SG10201913021PA - Chemical vapor deposition process to build 3d foam-like structures - Google Patents

Chemical vapor deposition process to build 3d foam-like structures

Info

Publication number
SG10201913021PA
SG10201913021PA SG10201913021PA SG10201913021PA SG10201913021PA SG 10201913021P A SG10201913021P A SG 10201913021PA SG 10201913021P A SG10201913021P A SG 10201913021PA SG 10201913021P A SG10201913021P A SG 10201913021PA SG 10201913021P A SG10201913021P A SG 10201913021PA
Authority
SG
Singapore
Prior art keywords
build
foam
structures
vapor deposition
chemical vapor
Prior art date
Application number
SG10201913021PA
Inventor
Manuela Loeblein
Siu Hon Tsang
Hang Tong Edwin Teo
Original Assignee
Univ Nanyang Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Nanyang Tech filed Critical Univ Nanyang Tech
Publication of SG10201913021PA publication Critical patent/SG10201913021PA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/342—Boron nitride
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/184—Preparation
    • C01B32/186—Preparation by chemical vapour deposition [CVD]
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00—Boron; Compounds thereof
    • C01B35/08—Compounds containing boron and nitrogen, phosphorus, oxygen, sulfur, selenium or tellurium
    • C01B35/14—Compounds containing boron and nitrogen, phosphorus, sulfur, selenium or tellurium
    • C01B35/146—Compounds containing boron and nitrogen, e.g. borazoles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C23C16/0281—Deposition of sub-layers, e.g. to promote the adhesion of the main coating of metallic sub-layers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/30—Three-dimensional structures
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/03—Particle morphology depicted by an image obtained by SEM
SG10201913021PA 2016-03-09 2017-03-09 Chemical vapor deposition process to build 3d foam-like structures SG10201913021PA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG10201601834U 2016-03-09

Publications (1)

Publication Number Publication Date
SG10201913021PA true SG10201913021PA (en) 2020-02-27

Family

ID=59790704

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201913021PA SG10201913021PA (en) 2016-03-09 2017-03-09 Chemical vapor deposition process to build 3d foam-like structures
SG11201807113QA SG11201807113QA (en) 2016-03-09 2017-03-09 Chemical vapor deposition process to build 3d foam-like structures

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG11201807113QA SG11201807113QA (en) 2016-03-09 2017-03-09 Chemical vapor deposition process to build 3d foam-like structures

Country Status (5)

Country Link
US (1) US11104989B2 (en)
EP (1) EP3426818A4 (en)
CN (1) CN108699684B (en)
SG (2) SG10201913021PA (en)
WO (1) WO2017155468A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11043338B2 (en) * 2017-11-09 2021-06-22 Korea Research Institute Of Chemical Technology Manufacturing method of porous composite electrode and organic removal method of porous composite electrode
CN109951903B (en) * 2019-03-26 2021-06-04 深圳市聚威新材科技有限公司 Nano microcrystalline lattice phase separation electrothermal material and preparation method thereof
CN110282617B (en) * 2019-07-26 2021-01-29 北京石墨烯研究院 Graphene powder and preparation method thereof
CN113046720B (en) * 2021-03-10 2022-08-23 江西理工大学 Nd-graphene composite material and preparation method and application thereof
CN114931866B (en) * 2022-03-15 2023-04-14 电子科技大学 Preparation method of porous polymer material filtering membrane
CN116425553A (en) * 2023-02-10 2023-07-14 浙江理工大学 Preparation method for preparing heat-insulating boron nitride foam by in-situ vapor deposition
CN117286364B (en) * 2023-11-24 2024-04-12 中铝科学技术研究院有限公司 Graphene reinforced metal matrix composite material with three-dimensional network structure and preparation method thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102126709B (en) * 2010-01-20 2013-04-03 中国科学院金属研究所 Preparation method of boron nitride one-dimensional nanostructure macroscopic rope
US10005672B2 (en) 2010-04-14 2018-06-26 Baker Hughes, A Ge Company, Llc Method of forming particles comprising carbon and articles therefrom
IN2010CH02995A (en) * 2010-12-11 2015-06-19 Naga Prasad
CN102674321B (en) * 2011-03-10 2015-02-25 中国科学院金属研究所 Graphene foam with three dimensional fully connected network and macroscopic quantity preparation method thereof
CN103232027B (en) * 2013-04-22 2015-05-20 南京航空航天大学 Three-dimensional boron nitride foam and preparation method thereof
CN103213980B (en) 2013-05-13 2015-10-28 中国科学院苏州纳米技术与纳米仿生研究所 The preparation method of three-dimensional grapheme or its compound system
US9611146B2 (en) 2013-07-01 2017-04-04 Lawrence Livermore National Security, Llc Crystalline boron nitride aerogels
GB201316472D0 (en) * 2013-09-17 2013-10-30 Cambridge Nanosystems Ltd Injection system for catalyst control
CN104562195B (en) * 2013-10-21 2017-06-06 中国科学院上海微***与信息技术研究所 The growing method of Graphene
US9505624B2 (en) * 2014-02-18 2016-11-29 Corning Incorporated Metal-free CVD coating of graphene on glass and other dielectric substrates
CN104030282B (en) * 2014-06-25 2016-03-09 无锡格菲电子薄膜科技有限公司 Organometallic compound is utilized to grow the method for number of plies controllable grapheme
GB201413701D0 (en) 2014-08-01 2014-09-17 Isis Innovation Process
CN104807861B (en) 2015-04-09 2017-05-24 山东师范大学 Preparation method of spongy graphene-based stretchable gas sensor

Also Published As

Publication number Publication date
US20190093217A1 (en) 2019-03-28
SG11201807113QA (en) 2018-09-27
CN108699684A (en) 2018-10-23
EP3426818A4 (en) 2019-11-13
CN108699684B (en) 2021-08-24
WO2017155468A1 (en) 2017-09-14
US11104989B2 (en) 2021-08-31
EP3426818A1 (en) 2019-01-16

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