SG10201503988YA - Reduced titanium undercut in etch process - Google Patents

Reduced titanium undercut in etch process

Info

Publication number
SG10201503988YA
SG10201503988YA SG10201503988YA SG10201503988YA SG10201503988YA SG 10201503988Y A SG10201503988Y A SG 10201503988YA SG 10201503988Y A SG10201503988Y A SG 10201503988YA SG 10201503988Y A SG10201503988Y A SG 10201503988YA SG 10201503988Y A SG10201503988Y A SG 10201503988YA
Authority
SG
Singapore
Prior art keywords
undercut
etch process
reduced titanium
titanium
reduced
Prior art date
Application number
SG10201503988YA
Inventor
P Surdock David
L Bernt Marvin
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of SG10201503988YA publication Critical patent/SG10201503988YA/en

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    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
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