SE415612B - Sett att behandla en stralningskenslig plat - Google Patents

Sett att behandla en stralningskenslig plat

Info

Publication number: SE415612B
Authority: SE; Sweden
Prior art keywords: treat; setting; sensitive plate; radio sensitive; radio
Prior art date: 1974-07-08

Application number

SE7507761A

Other languages

English (en)

Swedish (sv)

Other versions

SE7507761L (sv

Inventor

Hans Wielinga

Original Assignee

Vickers Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1974-07-08

Filing date

1975-07-07

Publication date

1980-10-13

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10304895&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SE415612(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1975-07-07 Application filed by Vickers Ltd filed Critical Vickers Ltd

1976-01-09 Publication of SE7507761L publication Critical patent/SE7507761L/

1980-10-13 Publication of SE415612B publication Critical patent/SE415612B/xx

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)
Polishing Bodies And Polishing Tools (AREA)
Diaphragms For Electromechanical Transducers (AREA)

SE7507761A 1974-07-08 1975-07-07 Sett att behandla en stralningskenslig plat SE415612B (sv)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
GB30264/74A GB1513368A (en)	1974-07-08	1974-07-08	Processing of radiation-sensitive members

Publications (2)

Publication Number	Publication Date
SE7507761L SE7507761L (sv)	1976-01-09
SE415612B true SE415612B (sv)	1980-10-13

Family

ID=10304895

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SE7507761A SE415612B (sv)	1974-07-08	1975-07-07	Sett att behandla en stralningskenslig plat

Country Status (26)

