SE7609640L - Fotosensitiv etsskyddsskiktskomposition - Google Patents
Fotosensitiv etsskyddsskiktskompositionInfo
- Publication number
- SE7609640L SE7609640L SE7609640A SE7609640A SE7609640L SE 7609640 L SE7609640 L SE 7609640L SE 7609640 A SE7609640 A SE 7609640A SE 7609640 A SE7609640 A SE 7609640A SE 7609640 L SE7609640 L SE 7609640L
- Authority
- SE
- Sweden
- Prior art keywords
- corrosion protection
- protection composition
- photosensitive corrosion
- photosensitive
- composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/008—Azides
- G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
- G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US60959075A | 1975-09-02 | 1975-09-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SE7609640L true SE7609640L (sv) | 1977-03-03 |
Family
ID=24441438
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SE7609640A SE7609640L (sv) | 1975-09-02 | 1976-09-01 | Fotosensitiv etsskyddsskiktskomposition |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS5230504A (sv) |
| BE (1) | BE845675A (sv) |
| DE (1) | DE2639610A1 (sv) |
| FR (1) | FR2323170A1 (sv) |
| LU (1) | LU75706A1 (sv) |
| NL (1) | NL7609513A (sv) |
| SE (1) | SE7609640L (sv) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62123444A (ja) * | 1985-08-07 | 1987-06-04 | Japan Synthetic Rubber Co Ltd | ポジ型感放射線性樹脂組成物 |
| US5215857A (en) * | 1985-08-07 | 1993-06-01 | Japan Synthetic Rubber Co., Ltd. | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent |
| JPH0721626B2 (ja) * | 1985-08-10 | 1995-03-08 | 日本合成ゴム株式会社 | 半導体微細加工用レジスト組成物 |
| US5128230A (en) * | 1986-12-23 | 1992-07-07 | Shipley Company Inc. | Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate |
| JPH0693115B2 (ja) * | 1988-10-18 | 1994-11-16 | 日本合成ゴム株式会社 | ネガ型感放射線性樹脂組成物 |
-
1976
- 1976-08-26 NL NL7609513A patent/NL7609513A/xx unknown
- 1976-08-30 BE BE170210A patent/BE845675A/xx unknown
- 1976-08-31 FR FR7626286A patent/FR2323170A1/fr not_active Withdrawn
- 1976-09-01 SE SE7609640A patent/SE7609640L/sv unknown
- 1976-09-02 LU LU75706A patent/LU75706A1/xx unknown
- 1976-09-02 JP JP51104335A patent/JPS5230504A/ja active Pending
- 1976-09-02 DE DE19762639610 patent/DE2639610A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| BE845675A (fr) | 1976-12-16 |
| NL7609513A (nl) | 1977-03-04 |
| LU75706A1 (sv) | 1977-06-15 |
| FR2323170A1 (fr) | 1977-04-01 |
| DE2639610A1 (de) | 1977-03-03 |
| JPS5230504A (en) | 1977-03-08 |
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