SE366345B - - Google Patents

Info

Publication number: SE366345B
Authority: SE; Sweden

Application number

SE03345/71A

Inventor

R Masotti

Original Assignee

Progil

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1970-04-21

Filing date

1971-03-16

Publication date

1974-04-22

1971-03-16 Application filed by Progil filed Critical Progil

1974-04-22 Publication of SE366345B publication Critical patent/SE366345B/xx

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
- H01J49/46—Static spectrometers
- H01J49/48—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
- H01J49/488—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with retarding grids
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
- C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Mechanical Engineering (AREA)
Electrochemistry (AREA)
Analytical Chemistry (AREA)
Physical Vapour Deposition (AREA)
Inert Electrodes (AREA)

SE03345/71A 1970-04-21 1971-03-16 SE366345B (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
FR7014327A FR2088659A5 (de)	1970-04-21	1970-04-21

Publications (1)

Publication Number	Publication Date
SE366345B true SE366345B (de)	1974-04-22

Family

ID=9054289

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SE03345/71A SE366345B (de)	1970-04-21	1971-03-16

Country Status (17)

Country	Link
US (1)	US3773639A (de)
JP (1)	JPS5324914B1 (de)
AT (1)	AT304990B (de)
BE (1)	BE766023A (de)
BR (1)	BR7102391D0 (de)
CA (1)	CA933881A (de)
CH (1)	CH524690A (de)
DE (1)	DE2119066A1 (de)
ES (1)	ES390345A1 (de)
FR (1)	FR2088659A5 (de)
GB (1)	GB1307956A (de)
IL (1)	IL36656A (de)
LU (1)	LU63024A1 (de)
NL (1)	NL7105157A (de)
PL (1)	PL83268B1 (de)
RO (1)	RO61059A (de)
SE (1)	SE366345B (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
FR2320565A1 (fr) *	1973-04-12	1977-03-04	Radiotechnique Compelec	Plaque a transparence selective et son procede de fabrication
AU507748B2 (en) *	1976-06-10	1980-02-28	University Of Sydney, The	Reactive sputtering
DE2630883C2 (de) *	1976-07-09	1985-02-07	Basf Ag, 6700 Ludwigshafen	Verwendung einer nach dem Plasma- oder Flammspritzverfahren auf einem metallischen Träger aufgebrachten porösen anorganische Oxide enthaltenden Schicht als Diaphragma in einer Elektrolysezelle
AU5889880A (en) *	1979-07-02	1981-01-15	Olin Corporation	Manufacture of low overvoltage electrodes by cathodic sputtering
US4400255A (en) *	1981-06-29	1983-08-23	General Motors Corporation	Control of electron bombardment of the exhaust oxygen sensor during electrode sputtering
US4420385A (en) *	1983-04-15	1983-12-13	Gryphon Products	Apparatus and process for sputter deposition of reacted thin films
US5202008A (en) *	1990-03-02	1993-04-13	Applied Materials, Inc.	Method for preparing a shield to reduce particles in a physical vapor deposition chamber
US5391275A (en) *	1990-03-02	1995-02-21	Applied Materials, Inc.	Method for preparing a shield to reduce particles in a physical vapor deposition chamber
DE69111490T2 (de) *	1990-03-02	1996-04-18	Applied Materials Inc	Verfahren zur Vorbereitung einer Blende zur Verminderung von Teilchen in einer Kammer zur physikalischen Aufdampfung.
DE69220566T2 (de) *	1991-11-21	1998-02-19	Nisshin Steel Co Ltd	Verfahren zur bildung einer beschichtung mittels aufdampfen
DE69330773T2 (de) *	1992-10-14	2002-07-04	Daiki Engineering Co. Ltd., Tokio/Tokyo	Hochfeste Elektroden für die Elektrolyse und ein Verfahren für die Herstellung derselben
CA2154428C (fr) *	1995-07-21	2005-03-22	Robert Schulz	Alliages a base de ti, ru, fe et o et usage de ceux-ci pour la fabrication de cathodes pour la synthese electrochimique du chlorate de sodium
FR2861219B1 (fr) *	2003-10-15	2006-04-07	Commissariat Energie Atomique	Pile a combustible alcaline comportant une anode comprenant de l'aluminium et du zinc et procede de fabrication de l'anode
US20050205415A1 (en) *	2004-03-19	2005-09-22	Belousov Igor V	Multi-component deposition
ITMI20091621A1 (it) *	2009-09-23	2011-03-24	Industrie De Nora Spa	Elettrodo per processi elettrolitici con struttura cristallina controllata
JP4734664B1 (ja) *	2010-09-17	2011-07-27	田中貴金属工業株式会社	電解用電極、オゾン電解生成用陽極、過硫酸電解生成用陽極及びクロム電解酸化用陽極
US10654034B2 (en)	2014-05-30	2020-05-19	At Energy Llc	Method of preparing platinum-based catalyst and platinum-based catalyst
RU2562462C1 (ru) *	2014-05-30	2015-09-10	Общество с ограниченной ответственностью "Эй Ти Энерджи", ООО "Эй Ти Энерджи"	Способ изготовления катализатора на основе платины и катализатор на основе платины

