SG11201505594XA - Method of producing carrier for use in double-side polishing apparatus and method of double-side polishing wafers - Google Patents

Method of producing carrier for use in double-side polishing apparatus and method of double-side polishing wafers

Info

Publication number
SG11201505594XA
SG11201505594XA SG11201505594XA SG11201505594XA SG11201505594XA SG 11201505594X A SG11201505594X A SG 11201505594XA SG 11201505594X A SG11201505594X A SG 11201505594XA SG 11201505594X A SG11201505594X A SG 11201505594XA SG 11201505594X A SG11201505594X A SG 11201505594XA
Authority
SG
Singapore
Prior art keywords
double
side polishing
wafers
producing carrier
polishing apparatus
Prior art date
Application number
SG11201505594XA
Inventor
Kazuya Sato
Yuki Tanaka
Syuichi Kobayashi
Kenji Iha
Toshinari Kinjo
Original Assignee
Shinetsu Handotai Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Handotai Kk filed Critical Shinetsu Handotai Kk
Publication of SG11201505594XA publication Critical patent/SG11201505594XA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/28Work carriers for double side lapping of plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/10Single-purpose machines or devices
    • B24B7/16Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings
    • B24B7/17Single-purpose machines or devices for grinding end-faces, e.g. of gauges, rollers, nuts, piston rings for simultaneously grinding opposite and parallel end faces, e.g. double disc grinders
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/24Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
    • B24B7/241Methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
SG11201505594XA 2013-02-13 2014-01-15 Method of producing carrier for use in double-side polishing apparatus and method of double-side polishing wafers SG11201505594XA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013025515 2013-02-13
JP2013250319A JP5847789B2 (en) 2013-02-13 2013-12-03 Method for manufacturing carrier for double-side polishing apparatus and double-side polishing method for wafer
PCT/JP2014/000134 WO2014125759A1 (en) 2013-02-13 2014-01-15 Method for manufacturing carrier for double-sided polishing device and double-sided wafer polishing method

Publications (1)

Publication Number Publication Date
SG11201505594XA true SG11201505594XA (en) 2015-09-29

Family

ID=51353776

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201505594XA SG11201505594XA (en) 2013-02-13 2014-01-15 Method of producing carrier for use in double-side polishing apparatus and method of double-side polishing wafers

Country Status (8)

Country Link
US (1) US9764443B2 (en)
JP (1) JP5847789B2 (en)
KR (1) KR102063846B1 (en)
CN (1) CN104968473B (en)
DE (1) DE112014000461T5 (en)
SG (1) SG11201505594XA (en)
TW (1) TWI577500B (en)
WO (1) WO2014125759A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6424809B2 (en) 2015-12-11 2018-11-21 信越半導体株式会社 Double sided polishing method of wafer
JP6443370B2 (en) 2016-03-18 2018-12-26 信越半導体株式会社 Method for manufacturing carrier for double-side polishing apparatus and double-side polishing method for wafer
CN106078493A (en) * 2016-06-23 2016-11-09 上海汉虹精密机械有限公司 The method of ceramic disk grinding wheel twin grinding processing sapphire wafer
JP6579056B2 (en) * 2016-07-29 2019-09-25 株式会社Sumco Wafer double-side polishing method
JP6593318B2 (en) * 2016-12-20 2019-10-23 株式会社Sumco Carrier plate thickness adjustment method
JP6665827B2 (en) * 2017-04-20 2020-03-13 信越半導体株式会社 Wafer double-side polishing method
CN109129028B (en) * 2017-06-15 2021-11-12 北京天科合达半导体股份有限公司 High-efficiency processing method of silicon carbide wafer
JP6743785B2 (en) * 2017-08-30 2020-08-19 株式会社Sumco Carrier manufacturing method and wafer polishing method
CN108000245B (en) * 2017-11-30 2019-05-10 东莞长盈精密技术有限公司 Hole polishing turned-down edge means of defence
JP6870623B2 (en) * 2018-01-18 2021-05-12 信越半導体株式会社 Carrier manufacturing method and wafer double-sided polishing method
JP7276246B2 (en) * 2020-05-19 2023-05-18 信越半導体株式会社 Method for manufacturing carrier for double-side polishing machine and method for polishing both sides of wafer
CN111745535B (en) * 2020-07-07 2022-09-02 郑州宇光复合材料有限公司 Cell-phone glass grinds uses wear-resisting protective shroud
CN112435954B (en) * 2020-11-25 2024-01-26 西安奕斯伟材料科技股份有限公司 Wafer carrier processing method and wafer carrier

