SG11201403305VA - Apparatus for forming thin film - Google Patents

Apparatus for forming thin film

Info

Publication number
SG11201403305VA
SG11201403305VA SG11201403305VA SG11201403305VA SG11201403305VA SG 11201403305V A SG11201403305V A SG 11201403305VA SG 11201403305V A SG11201403305V A SG 11201403305VA SG 11201403305V A SG11201403305V A SG 11201403305VA SG 11201403305V A SG11201403305V A SG 11201403305VA
Authority
SG
Singapore
Prior art keywords
thin film
forming thin
forming
film
thin
Prior art date
Application number
SG11201403305VA
Inventor
Hiroyuki Ooshima
Keiichi Fujimoto
Hiroyasu Tabuchi
Masaki Nakaya
Original Assignee
Kirin Brewery
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kirin Brewery filed Critical Kirin Brewery
Publication of SG11201403305VA publication Critical patent/SG11201403305VA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D23/00—Details of bottles or jars not otherwise provided for
    • B65D23/02—Linings or internal coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/403—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Chemical Vapour Deposition (AREA)
SG11201403305VA 2011-12-27 2012-12-26 Apparatus for forming thin film SG11201403305VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011284609 2011-12-27
PCT/JP2012/083679 WO2013099960A1 (en) 2011-12-27 2012-12-26 Apparatus for forming thin film

Publications (1)

Publication Number Publication Date
SG11201403305VA true SG11201403305VA (en) 2014-09-26

Family

ID=48697441

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201403305VA SG11201403305VA (en) 2011-12-27 2012-12-26 Apparatus for forming thin film

Country Status (13)

Country Link
US (1) US10612142B2 (en)
EP (1) EP2799593B1 (en)
JP (1) JP5809711B2 (en)
KR (1) KR101552077B1 (en)
CN (1) CN103998649B (en)
AU (1) AU2012361615B2 (en)
BR (1) BR112014015773A8 (en)
CA (1) CA2860243C (en)
MY (1) MY167942A (en)
PH (1) PH12014501448A1 (en)
SG (1) SG11201403305VA (en)
TW (1) TWI522282B (en)
WO (1) WO2013099960A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6480195B2 (en) * 2015-01-23 2019-03-06 キリン株式会社 Article processing device
JP6474673B2 (en) 2015-04-17 2019-02-27 キリン株式会社 Gas barrier plastic molded body and method for producing the same
EP3318658B1 (en) * 2015-06-30 2022-01-05 Mitsubishi Heavy Industries Machinery Systems, Ltd. Film forming device and film forming method
EP3358040B1 (en) * 2015-10-01 2019-11-27 Mitsubishi Heavy Industries Machinery Systems, Ltd. Film-forming device
JP6625656B2 (en) * 2015-10-19 2019-12-25 三菱重工機械システム株式会社 Film forming equipment
KR102229237B1 (en) 2017-08-31 2021-03-18 새한프라텍 주식회사 Plastic container having excellent gas barrier property and manufacturing method thereof
WO2019058163A2 (en) * 2017-09-20 2019-03-28 C4E Technology Gmbh Method and device for carrying out a deposition process at the outer side and/or at the inner side of a body