1970
- 1970-04-21 FR FR7014327A patent/FR2088659A5/fr not_active Expired
1971
- 1971-03-15 CH CH372571A patent/CH524690A/fr not_active IP Right Cessation
- 1971-03-16 SE SE03345/71A patent/SE366345B/xx unknown
- 1971-04-05 US US00131497A patent/US3773639A/en not_active Expired - Lifetime
- 1971-04-06 RO RO66501D patent/RO61059A/ro unknown
- 1971-04-16 NL NL7105157A patent/NL7105157A/xx unknown
- 1971-04-19 GB GB2665571*A patent/GB1307956A/en not_active Expired
- 1971-04-19 CA CA110757A patent/CA933881A/en not_active Expired
- 1971-04-19 ES ES390345A patent/ES390345A1/es not_active Expired
- 1971-04-19 JP JP2520271A patent/JPS5324914B1/ja active Pending
- 1971-04-19 PL PL1971147635A patent/PL83268B1/pl unknown
- 1971-04-20 DE DE19712119066 patent/DE2119066A1/de active Pending
- 1971-04-20 IL IL36656A patent/IL36656A/xx unknown
- 1971-04-20 LU LU63024D patent/LU63024A1/xx unknown
- 1971-04-20 BE BE766023A patent/BE766023A/xx unknown
- 1971-04-21 AT AT342371A patent/AT304990B/de not_active IP Right Cessation
- 1971-04-22 BR BR2391/71A patent/BR7102391D0/pt unknown

Also Published As

Publication number	Publication date
AT304990B (de)	1973-02-12
JPS5324914B1 (de)	1978-07-24
BE766023A (fr)	1971-10-20
GB1307956A (en)	1973-02-21
ES390345A1 (es)	1973-06-01
NL7105157A (de)	1971-10-25
IL36656A (en)	1974-01-14
FR2088659A5 (de)	1972-01-07
BR7102391D0 (pt)	1973-05-03
CH524690A (fr)	1972-06-30
US3773639A (en)	1973-11-20
IL36656A0 (en)	1971-06-23
RO61059A (de)	1976-10-15
DE2119066A1 (de)	1971-11-04
CA933881A (en)	1973-09-18
PL83268B1 (de)	1975-12-31
LU63024A1 (de)	1972-12-11

Publication	Publication Date	Title
AR204384A1 (de)	1976-02-06
ATA96471A (de)	1973-02-15
AU2044470A (de)	1972-03-30
AU1517670A (de)	1971-11-18
AU1833270A (de)	1972-02-10
AU1716970A (de)	1972-01-06
AU2017870A (de)	1972-03-23
AU2085370A (de)	1972-04-13
AU2130570A (de)	1972-04-27
AR195465A1 (de)	1973-10-15
AU1872870A (de)	1972-02-17
AU1004470A (de)	1971-07-08
AU1918570A (de)	1972-03-02
AU1581370A (de)	1971-12-09
AU1591370A (de)	1971-12-09
AU1064870A (de)	1971-07-29
AU1603270A (de)	1971-12-09
AU2144270A (de)	1972-04-27
AU2131570A (de)	1972-04-27
AU2130770A (de)	1972-04-27
AU1689770A (de)	1972-01-06
AU2119370A (de)	1972-04-20
AU2115870A (de)	1972-04-20
AU2112570A (de)	1972-04-20
AU1832970A (de)	1972-02-03