturing article |
Country Status (7)
Country | Link |
---|---|
US (1) | US10228616B2 (en) |
JP (1) | JP6415120B2 (en) |
KR (1) | KR101937009B1 (en) |
CN (1) | CN106415787B (en) |
SG (1) | SG11201609890VA (en) |
TW (1) | TWI625761B (en) |
WO (1) | WO2015190259A1 (en) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2005975A (en) * | 2010-03-03 | 2011-09-06 | Asml Netherlands Bv | Imprint lithography. |
JP6799397B2 (en) * | 2015-08-10 | 2020-12-16 | キヤノン株式会社 | Imprinting equipment and manufacturing method of articles |
JP6679328B2 (en) | 2016-02-01 | 2020-04-15 | キヤノン株式会社 | Imprint apparatus, control method, and article manufacturing method |
WO2019078060A1 (en) * | 2017-10-17 | 2019-04-25 | キヤノン株式会社 | Imprint device and article manufacturing method |
CN111247623B (en) * | 2017-10-17 | 2024-03-08 | 佳能株式会社 | Imprint apparatus and article manufacturing method |
JP7116552B2 (en) * | 2018-02-13 | 2022-08-10 | キヤノン株式会社 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD |
EP3817908A1 (en) * | 2018-07-03 | 2021-05-12 | TC TECH Sweden AB (publ) | Method and tool for embossing |
US10976657B2 (en) * | 2018-08-31 | 2021-04-13 | Canon Kabushiki Kaisha | System and method for illuminating edges of an imprint field with a gradient dosage |
JP7121653B2 (en) * | 2018-12-28 | 2022-08-18 | キヤノン株式会社 | Film forming apparatus and article manufacturing method |
JP7327973B2 (en) * | 2019-03-29 | 2023-08-16 | キヤノン株式会社 | IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD |
JP7337670B2 (en) * | 2019-11-15 | 2023-09-04 | キヤノン株式会社 | IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD |
KR102227885B1 (en) * | 2020-06-02 | 2021-03-15 | 주식회사 기가레인 | Transfer apparatus capable of pattern alignment |
JP2022038752A (en) * | 2020-08-27 | 2022-03-10 | キヤノン株式会社 | Substrate processing method, substrate holding device, molding device, and manufacturing method for article |
KR102586152B1 (en) * | 2020-11-04 | 2023-10-06 | 한국기계연구원 | Manufacturing apparatus and method of polarization filter |
CN115356794A (en) * | 2022-09-15 | 2022-11-18 | 苏州晶方光电科技有限公司 | Imprint curing equipment, manufacturing method and application of wafer-level micro-lens array |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4166541A (en) * | 1977-08-30 | 1979-09-04 | E. I. Du Pont De Nemours And Company | Binary patterned web inspection |
US6955767B2 (en) * | 2001-03-22 | 2005-10-18 | Hewlett-Packard Development Company, Lp. | Scanning probe based lithographic alignment |
JP3809095B2 (en) | 2001-11-29 | 2006-08-16 | ペンタックス株式会社 | Light source system for exposure apparatus and exposure apparatus |
US20080160129A1 (en) | 2006-05-11 | 2008-07-03 | Molecular Imprints, Inc. | Template Having a Varying Thickness to Facilitate Expelling a Gas Positioned Between a Substrate and the Template |
JP2006188054A (en) * | 2002-08-29 | 2006-07-20 | Toppan Printing Co Ltd | Pattern forming apparatus |
JP2006005022A (en) | 2004-06-15 | 2006-01-05 | Dainippon Printing Co Ltd | Imprinting method and imprinting apparatus |
EP1617293A1 (en) * | 2004-07-14 | 2006-01-18 | Universität Kassel | A method of aligning a first article relative to a second article and an apparatus for aligning a first article relative to a second article |
US7800455B2 (en) * | 2005-04-27 | 2010-09-21 | Semiconductor Energy Laboratories Co., Ltd. | PLL circuit and semiconductor device having the same |