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3524978A1 (en) * 1985-07-12 1987-01-22 Wacker Chemitronic METHOD FOR DOUBLE-SIDED REMOVAL MACHINING OF DISK-SHAPED WORKPIECES, IN PARTICULAR SEMICONDUCTOR DISCS
US5899743A (en) * 1995-03-13 1999-05-04 Komatsu Electronic Metals Co., Ltd. Method for fabricating semiconductor wafers
JP2000288922A (en) * 1999-03-31 2000-10-17 Hoya Corp Polishing carrier, polishing method and manufacture of information recording medium substrate
JP2001191247A (en) * 2000-01-07 2001-07-17 Hoya Corp Both surface grinding method of disc-like substrate, manufacturing method of substrate for information recording medium and manufacturing method of information recording medium
US6709981B2 (en) * 2000-08-16 2004-03-23 Memc Electronic Materials, Inc. Method and apparatus for processing a semiconductor wafer using novel final polishing method
US7276394B2 (en) * 2001-09-20 2007-10-02 Eastman Kodak Company Large area flat image sensor assembly
JP4224755B2 (en) * 2001-10-16 2009-02-18 株式会社デンソー Seed crystal fixation method
DE10250823B4 (en) * 2002-10-31 2005-02-03 Siltronic Ag Carrier and method for simultaneous two-sided machining of workpieces
US20080318493A1 (en) * 2004-08-02 2008-12-25 Showa Denko K.K. Method of Manufacturing Polishing Carrier and Silicon Substrate for Magnetic Recording Medium, and Silicon Substrate for Magnetic Recording Medium
WO2006090661A1 (en) 2005-02-25 2006-08-31 Shin-Etsu Handotai Co., Ltd. Carrier for double side polishing machine and double side polishing machine employing it, and double side polishing method
US20080166952A1 (en) 2005-02-25 2008-07-10 Shin-Etsu Handotai Co., Ltd Carrier For Double-Side Polishing Apparatus, Double-Side Polishing Apparatus And Double-Side Polishing Method Using The Same
CN101059033A (en) * 2006-04-20 2007-10-24 科定企业股份有限公司 Heavy article strip press-fit type adhesion construction method for log bark plastic floor
JP5114113B2 (en) 2007-07-02 2013-01-09 スピードファム株式会社 Work carrier
JP4605233B2 (en) * 2008-02-27 2011-01-05 信越半導体株式会社 Carrier for double-side polishing apparatus, double-side polishing apparatus and double-side polishing method using the same
JP5233888B2 (en) * 2009-07-21 2013-07-10 信越半導体株式会社 Method for manufacturing carrier for double-side polishing apparatus, carrier for double-side polishing apparatus and double-side polishing method for wafer
JP5605260B2 (en) 2011-02-18 2014-10-15 信越半導体株式会社 Insert material and double-side polishing machine
JP5748717B2 (en) * 2012-09-06 2015-07-15 信越半導体株式会社 Double-side polishing method

Also Published As

Publication number Publication date
CN104968473A (en) 2015-10-07
TW201446416A (en) 2014-12-16
KR20150116856A (en) 2015-10-16
KR102063846B1 (en) 2020-01-08
TWI577500B (en) 2017-04-11
JP2014176954A (en) 2014-09-25
WO2014125759A1 (en) 2014-08-21
DE112014000461T5 (en) 2015-09-24
CN104968473B (en) 2017-12-01
US20150375363A1 (en) 2015-12-31
JP5847789B2 (en) 2016-01-27
US9764443B2 (en) 2017-09-19

Similar Documents

Publication Publication Date Title
SG11201505594XA (en) Method of producing carrier for use in double-side polishing apparatus and method of double-side polishing wafers
SG10201405189QA (en) Polishing method and polishing apparatus
SG10201407062PA (en) Polishing apparatus and polishing method
SG11201505018QA (en) Carrier for use in double-side polishing apparatus and method of double-side polishing wafer
SG11201506296VA (en) Polishing composition and method for producing polished article
SG11201600812PA (en) Polishing device and polishing method
TWI563558B (en) Substrate treatment apparatus and substrate treatment method
SG11201506001VA (en) Polishing composition, method for producing polishing composition and method for producing polished article
SG11201503659QA (en) Method and apparatus for cleaning semiconductor wafer
EP2806461A4 (en) Semiconductor device and method for producing same
SG11201607115QA (en) Manufacturing method of carrier for double-side polishing apparatus,carrier for double-side polishing apparatus, and double-side polishing method
SG11201406031YA (en) Polishing pad and method for producing polishing pad
SG10201401250YA (en) Method For Polishing Semiconductor Wafers By Means Of Simultaneous Double-Side Polishing
SG11201604486XA (en) Semiconductor wafer processing methods and apparatus
SG11201501091RA (en) Apparatus and method of producing diamond
EP2851938A4 (en) Semiconductor device and method for producing same
SG11201403886VA (en) Method of double-side polishing wafer
SG10201407353UA (en) Substrate holder, polishing apparatus, polishing method, and retaining ring
SG11201507962XA (en) Method for polishing silicon wafer and method for producing epitaxial wafer
SG11201404426YA (en) Semiconductor device and method for producing same
SG11201807083YA (en) Manufacturing method of carrier for double-side polishing apparatus and method of double-side polishing wafer
SG10201403725TA (en) Polishing apparatus, polishing pad positioning method, and polishing pad
SG11201601292RA (en) Polishing composition and method for producing same
SG11201509689YA (en) Method of producing polishing head and polishing apparatus
SG11201601265YA (en) Polishing Composition and Method for Producing Same