SG11201405876YA - Liquid deposition photolithography - Google Patents

Liquid deposition photolithography

Info

Publication number
SG11201405876YA
SG11201405876YA SG11201405876YA SG11201405876YA SG11201405876YA SG 11201405876Y A SG11201405876Y A SG 11201405876YA SG 11201405876Y A SG11201405876Y A SG 11201405876YA SG 11201405876Y A SG11201405876Y A SG 11201405876YA SG 11201405876Y A SG11201405876Y A SG 11201405876YA
Authority
SG
Singapore
Prior art keywords
liquid deposition
deposition photolithography
photolithography
liquid
deposition
Prior art date
Application number
SG11201405876YA
Other languages
English (en)
Inventor
Robert R Mcleod
Adam Urness
Michael Cole
Eric Moore
Original Assignee
Univ Colorado Regents
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Colorado Regents filed Critical Univ Colorado Regents
Publication of SG11201405876YA publication Critical patent/SG11201405876YA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG11201405876YA 2012-03-22 2013-03-22 Liquid deposition photolithography SG11201405876YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261614356P 2012-03-22 2012-03-22
PCT/US2013/033581 WO2013142830A1 (fr) 2012-03-22 2013-03-22 Photolithographie avec dépôt liquide

Publications (1)

Publication Number Publication Date
SG11201405876YA true SG11201405876YA (en) 2014-10-30

Family

ID=49212157

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201405876YA SG11201405876YA (en) 2012-03-22 2013-03-22 Liquid deposition photolithography

Country Status (8)

Country Link
US (2) US9034568B2 (fr)
EP (1) EP2828709A4 (fr)
JP (1) JP2015514318A (fr)
CN (1) CN104471483A (fr)
CA (1) CA2867861A1 (fr)
HK (1) HK1208269A1 (fr)
SG (1) SG11201405876YA (fr)
WO (1) WO2013142830A1 (fr)

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US9498920B2 (en) 2013-02-12 2016-11-22 Carbon3D, Inc. Method and apparatus for three-dimensional fabrication
ES2588485T5 (es) 2013-02-12 2020-02-27 Carbon Inc Impresión de interfaz líquida continua
EP2956821B8 (fr) * 2013-02-12 2018-06-27 Carbon, Inc. Procédé et appareil pour fabrication en trois dimensions
US11260208B2 (en) 2018-06-08 2022-03-01 Acclarent, Inc. Dilation catheter with removable bulb tip
US9360757B2 (en) 2013-08-14 2016-06-07 Carbon3D, Inc. Continuous liquid interphase printing
US10073424B2 (en) 2014-05-13 2018-09-11 Autodesk, Inc. Intelligent 3D printing through optimization of 3D print parameters
US9841750B2 (en) 2014-05-13 2017-12-12 Autodesk, Inc. Dynamic real-time slice engine for 3D printing
US9782934B2 (en) 2014-05-13 2017-10-10 Autodesk, Inc. 3D print adhesion reduction during cure process
WO2015195924A1 (fr) 2014-06-20 2015-12-23 Carbon3D, Inc. Impression tridimensionnelle à acheminement en va-et-vient de liquide polymérisable
EP4074485A1 (fr) 2014-06-23 2022-10-19 Carbon, Inc. Objets tridimensionnels produits à partir de matériaux ayant de multiples mécanismes de durcissement
US10166725B2 (en) 2014-09-08 2019-01-01 Holo, Inc. Three dimensional printing adhesion reduction using photoinhibition
US11141919B2 (en) 2015-12-09 2021-10-12 Holo, Inc. Multi-material stereolithographic three dimensional printing
US10935891B2 (en) 2017-03-13 2021-03-02 Holo, Inc. Multi wavelength stereolithography hardware configurations
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
GB2564956B (en) 2017-05-15 2020-04-29 Holo Inc Viscous film three-dimensional printing systems and methods
US10245785B2 (en) 2017-06-16 2019-04-02 Holo, Inc. Methods for stereolithography three-dimensional printing
DE102017210384B3 (de) 2017-06-21 2018-08-30 Sirona Dental Systems Gmbh Behälter zum Einsatz in Stereolithographie-Anlagen und Stereolithographie-Anlage
US11084222B2 (en) 2017-06-30 2021-08-10 Autodesk, Inc. Systems and methods for determining dynamic forces in a liquefier system in additive manufacturing
US11104075B2 (en) 2018-11-01 2021-08-31 Stratasys, Inc. System for window separation in an additive manufacturing process
US10723069B2 (en) 2018-11-01 2020-07-28 Origin Laboratories, Inc. Method for build separation from a curing interface in an additive manufacturing process
EP3902659A4 (fr) 2018-12-26 2022-09-07 Holo, Inc. Capteurs pour systèmes et méthodes d'impression tridimensionnelle
CN112238611A (zh) * 2019-07-19 2021-01-19 三纬国际立体列印科技股份有限公司 可快速打印并保持液面平整的光固化3d打印机
WO2021183925A1 (fr) 2020-03-13 2021-09-16 Align Technology, Inc. Réticulations covalentes faibles dans des matériaux thermodurcis, offrant une ténacité augmentée
US11661468B2 (en) 2020-08-27 2023-05-30 Align Technology, Inc. Additive manufacturing using variable temperature-controlled resins
US20240051246A1 (en) 2022-08-15 2024-02-15 Align Technology, Inc. Methods for selective post-curing of additively manufactured objects
WO2024059749A2 (fr) 2022-09-15 2024-03-21 Align Technology, Inc. Systèmes et procédés de modification de surfaces d'objets fabriqués de manière additive
WO2024064832A2 (fr) 2022-09-22 2024-03-28 Cubicure Gmbh Plateformes de construction modulaires pour fabrication additive
US20240131795A1 (en) 2022-10-20 2024-04-25 Align Technology, Inc. Systems and methods for generating directly manufacturable dental appliances
WO2024092097A1 (fr) 2022-10-26 2024-05-02 Align Technology, Inc. Systèmes de fabrication additive à substrats fixes
WO2024092007A1 (fr) 2022-10-26 2024-05-02 Align Technology, Inc. Matériaux et objets fabriqués de manière additive avec des éléments à verrouillage mécanique
US20240140043A1 (en) 2022-11-01 2024-05-02 Align Technology, Inc. Prefabricated support structures and/or overlays for additive manufacturing

