SG11201510649VA - Decorative hipims hard material layers - Google Patents

Decorative hipims hard material layers

Info

Publication number
SG11201510649VA
SG11201510649VA SG11201510649VA SG11201510649VA SG11201510649VA SG 11201510649V A SG11201510649V A SG 11201510649VA SG 11201510649V A SG11201510649V A SG 11201510649VA SG 11201510649V A SG11201510649V A SG 11201510649VA SG 11201510649V A SG11201510649V A SG 11201510649VA
Authority
SG
Singapore
Prior art keywords
hipims
decorative
material layers
hard material
hard
Prior art date
Application number
SG11201510649VA
Inventor
Siegfried Krassnitzer
Original Assignee
Oerlikon Trading Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag filed Critical Oerlikon Trading Ag
Publication of SG11201510649VA publication Critical patent/SG11201510649VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0042—Controlling partial pressure or flow rate of reactive or inert gases with feedback of measurements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0057—Reactive sputtering using reactive gases other than O2, H2O, N2, NH3 or CH4
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0664—Carbonitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3485—Sputtering using pulsed power to the target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3492—Variation of parameters during sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H01J37/3429—Plural materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3464—Operating strategies
    • H01J37/3467—Pulsed operation, e.g. HIPIMS

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
SG11201510649VA 2013-06-26 2014-06-26 Decorative hipims hard material layers SG11201510649VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201361839454P 2013-06-26 2013-06-26
PCT/EP2014/063611 WO2014207154A1 (en) 2013-06-26 2014-06-26 Decorative hipims hard material layers

Publications (1)

Publication Number Publication Date
SG11201510649VA true SG11201510649VA (en) 2016-01-28

Family

ID=51014298

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201510649VA SG11201510649VA (en) 2013-06-26 2014-06-26 Decorative hipims hard material layers

Country Status (17)

Country Link
US (1) US11060181B2 (en)
EP (1) EP3013996B1 (en)
JP (1) JP6426726B2 (en)
KR (1) KR102274981B1 (en)
CN (1) CN105683409B (en)
BR (1) BR112015032334B1 (en)
CA (1) CA2916640A1 (en)
ES (1) ES2636867T3 (en)
IL (1) IL243283B (en)
MX (1) MX2015017868A (en)
MY (1) MY181967A (en)
PH (1) PH12015502837A1 (en)
PL (1) PL3013996T3 (en)
PT (1) PT3013996T (en)
RU (1) RU2016102152A (en)
SG (1) SG11201510649VA (en)
WO (1) WO2014207154A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TR201902064T4 (en) * 2015-02-24 2019-03-21 Oerlikon Surface Solutions Ag Pfaeffikon High performance coating for cold metal forming of high strength steel.
RU2742325C2 (en) * 2016-04-22 2021-02-04 Эрликон Серфиз Солюшнз Аг, Пфеффикон Ticn with reduced growth defects with hipims
EP3607110B1 (en) * 2017-04-07 2023-11-01 Sandvik Intellectual Property AB Coated cutting tool
EP3406751A1 (en) * 2017-05-24 2018-11-28 Walter Ag A coated cutting tool and a method for its production
KR102517388B1 (en) * 2017-09-15 2023-04-03 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 Methods of making coatings with colored surfaces
DE102020124032A1 (en) * 2020-09-15 2022-03-17 Cemecon Ag. Split pulse coating apparatus and method

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US4393120A (en) 1980-09-26 1983-07-12 Yuken Industry Co., Ltd. Plastic coated with golden evaporated film
DE3150039A1 (en) 1981-12-17 1983-06-23 W.C. Heraeus Gmbh, 6450 Hanau Dental prostheses with gold-coloured coating
JPS58153776A (en) 1982-03-05 1983-09-12 Citizen Watch Co Ltd Method for preparing ornamental parts and ion plating apparatus used therein
JPS6089565A (en) * 1983-10-21 1985-05-20 Seiko Instr & Electronics Ltd External parts for watch
DE3425468A1 (en) 1984-07-11 1986-01-23 Battelle-Institut E.V., 6000 Frankfurt METHOD FOR PRODUCING GOLD-TITANIUM NITRIDE LAYERS
FR2612204A1 (en) 1987-03-12 1988-09-16 Vac Tec Syst METHOD AND APPARATUS FOR VACUUM ELECTRIC ARC PLASMA DEPOSITION OF DECORATIVE COATINGS AND WEAR RESISTANT COATINGS
JPH0925562A (en) * 1995-07-10 1997-01-28 Ulvac Japan Ltd Thin anitireflection multilater coating film, formation of the same coating film and film forming device therefor
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US7147759B2 (en) * 2002-09-30 2006-12-12 Zond, Inc. High-power pulsed magnetron sputtering
US20050103620A1 (en) * 2003-11-19 2005-05-19 Zond, Inc. Plasma source with segmented magnetron cathode
US20060066248A1 (en) * 2004-09-24 2006-03-30 Zond, Inc. Apparatus for generating high current electrical discharges
DE602004020456D1 (en) * 2004-07-07 2009-05-20 Haute Ecole Arc Ne Be Ju Decorative coating by the deposition of alternating nitride layers
US20060076231A1 (en) 2004-10-12 2006-04-13 Southwest Research Institute Method for magnetron sputter deposition
DE102006061324B4 (en) * 2006-06-20 2008-07-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. A method of controlling a high power reactive pulse magnetron sputtering process and apparatus therefor
SE533395C2 (en) * 2007-06-08 2010-09-14 Sandvik Intellectual Property Ways to make PVD coatings
EP2157205B1 (en) * 2008-07-29 2011-11-30 Sulzer Metaplas GmbH A high-power pulsed magnetron sputtering process as well as a high-power electrical energy source
WO2010127845A1 (en) * 2009-05-07 2010-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method for the production of oxide and nitride coatings and its use
DE202012013052U1 (en) * 2011-02-23 2014-09-29 Schott Ag Sapphire glass disc with antireflection coating and its use
DE102011117994A1 (en) * 2011-11-09 2013-05-16 Oerlikon Trading Ag, Trübbach HIPIMS layers
US9607416B2 (en) 2013-06-21 2017-03-28 Yokogawa Electric Corporation Device for displaying a trend related to a process variable
CN103469168B (en) * 2013-08-26 2015-09-30 中国科学院宁波材料技术与工程研究所 A kind of method preparing the high hard TiAlN thin film of the controlled high smooth of wettability

Also Published As

Publication number Publication date
KR20160024915A (en) 2016-03-07
CN105683409A (en) 2016-06-15
JP6426726B2 (en) 2018-11-21
BR112015032334A8 (en) 2018-01-02
BR112015032334B1 (en) 2021-06-15
US11060181B2 (en) 2021-07-13
IL243283B (en) 2018-11-29
PT3013996T (en) 2017-07-20
CN105683409B (en) 2018-09-07
PH12015502837A1 (en) 2016-03-28
RU2016102152A (en) 2017-07-31
CA2916640A1 (en) 2014-12-31
WO2014207154A1 (en) 2014-12-31
MY181967A (en) 2021-01-15
ES2636867T3 (en) 2017-10-09
MX2015017868A (en) 2016-08-18
EP3013996B1 (en) 2017-05-10
EP3013996A1 (en) 2016-05-04
JP2016528382A (en) 2016-09-15
KR102274981B1 (en) 2021-07-09
US20160369386A1 (en) 2016-12-22
BR112015032334A2 (en) 2017-09-26
PL3013996T3 (en) 2017-10-31

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