Country	Link
US (1)	US4294910A (nl)
JP (1)	JPS612518B2 (nl)
AT (1)	AT356147B (nl)
BE (1)	BE831075A (nl)
BR (1)	BR7504303A (nl)
CA (1)	CA1061160A (nl)
CH (1)	CH600394A5 (nl)
CS (1)	CS212748B2 (nl)
DD (1)	DD120088A5 (nl)
DE (1)	DE2530422C2 (nl)
DK (1)	DK144956C (nl)
ES (1)	ES439238A1 (nl)
FI (1)	FI59680C (nl)
FR (1)	FR2277682A1 (nl)
GB (1)	GB1513368A (nl)
HK (1)	HK74778A (nl)
IE (1)	IE41395B1 (nl)
IT (1)	IT1039749B (nl)
KE (1)	KE2908A (nl)
LU (1)	LU72927A1 (nl)
NL (1)	NL187283C (nl)
NO (1)	NO151765C (nl)
PL (1)	PL109957B1 (nl)
SE (1)	SE415612B (nl)
SU (1)	SU569272A3 (nl)
ZA (1)	ZA754248B (nl)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB1534424A (en) *	1975-06-04	1978-12-06	Fuji Photo Film Co Ltd	Process for the production of planographic printing plate
CH613059A5 (en)	1975-06-30	1979-08-31	Hoechst Ag	Method for producing a flat-bed printing forme
US4191570A (en) *	1978-10-10	1980-03-04	Polychrome Corporation	Process for heat treating lithographic printing plates
DE2855393A1 (de) *	1978-12-21	1980-07-03	Hoechst Ag	Verfahren zum herstellen von flachdruckformen
US4259369A (en) *	1979-12-13	1981-03-31	International Business Machines Corporation	Image hardening process
US4355096A (en)	1980-07-11	1982-10-19	American Hoechst Corporation	Process for heating exposed and developed light-sensitive lithographic printing plates with carboxylic acid and amine moiety containing compounds on surface thereof
GB2099371B (en) *	1981-06-01	1984-12-19	Polychrome Corp	Finisher for lithographic printing plates
GB8314918D0 (en) *	1983-05-31	1983-07-06	Vickers Plc	Radiation sensitive compositions
DE3410522A1 (de) *	1984-03-22	1985-10-03	Hoechst Ag, 6230 Frankfurt	Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform
JPS6231859A (ja) *	1985-08-01	1987-02-10	Fuji Photo Film Co Ltd	製版方法
US4980271A (en) *	1985-08-05	1990-12-25	Hoechst Celanese Corporation	Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
US5066568A (en) *	1985-08-05	1991-11-19	Hoehst Celanese Corporation	Method of developing negative working photographic elements
AU6629286A (en) *	1985-11-27	1987-07-01	Macdermid, Inc.	Thermally stabilized photoresist images
CA1329719C (en) *	1987-07-31	1994-05-24	Tadao Toyama	Lithographic printing plate and method of treating the same
GB8822956D0 (en) *	1988-09-30	1988-11-09	Cookson Graphics Plc	Baking treatment of lithographic printing plate
US5180654A (en) *	1988-11-29	1993-01-19	E. I. Du Pont De Nemours And Company	Processing radiation sensitive members with aqueous ethyl hexyl sulphate treatment prior to burn-in step
GB8918161D0 (en) *	1989-08-09	1989-09-20	Du Pont	Improvements in or relating to radiation sensitive compounds
US5213950A (en) *	1991-01-30	1993-05-25	Sun Chemical Corporation	Pre-bake printing plate composition
JP2944296B2 (ja)	1992-04-06	1999-08-30	富士写真フイルム株式会社	感光性平版印刷版の製造方法
ATE439235T1 (de)	1999-05-21	2009-08-15	Fujifilm Corp	Lichtempfindliche zusammensetzung und flachdruckplattenbasis damit
EP1211065B1 (en)	2000-11-30	2009-01-14	FUJIFILM Corporation	Planographic printing plate precursor
US20040067435A1 (en)	2002-09-17	2004-04-08	Fuji Photo Film Co., Ltd.	Image forming material
JP4150261B2 (ja)	2003-01-14	2008-09-17	富士フイルム株式会社	平版印刷版原版の製版方法
JP4471101B2 (ja)	2004-07-30	2010-06-02	富士フイルム株式会社	平版印刷版原版
JP2006058430A (ja)	2004-08-18	2006-03-02	Fuji Photo Film Co Ltd	平版印刷版原版
JP4404734B2 (ja)	2004-09-27	2010-01-27	富士フイルム株式会社	平版印刷版原版
JP4474296B2 (ja)	2005-02-09	2010-06-02	富士フイルム株式会社	平版印刷版原版
JP4404792B2 (ja)	2005-03-22	2010-01-27	富士フイルム株式会社	平版印刷版原版
JP4890403B2 (ja)	2007-09-27	2012-03-07	富士フイルム株式会社	平版印刷版原版
JP2009085984A (ja)	2007-09-27	2009-04-23	Fujifilm Corp	平版印刷版原版
JP4790682B2 (ja)	2007-09-28	2011-10-12	富士フイルム株式会社	平版印刷版原版
JP5164640B2 (ja)	2008-04-02	2013-03-21	富士フイルム株式会社	平版印刷版原版
JP5183380B2 (ja)	2008-09-09	2013-04-17	富士フイルム株式会社	赤外線レーザ用感光性平版印刷版原版
US8883401B2 (en)	2009-09-24	2014-11-11	Fujifilm Corporation	Lithographic printing original plate
US8828648B2 (en)	2010-02-17	2014-09-09	Fujifilm Corporation	Method for producing a planographic printing plate
JP5490168B2 (ja)	2012-03-23	2014-05-14	富士フイルム株式会社	平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja)	2012-03-30	2014-06-04	富士フイルム株式会社	平版印刷版の作製方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
BE497135A (nl) *	1949-07-23
US2958599A (en) *	1958-02-14	1960-11-01	Azoplate Corp	Diazo compounds and printing plates manufactured therefrom
GB1059623A (en) *	1962-09-06	1967-02-22	Sumner Williams Inc	Light-sensitive plates for use in the production of positive printing plates
DE1447963B2 (de) *	1965-11-24	1972-09-07	KaIIe AG, 6202 Wiesbaden Biebnch	Verfahren zur herstellung einer offsetdruckform aus einem vorsensibilisierten druckplattenmaterial
US3482977A (en) *	1966-02-11	1969-12-09	Sylvania Electric Prod	Method of forming adherent masks on oxide coated semiconductor bodies
US3652273A (en) *	1967-09-11	1972-03-28	Ibm	Process using polyvinyl butral topcoat on photoresist layer
US3615937A (en) *	1968-06-17	1971-10-26	Ibm	Plasticizer additive to photoresist for the reduction of pin holes
US3573975A (en) *	1968-07-10	1971-04-06	Ibm	Photochemical fabrication process
US3586554A (en) *	1969-01-15	1971-06-22	Ibm	Process for increasing photoresist adhesion to a semiconductor by treating the semiconductor with a disilylamide
US3637384A (en) *	1969-02-17	1972-01-25	Gaf Corp	Positive-working diazo-oxide terpolymer photoresists
US3707373A (en) *	1969-03-17	1972-12-26	Eastman Kodak Co	Lithographic plate developers
US3705055A (en) *	1970-09-18	1972-12-05	Western Electric Co	Method of descumming photoresist patterns
JPS5031486B2 (nl) *	1971-12-28	1975-10-11
JPS5031485B2 (nl) *	1971-12-28	1975-10-11
US3860426A (en) *	1972-12-22	1975-01-14	Eastman Kodak Co	Subbed lithographic printing plate

