SG106613A1 - Apparatus and methods to clean copper contamination on wafer edge - Google Patents

Apparatus and methods to clean copper contamination on wafer edge

Info

Publication number
SG106613A1
SG106613A1 SG200103337A SG200103337A SG106613A1 SG 106613 A1 SG106613 A1 SG 106613A1 SG 200103337 A SG200103337 A SG 200103337A SG 200103337 A SG200103337 A SG 200103337A SG 106613 A1 SG106613 A1 SG 106613A1
Authority
SG
Singapore
Prior art keywords
methods
wafer edge
copper contamination
clean copper
clean
Prior art date
Application number
SG200103337A
Inventor
Ranendra Roy Sudipto
Gupta Subhash
Chooi Simon
Xu Yi
Aliyu Yakub
Sheng Zhou Mei
Leonard Sudijono John
Kwok Keung Ho Paul
Original Assignee
Chartered Semiconductor Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chartered Semiconductor Mfg filed Critical Chartered Semiconductor Mfg
Publication of SG106613A1 publication Critical patent/SG106613A1/en

Links

SG200103337A 2000-06-30 2001-06-05 Apparatus and methods to clean copper contamination on wafer edge SG106613A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72840000P 2000-06-30 2000-06-30

Publications (1)

Publication Number Publication Date
SG106613A1 true SG106613A1 (en) 2004-10-29

Family

ID=34080861

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200103337A SG106613A1 (en) 2000-06-30 2001-06-05 Apparatus and methods to clean copper contamination on wafer edge

Country Status (1)

Country Link
SG (1) SG106613A1 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5806126A (en) * 1995-10-13 1998-09-15 Ontrak Systems, Inc. Apparatus for a brush assembly

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5806126A (en) * 1995-10-13 1998-09-15 Ontrak Systems, Inc. Apparatus for a brush assembly
US5858109A (en) * 1995-10-13 1999-01-12 Ontrak Systems, Inc. Method and apparatus for cleaning of semiconductor substrates using standard clean 1 (SC1)
US5868863A (en) * 1995-10-13 1999-02-09 Ontrak Systems, Inc. Method and apparatus for cleaning of semiconductor substrates using hydrofluoric acid (HF)

Similar Documents

Publication Publication Date Title
AU4351601A (en) Wafer processing apparatus and method
EP1308992A4 (en) Device and method for processing substrate
AU2001270205A1 (en) Method and apparatus for wafer cleaning
SG106599A1 (en) Substrate processing apparatus and substrate processing method
SG94851A1 (en) Substrate processing apparatus and substrate processing method
IL145341A0 (en) Single wafer type substrate cleaning method and apparatus
IL137996A0 (en) Apparatus and method for cleaning semiconductor wafers
EP1460678A4 (en) Method and apparatus for cleaning and method and apparatus for etching
SG117396A1 (en) Single wafer type cleaning method and apparatus
SG10201706765QA (en) Substrate holding apparatus and substrate polishing apparatus
SG105487A1 (en) Substrate processing apparatus and substrate processing method
IL140682A0 (en) Wafer cleaning apparatus
SG123603A1 (en) Substrate processing apparatus and substrate processing method
EP1397828A4 (en) Electrolytic processing device and substrate processing apparatus
AU2001270277A1 (en) Apparatus and methods for semiconductor wafer processing equipment
EP1536460A4 (en) Substrate processing device and substrate processing method
EP1346608A4 (en) Apparatus and method for processing ceramics
AU3903000A (en) Semiconductor wafer cleaning apparatus and method
SG102055A1 (en) Cleaning method and apparatus
AU9330601A (en) Method and apparatus for chemical processing
SG91902A1 (en) Substrate processing method and substrate processing apparatus
SG104267A1 (en) Substrate processing apparatus and substrate processing method
SG112048A1 (en) Wafer processing method and wafer processing apparatus
EP1235258A4 (en) Method for cleaning substrate and method for manufacturing semiconductor device
EP1404463A4 (en) Method and apparatus for cleaning semiconductor wafers and other flat media