NL156092B
(en)
*
|
1968-03-25 |
1978-03-15 |
Polychrome Corp |
PROCESS FOR THE MANUFACTURE OF A LITHOGRAPHIC PRINTING PLATE.
|
US3867147A
(en)
*
|
1969-05-20 |
1975-02-18 |
Hoechst Co American |
Light-sensitive diazo compounds and reproduction material employing the same
|
US3891516A
(en)
*
|
1970-08-03 |
1975-06-24 |
Polychrome Corp |
Process of electrolyically anodizing a mechanically grained aluminum base and article made thereby
|
US3790382A
(en)
*
|
1971-04-16 |
1974-02-05 |
Minnesota Mining & Mfg |
Fluorinated polyamide-diazo resin coating composition
|
JPS5539825B2
(en)
*
|
1972-05-12 |
1980-10-14 |
|
|
US3997349A
(en)
*
|
1974-06-17 |
1976-12-14 |
Minnesota Mining And Manufacturing Company |
Light-sensitive development-free driographic printing plate
|
US4230492A
(en)
*
|
1978-01-17 |
1980-10-28 |
The Richardson Company |
Aryl sulfonic acid based stabilizers for presensitized planographic plates
|
US4299907A
(en)
*
|
1978-08-10 |
1981-11-10 |
Polychrome Corporation |
Storage stable photosensitive diazo lithographic printing plates
|
US4414315A
(en)
*
|
1979-08-06 |
1983-11-08 |
Howard A. Fromson |
Process for making lithographic printing plate
|
US4401743A
(en)
*
|
1980-04-30 |
1983-08-30 |
Minnesota Mining And Manufacturing Company |
Aqueous developable photosensitive composition and printing plate
|
US4326020A
(en)
*
|
1980-09-10 |
1982-04-20 |
Polychrome Corporation |
Method of making positive acting diazo lithographic printing plate
|
US4499170A
(en)
*
|
1983-06-17 |
1985-02-12 |
Richardson Graphics Company |
Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative
|
US5066568A
(en)
*
|
1985-08-05 |
1991-11-19 |
Hoehst Celanese Corporation |
Method of developing negative working photographic elements
|
US4980271A
(en)
*
|
1985-08-05 |
1990-12-25 |
Hoechst Celanese Corporation |
Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
|
US5122442A
(en)
*
|
1989-07-28 |
1992-06-16 |
Hoechst Celanese Corporation |
Method for forming an image from a high speed screen printing composition on a screen mesh
|
US5232813A
(en)
*
|
1990-01-31 |
1993-08-03 |
Fuji Photo Film Co., Ltd. |
Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer
|
CN1037552C
(en)
*
|
1991-03-21 |
1998-02-25 |
北京大学 |
Negative photosensitive printed board and its making method
|
US5942368A
(en)
*
|
1996-04-23 |
1999-08-24 |
Konica Corporation |
Pigment dispersion composition
|
JP3567402B2
(en)
*
|
1996-06-12 |
2004-09-22 |
コニカミノルタホールディングス株式会社 |
Method for producing lithographic printing plate support, lithographic printing plate support obtained by the method, and photosensitive lithographic printing plate using the support
|
US20130172476A1
(en)
|
2010-07-02 |
2013-07-04 |
Dic Corporation |
Fluorine-based surfactant, and coating composition and resist composition each using the same
|
US9359547B2
(en)
*
|
2013-01-31 |
2016-06-07 |
Halliburton Energy Services, Inc. |
Wellbore servicing compositions and methods of making and using same
|
US20230090038A1
(en)
|
2019-12-25 |
2023-03-23 |
Dic Corporation |
Polymer and coating composition containing said polymer
|
US20230323002A1
(en)
|
2020-09-03 |
2023-10-12 |
Dic Corporation |
Polymer, coating composition, resist composition, and article
|
EP4265661A1
(en)
|
2020-12-17 |
2023-10-25 |
DIC Corporation |
Compound, leveling agent, coating composition, resist composition, and article
|
TW202311331A
(en)
|
2021-05-18 |
2023-03-16 |
日商Dic股份有限公司 |
Silicone chain-containing polymer, coating composition, resist composition and article
|