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2201858A1 (en) * 1971-01-22 1972-08-10 Cockerill Device for applying a metallic coating to the inner wall of a hollow body
US5308649A (en) * 1992-06-26 1994-05-03 Polar Materials, Inc. Methods for externally treating a container with application of internal bias gas
US5679412A (en) * 1993-10-28 1997-10-21 Manfred R. Kuehnle Method and apparatus for producing gas impermeable, chemically inert container structures for food and volatile substances
US5565248A (en) * 1994-02-09 1996-10-15 The Coca-Cola Company Method and apparatus for coating hollow containers through plasma-assisted deposition of an inorganic substance
US5521351A (en) * 1994-08-30 1996-05-28 Wisconsin Alumni Research Foundation Method and apparatus for plasma surface treatment of the interior of hollow forms
US6223683B1 (en) * 1997-03-14 2001-05-01 The Coca-Cola Company Hollow plastic containers with an external very thin coating of low permeability to gases and vapors through plasma-assisted deposition of inorganic substances and method and system for making the coating
DE59810465D1 (en) * 1998-02-19 2004-01-29 Applied Films Gmbh & Co Kg Lock device for introducing and / or discharging substrates into and / or out of a treatment chamber
DE60206084T2 (en) * 2001-02-06 2006-01-12 Shibuya Kogyo Co., Ltd., Kanazawa Method and apparatus for modifying the inner surface of plastic containers
CN100335376C (en) * 2002-04-26 2007-09-05 北海制罐株式会社 Plastic containers coated on the inner surface and process for production thereof
DE50302862D1 (en) * 2002-05-24 2006-05-18 Schott Ag Device for CVD coatings
BR0311232B1 (en) * 2002-05-24 2013-04-02 coating apparatus and process for plasma coating of workpieces.
JP3595334B2 (en) * 2002-06-05 2004-12-02 三菱商事プラスチック株式会社 Method and apparatus for cleaning source gas introduction pipe used in CVD film forming apparatus
JP2004107781A (en) 2002-09-20 2004-04-08 Mitsubishi Heavy Ind Ltd Carbon film coating process and apparatus
JP2005048272A (en) * 2003-07-31 2005-02-24 Tokyo Electron Ltd Film deposition apparatus and film deposition method
JP4789234B2 (en) * 2005-02-03 2011-10-12 三菱重工食品包装機械株式会社 Film forming apparatus, matching device, and impedance control method
RU2368555C1 (en) * 2005-05-27 2009-09-27 Кирин Бир Кабусики Кайся Device for manufacturing of plastic container with gas barrier, method for manufacturing of this container and container
JP2006335379A (en) * 2005-05-31 2006-12-14 Yoshino Kogyosho Co Ltd Synthetic-resin-made container with coat, method and apparatus for forming coat on synthetic-resin-made container
JP2007105999A (en) 2005-10-13 2007-04-26 Toyobo Co Ltd Multilayered molded product, multilayered stretched molded product comprising it and manufacturing method of multilayered molded product
JP4954679B2 (en) 2006-11-20 2012-06-20 麒麟麦酒株式会社 Barrier film-coated plastic container manufacturing method and manufacturing apparatus thereof
JP5355860B2 (en) * 2007-03-16 2013-11-27 三菱重工食品包装機械株式会社 Barrier film forming apparatus, barrier film forming method, and barrier film coating container
US8062470B2 (en) * 2008-05-12 2011-11-22 Yuri Glukhoy Method and apparatus for application of thin coatings from plasma onto inner surfaces of hollow containers
EP2674513B1 (en) * 2009-05-13 2018-11-14 SiO2 Medical Products, Inc. Vessel coating and inspection

Also Published As

Publication number Publication date
PH12014501448A1 (en) 2014-10-08
EP2799593A1 (en) 2014-11-05
US10612142B2 (en) 2020-04-07
JPWO2013099960A1 (en) 2015-05-11
JP5809711B2 (en) 2015-11-11
TWI522282B (en) 2016-02-21
KR20140105773A (en) 2014-09-02
CN103998649B (en) 2016-05-11
EP2799593B1 (en) 2020-03-04
AU2012361615A1 (en) 2014-07-17
AU2012361615B2 (en) 2015-08-06
WO2013099960A1 (en) 2013-07-04
NZ626604A (en) 2015-03-27
MY167942A (en) 2018-10-04
CA2860243A1 (en) 2013-07-04
US20140366806A1 (en) 2014-12-18
BR112014015773A8 (en) 2017-07-04
CA2860243C (en) 2016-07-12
TW201332844A (en) 2013-08-16
EP2799593A4 (en) 2015-08-05
BR112014015773A2 (en) 2017-06-13
KR101552077B1 (en) 2015-09-09
CN103998649A (en) 2014-08-20

Similar Documents

Publication Publication Date Title
TWI563114B (en) Film deposition apparatus
EP2764409A4 (en) Image forming apparatus
HK1185923A1 (en) Film formation device
EP2692899A4 (en) Rolled film formation apparatus
EP2772723A4 (en) Film thickness measurement method
GB2494052B (en) Image forming apparatus
SG11201402935XA (en) Method for measuring film thickness distribution
EP2716064A4 (en) An apparatus
EP2754730A4 (en) Carbon film forming apparatus
TWI563120B (en) Film forming apparatus
IL227985B (en) Method for forming insulating film
EP2690119A4 (en) Scratch-prevention film
SG11201403305VA (en) Apparatus for forming thin film
EP2752501A4 (en) Sputtering thin film forming apparatus
TWI560531B (en) Lithography apparatus
GB2489934B (en) Film
TWI561387B (en) Film debonding apparatus
EP2782761A4 (en) Image forming apparatus
EP2689914A4 (en) Method for stretching film
EP2544223A4 (en) Thin film forming apparatus
TWI560289B (en) Apparatus for continuously depositing thin film
EP2716558A4 (en) Film label-fitting device
EP2930255A4 (en) Film formation apparatus
HK1181825A1 (en) Thin film forming apparatus
TWI561668B (en) Film forming apparatus