SE9900882D0 - A high power IMPATT diode - Google Patents
A high power IMPATT diodeInfo
- Publication number
- SE9900882D0 SE9900882D0 SE9900882A SE9900882A SE9900882D0 SE 9900882 D0 SE9900882 D0 SE 9900882D0 SE 9900882 A SE9900882 A SE 9900882A SE 9900882 A SE9900882 A SE 9900882A SE 9900882 D0 SE9900882 D0 SE 9900882D0
- Authority
- SE
- Sweden
- Prior art keywords
- electrodes
- electric field
- semiconductor layer
- high power
- drift layer
- Prior art date
Links
- 230000005684 electric field Effects 0.000 abstract 3
- 239000004065 semiconductor Substances 0.000 abstract 3
- 230000015556 catabolic process Effects 0.000 abstract 1
- 239000002800 charge carrier Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/864—Transit-time diodes, e.g. IMPATT, TRAPATT diodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1608—Silicon carbide
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9900882A SE9900882D0 (sv) | 1999-03-12 | 1999-03-12 | A high power IMPATT diode |
US09/272,768 US6252250B1 (en) | 1999-03-12 | 1999-03-19 | High power impatt diode |
AU36890/00A AU3689000A (en) | 1999-03-12 | 2000-03-09 | A high power impatt diode |
PCT/SE2000/000463 WO2000055921A1 (en) | 1999-03-12 | 2000-03-09 | A high power impatt diode |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9900882A SE9900882D0 (sv) | 1999-03-12 | 1999-03-12 | A high power IMPATT diode |
US09/272,768 US6252250B1 (en) | 1999-03-12 | 1999-03-19 | High power impatt diode |
Publications (1)
Publication Number | Publication Date |
---|---|
SE9900882D0 true SE9900882D0 (sv) | 1999-03-12 |
Family
ID=26663530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9900882A SE9900882D0 (sv) | 1999-03-12 | 1999-03-12 | A high power IMPATT diode |
Country Status (4)
Country | Link |
---|---|
US (1) | US6252250B1 (sv) |
AU (1) | AU3689000A (sv) |
SE (1) | SE9900882D0 (sv) |
WO (1) | WO2000055921A1 (sv) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101165860B (zh) * | 2003-08-22 | 2010-04-07 | 关西电力株式会社 | 半导体装置及制造方法、使用该半导体装置的电力变换装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4822374B1 (sv) * | 1968-10-17 | 1973-07-05 | ||
US3890630A (en) | 1973-10-09 | 1975-06-17 | Rca Corp | Impatt diode |
CA1015069A (en) | 1974-04-01 | 1977-08-02 | Chung K. Kim | Dynamic negative resistance diode |
US4201604A (en) | 1975-08-13 | 1980-05-06 | Raytheon Company | Process for making a negative resistance diode utilizing spike doping |
US4060820A (en) | 1976-01-05 | 1977-11-29 | Raytheon Company | Low noise read-type diode |
US4466938A (en) * | 1979-08-23 | 1984-08-21 | General Electric Company | Method for reducing damage to diamond crystals during sintering |
US4596070A (en) | 1984-07-13 | 1986-06-24 | Texas Instruments Incorporated | Interdigitated IMPATT devices |
US5512776A (en) * | 1984-07-13 | 1996-04-30 | Texas Instruments Incorporated | Interdigitated IMPATT devices |
DE3915053C2 (de) | 1989-05-08 | 1995-03-30 | Siemens Ag | Verfahren zum Herstellen von einkristallinem Siliziumkarbid SiC |
US5612260A (en) * | 1992-06-05 | 1997-03-18 | Cree Research, Inc. | Method of obtaining high quality silicon dioxide passivation on silicon carbide and resulting passivated structures |
-
1999
- 1999-03-12 SE SE9900882A patent/SE9900882D0/sv unknown
- 1999-03-19 US US09/272,768 patent/US6252250B1/en not_active Expired - Lifetime
-
2000
- 2000-03-09 WO PCT/SE2000/000463 patent/WO2000055921A1/en active Application Filing
- 2000-03-09 AU AU36890/00A patent/AU3689000A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
AU3689000A (en) | 2000-10-04 |
US6252250B1 (en) | 2001-06-26 |
WO2000055921A1 (en) | 2000-09-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7332749B2 (en) | Junction-gate type static induction thyristor and high-voltage pulse generator using such junction-gate type static induction thyristor | |
Deboy et al. | Perspective of loss mechanisms for silicon and wide band-gap power devices | |
Agarwal et al. | A new degradation mechanism in high-voltage SiC power MOSFETs | |
DE69821105D1 (de) | Bipolar mos-leistungstransistor ohne latch-up | |
Rahimo et al. | A high current 3300V module employing reverse conducting IGBTs setting a new benchmark in output power capability | |
EP0171597B1 (en) | Charge pumping structure | |
US9054704B2 (en) | Method, system, and apparatus for efficiently driving a transistor with a booster in voltage supply | |
Yonezawa et al. | Device performance and switching characteristics of 16 kV ultrahigh-voltage SiC flip-type n-channel IE-IGBTs | |
Bolotnikov et al. | Utilization of SiC MOSFET body diode in hard switching applications | |
US11133391B2 (en) | Transistor device | |
TWI265633B (en) | High voltage power MOSFET having low on-resistance | |
US11217686B2 (en) | Semiconductor device and semiconductor circuit | |
SE9900882D0 (sv) | A high power IMPATT diode | |
US20150179633A1 (en) | Reverse Blocking Transistor Device | |
EP0771034A3 (en) | Semiconductor device with a buffer structure | |
Agarwal et al. | 4H–SiC p–n diodes and gate turnoff thyristors for high-power, high-temperature applications | |
US20140063882A1 (en) | Circuit Arrangement with Two Transistor Devices | |
RU2230394C1 (ru) | Биполярно-полевой транзистор с комбинированным затвором | |
RU175209U1 (ru) | Устройство для фотоэлектрического переключения лавинного импульсного s-диода | |
DE60234454D1 (de) | Halbleiter-gleichrichter | |
Saito et al. | Demonstration of resonant inverter circuit for electrodeless fluorescent lamps using high voltage GaN-HEMT | |
Wang et al. | Fundamental trade-off between the operating frequency and output power density in linear-mode modulated SiC photoconductive switch | |
Mazumder | Photonic power electronics: Past, present, and future | |
Udrea et al. | Reverse conducting double gate lateral insulated gate bipolar transistor in SOI based technology | |
Kapels et al. | Optimized device concepts for reverse blocking IGBTs |