1974
- 1974-07-08 GB GB30264/74A patent/GB1513368A/en not_active Expired
1975
- 1975-06-30 IE IE1444/75A patent/IE41395B1/xx unknown
- 1975-07-02 ZA ZA00754248A patent/ZA754248B/xx unknown
- 1975-07-07 CA CA230,902A patent/CA1061160A/en not_active Expired
- 1975-07-07 DK DK306475A patent/DK144956C/da not_active IP Right Cessation
- 1975-07-07 SE SE7507761A patent/SE415612B/xx not_active IP Right Cessation
- 1975-07-07 NO NO752440A patent/NO151765C/no unknown
- 1975-07-07 FI FI751976A patent/FI59680C/fi not_active IP Right Cessation
- 1975-07-07 BE BE158045A patent/BE831075A/xx not_active IP Right Cessation
- 1975-07-08 ES ES439238A patent/ES439238A1/es not_active Expired
- 1975-07-08 AT AT523675A patent/AT356147B/de not_active IP Right Cessation
- 1975-07-08 BR BR5515/75D patent/BR7504303A/pt unknown
- 1975-07-08 LU LU72927A patent/LU72927A1/xx unknown
- 1975-07-08 CS CS754848A patent/CS212748B2/cs unknown
- 1975-07-08 FR FR7521335A patent/FR2277682A1/fr active Granted
- 1975-07-08 IT IT25182/75A patent/IT1039749B/it active
- 1975-07-08 PL PL1975181926A patent/PL109957B1/pl unknown
- 1975-07-08 CH CH890375A patent/CH600394A5/xx not_active IP Right Cessation
- 1975-07-08 DE DE2530422A patent/DE2530422C2/de not_active Expired
- 1975-07-08 NL NLAANVRAGE7508115,A patent/NL187283C/nl not_active IP Right Cessation
- 1975-07-08 SU SU7502151540A patent/SU569272A3/ru active
- 1975-07-08 JP JP50083199A patent/JPS612518B2/ja not_active Expired
- 1975-07-08 DD DD187162A patent/DD120088A5/xx unknown
1978
- 1978-12-07 KE KE2908A patent/KE2908A/xx unknown
- 1978-12-20 HK HK747/78A patent/HK74778A/xx unknown
1980
- 1980-08-11 US US06/177,283 patent/US4294910A/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
US4294910A (en)	1981-10-13
HK74778A (en)	1978-12-29
DK144956C (da)	1982-11-29
AU8272775A (en)	1977-03-10
BE831075A (fr)	1975-11-03
IE41395L (en)	1976-01-08
SU569272A3 (ru)	1977-08-15
CA1061160A (en)	1979-08-28
CH600394A5 (nl)	1978-06-15
GB1513368A (en)	1978-06-07
LU72927A1 (nl)	1976-02-04
IE41395B1 (en)	1979-12-19
PL109957B1 (en)	1980-06-30
JPS612518B2 (nl)	1986-01-25
JPS5134001A (nl)	1976-03-23
DE2530422A1 (de)	1976-01-29
BR7504303A (pt)	1976-07-06
FI59680C (fi)	1981-09-10
IT1039749B (it)	1979-12-10
CS212748B2 (en)	1982-03-26
DK306475A (da)	1976-01-09
SE7507761L (sv)	1976-01-09
FR2277682B1 (nl)	1982-04-16
NL187283C (nl)	1991-08-01
ES439238A1 (es)	1977-02-16
DE2530422C2 (de)	1982-08-19
ZA754248B (en)	1976-06-30
NO151765C (no)	1985-05-29
FI59680B (fi)	1981-05-29
NL7508115A (nl)	1976-01-12
DK144956B (da)	1982-07-12
FI751976A (nl)	1976-01-09
FR2277682A1 (fr)	1976-02-06
NO752440L (nl)	1976-01-09
ATA523675A (de)	1977-08-15
NO151765B (no)	1985-02-18
KE2908A (en)	1979-01-19
AT356147B (de)	1980-04-10
DD120088A5 (nl)	1976-05-20

Legal Events

Date

Code

Title

Description

1995-01-31

NAL

Patent in force

Ref document number: 7507761-0

Format of ref document f/p: F

1995-10-09

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