SE0001369L - Förfarande vid samt apparat för bearbetning av substrat - Google Patents

Förfarande vid samt apparat för bearbetning av substrat

Info

Publication number
SE0001369L
SE0001369L SE0001369A SE0001369A SE0001369L SE 0001369 L SE0001369 L SE 0001369L SE 0001369 A SE0001369 A SE 0001369A SE 0001369 A SE0001369 A SE 0001369A SE 0001369 L SE0001369 L SE 0001369L
Authority
SE
Sweden
Prior art keywords
cleaning
substrate
flushing
chamber
fluid
Prior art date
Application number
SE0001369A
Other languages
Unknown language ( )
English (en)
Other versions
SE0001369D0 (sv
Inventor
Mats Haallberg
Original Assignee
Obducat Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Obducat Ab filed Critical Obducat Ab
Priority to SE0001369A priority Critical patent/SE0001369L/sv
Publication of SE0001369D0 publication Critical patent/SE0001369D0/sv
Priority to AU48967/01A priority patent/AU4896701A/en
Priority to PCT/SE2001/000823 priority patent/WO2001079589A1/en
Publication of SE0001369L publication Critical patent/SE0001369L/sv

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G3/00—Apparatus for cleaning or pickling metallic material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/08—Rinsing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Chemically Coating (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
SE0001369A 2000-04-13 2000-04-13 Förfarande vid samt apparat för bearbetning av substrat SE0001369L (sv)

Priority Applications (3)

Application Number Priority Date Filing Date Title
SE0001369A SE0001369L (sv) 2000-04-13 2000-04-13 Förfarande vid samt apparat för bearbetning av substrat
AU48967/01A AU4896701A (en) 2000-04-13 2001-04-12 Method in and apparatus for etching or plating of substrates
PCT/SE2001/000823 WO2001079589A1 (en) 2000-04-13 2001-04-12 Method in and apparatus for etching or plating of substrates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0001369A SE0001369L (sv) 2000-04-13 2000-04-13 Förfarande vid samt apparat för bearbetning av substrat

Publications (2)

Publication Number Publication Date
SE0001369D0 SE0001369D0 (sv) 2000-04-13
SE0001369L true SE0001369L (sv) 2001-10-14

Family

ID=20279305

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0001369A SE0001369L (sv) 2000-04-13 2000-04-13 Förfarande vid samt apparat för bearbetning av substrat

Country Status (3)

Country Link
AU (1) AU4896701A (sv)
SE (1) SE0001369L (sv)
WO (1) WO2001079589A1 (sv)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4740518B2 (ja) 2000-07-17 2011-08-03 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 転写リソグラフィ・プロセスのための自動液体ディスペンス方法およびシステム
DE10318074B4 (de) 2003-04-17 2009-05-20 Qimonda Ag Verfahren zur Herstellung von BOC Modul Anordnungen mit verbesserten mechanischen Eigenschaften
US8850980B2 (en) 2006-04-03 2014-10-07 Canon Nanotechnologies, Inc. Tessellated patterns in imprint lithography

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4880436A (sv) * 1972-01-31 1973-10-27
DE2359691A1 (de) * 1973-11-30 1975-06-05 Josef Dr Phil Heyes Vorrichtung zum konstanthalten des badspiegels in einem galvanischen bad und diesem nachgeschalteten spuelbaedern
US4163705A (en) * 1975-05-06 1979-08-07 Korpi Teuvo Tapio Apparatus for chemical and electrochemical treatment
IT1177925B (it) * 1984-07-24 1987-08-26 Centro Speriment Metallurg Procedimento per elettrodeposizione in continuo di metalli ad elevata denista' di corrente di celle verticali e relativo dispositivo di attuazione
JPH03505348A (ja) * 1988-11-24 1991-11-21 グラム，ゲルハルト ワークピースにおいて被覆部を積層および／または除去する装置
US5180438A (en) * 1989-10-11 1993-01-19 Hockh Metall-Reinigungsanlagen Gmbh Cleaning and drying system
DE3936363A1 (de) * 1989-11-02 1991-05-08 Hoellmueller Maschbau H Verfahren zum aetzen von gegenstaenden sowie aetzanlage
DE3939222C1 (sv) * 1989-11-28 1990-11-08 Schering Ag, 1000 Berlin Und 4709 Bergkamen, De
JP3161494B2 (ja) * 1993-12-28 2001-04-25 日本軽金属株式会社 陽極酸化処理後のアルミニウム材の洗浄排水処理方法
DE4413077C2 (de) * 1994-04-15 1997-02-06 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur chemischen Behandlung von Substraten

Also Published As

Publication number Publication date
AU4896701A (en) 2001-10-30
WO2001079589A1 (en) 2001-10-25
SE0001369D0 (sv) 2000-04-13

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Legal Events

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NAV Patent application has lapsed