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US4551416A (en) * 1981-05-22 1985-11-05 At&T Bell Laboratories Process for preparing semiconductors using photosensitive bodies
JPS6299753A (ja) * 1985-10-25 1987-05-09 Fujitsu Ltd 立体形状の形成方法
US4752498A (en) 1987-03-02 1988-06-21 Fudim Efrem V Method and apparatus for production of three-dimensional objects by photosolidification
US5175077A (en) 1990-07-05 1992-12-29 E. I. Du Pont De Nemours And Company Solid imaging system using photohardening inhibition
JP2616660B2 (ja) * 1993-06-21 1997-06-04 日本電気株式会社 厚膜配線パターンの露光装置および厚膜の成形方法
EP0767970B1 (fr) * 1995-03-27 2001-10-04 Koninklijke Philips Electronics N.V. Composant électronique multicouche et procédé de sa fabrication
US6051179A (en) 1997-03-19 2000-04-18 Replicator Systems, Inc. Apparatus and method for production of three-dimensional models by spatial light modulator
US7049049B2 (en) * 2001-06-27 2006-05-23 University Of South Florida Maskless photolithography for using photoreactive agents
JP2005534063A (ja) * 2002-07-19 2005-11-10 ザ リージェンツ オブ ザ ユニバーシティ オブ コロラド， ア ボディー コーポレイト ３ｄ光重合デバイスの製造
EP1660240A2 (fr) * 2003-08-19 2006-05-31 Nanoopto Corporation Procede et dispositif d'impression submicronique
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WO2009005746A1 (fr) * 2007-06-29 2009-01-08 Allview Research Llc Écriture d'une structure diffractive
US8666142B2 (en) * 2008-11-18 2014-03-04 Global Filtration Systems System and method for manufacturing

Also Published As

Publication number Publication date
CN104471483A (zh) 2015-03-25
WO2013142830A1 (fr) 2013-09-26
US20130252178A1 (en) 2013-09-26
JP2015514318A (ja) 2015-05-18
EP2828709A4 (fr) 2015-11-04
HK1208269A1 (en) 2016-02-26
US10162264B2 (en) 2018-12-25
CA2867861A1 (fr) 2013-09-26
US20150261091A1 (en) 2015-09-17
US9034568B2 (en) 2015-05-19
EP2828709A1 (fr) 2015-01-28

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