US7803308B2 (en) * | 2005-12-01 | 2010-09-28 | Molecular Imprints, Inc. | Technique for separating a mold from solidified imprinting material |
JP4715595B2 (en) * | 2006-03-31 | 2011-07-06 | ブラザー工業株式会社 | Optical scanner and image forming apparatus having the same |
JP2007280993A (en) | 2006-04-03 | 2007-10-25 | Seiko Epson Corp | Hologram exposure apparatus, hologram exposure method, method of manufacturing semiconductor device and method of manufacturing electro-optical device |
TWI457723B (en) * | 2006-09-08 | 2014-10-21 | 尼康股份有限公司 | A mask, an exposure device, and an element manufacturing method |
US7832416B2 (en) * | 2006-10-10 | 2010-11-16 | Hewlett-Packard Development Company, L.P. | Imprint lithography apparatus and methods |
NL2003380A (en) | 2008-10-17 | 2010-04-20 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
JP2010237189A (en) * | 2009-03-11 | 2010-10-21 | Fujifilm Corp | Three-dimensional shape measuring method and device |
US20110084417A1 (en) * | 2009-10-08 | 2011-04-14 | Molecular Imprints, Inc. | Large area linear array nanoimprinting |
JP5495767B2 (en) * | 2009-12-21 | 2014-05-21 | キヤノン株式会社 | Imprint apparatus and method, and article manufacturing method |
JP5451450B2 (en) * | 2010-02-24 | 2014-03-26 | キヤノン株式会社 | Imprint apparatus, template thereof, and article manufacturing method |
US8303074B2 (en) * | 2010-06-30 | 2012-11-06 | Eastman Kodak Company | Printer with uniform illumination for media identification |
JP2012016829A (en) * | 2010-07-06 | 2012-01-26 | Alps Electric Co Ltd | Imprint apparatus |
JPWO2012020741A1 (en) * | 2010-08-12 | 2013-10-28 | 株式会社日立ハイテクノロジーズ | Optical imprint method and apparatus |
JP2012199329A (en) * | 2011-03-18 | 2012-10-18 | Tokyo Electron Ltd | Etching method and imprint device |
JP5864929B2 (en) | 2011-07-15 | 2016-02-17 | キヤノン株式会社 | Imprint apparatus and article manufacturing method |
JP5535164B2 (en) | 2011-09-22 | 2014-07-02 | 株式会社東芝 | Imprint method and imprint apparatus |
JP5686779B2 (en) * | 2011-10-14 | 2015-03-18 | キヤノン株式会社 | Imprint apparatus and article manufacturing method using the same |
JP2013175604A (en) * | 2012-02-24 | 2013-09-05 | Toshiba Corp | Pattern forming device, pattern forming method, and method for manufacturing semiconductor device |
JP2013207060A (en) * | 2012-03-28 | 2013-10-07 | Sony Corp | Structure forming apparatus, structure manufacturing method, and structure |
-
2014
- 2014-06-09 JP JP2014119110A patent/JP6415120B2/en active Active
-
2015
- 2015-05-15 US US15/300,845 patent/US10228616B2/en active Active
- 2015-05-15 WO PCT/JP2015/064668 patent/WO2015190259A1/en active Application Filing
- 2015-05-15 CN CN201580030048.XA patent/CN106415787B/en active Active
- 2015-05-15 KR KR1020167036489A patent/KR101937009B1/en active IP Right Grant
- 2015-05-15 SG SG11201609890VA patent/SG11201609890VA/en unknown
- 2015-05-21 TW TW104116249A patent/TWI625761B/en active
Also Published As
Publication number | Publication date |
---|---|
KR20170010001A (en) | 2017-01-25 |
US20170023857A1 (en) | 2017-01-26 |
TW201601197A (en) | 2016-01-01 |
JP2015233071A (en) | 2015-12-24 |
US10228616B2 (en) | 2019-03-12 |
TWI625761B (en) | 2018-06-01 |
WO2015190259A1 (en) | 2015-12-17 |
KR101937009B1 (en) | 2019-01-09 |
JP6415120B2 (en) | 2018-10-31 |
CN106415787B (en) | 2019-06-18 |
CN106415787A (en) | 2017-02-15 |
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