SE0001368L - Apparat och förfarande för elektrokemisk bearbetning av substrat - Google Patents
Apparat och förfarande för elektrokemisk bearbetning av substratInfo
- Publication number
- SE0001368L SE0001368L SE0001368A SE0001368A SE0001368L SE 0001368 L SE0001368 L SE 0001368L SE 0001368 A SE0001368 A SE 0001368A SE 0001368 A SE0001368 A SE 0001368A SE 0001368 L SE0001368 L SE 0001368L
- Authority
- SE
- Sweden
- Prior art keywords
- substrate
- chamber
- electrode member
- electrolyte
- substrate holder
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/10—Agitating of electrolytes; Moving of racks
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Weting (AREA)
- Electroplating Methods And Accessories (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0001368A SE0001368L (sv) | 2000-04-13 | 2000-04-13 | Apparat och förfarande för elektrokemisk bearbetning av substrat |
PCT/SE2001/000822 WO2001079591A1 (en) | 2000-04-13 | 2001-04-12 | Apparatus and method for electrochemical processing of substrates |
AU48966/01A AU4896601A (en) | 2000-04-13 | 2001-04-12 | Apparatus and method for electrochemical processing of substrates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0001368A SE0001368L (sv) | 2000-04-13 | 2000-04-13 | Apparat och förfarande för elektrokemisk bearbetning av substrat |
Publications (2)
Publication Number | Publication Date |
---|---|
SE0001368D0 SE0001368D0 (sv) | 2000-04-13 |
SE0001368L true SE0001368L (sv) | 2001-10-14 |
Family
ID=20279304
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0001368A SE0001368L (sv) | 2000-04-13 | 2000-04-13 | Apparat och förfarande för elektrokemisk bearbetning av substrat |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU4896601A (sv) |
SE (1) | SE0001368L (sv) |
WO (1) | WO2001079591A1 (sv) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4740518B2 (ja) | 2000-07-17 | 2011-08-03 | ボード・オブ・リージエンツ,ザ・ユニバーシテイ・オブ・テキサス・システム | 転写リソグラフィ・プロセスのための自動液体ディスペンス方法およびシステム |
US7730834B2 (en) | 2004-03-04 | 2010-06-08 | Asml Netherlands B.V. | Printing apparatus and device manufacturing method |
US7676088B2 (en) | 2004-12-23 | 2010-03-09 | Asml Netherlands B.V. | Imprint lithography |
US7686970B2 (en) | 2004-12-30 | 2010-03-30 | Asml Netherlands B.V. | Imprint lithography |
US7490547B2 (en) | 2004-12-30 | 2009-02-17 | Asml Netherlands B.V. | Imprint lithography |
US7354698B2 (en) | 2005-01-07 | 2008-04-08 | Asml Netherlands B.V. | Imprint lithography |
US7922474B2 (en) | 2005-02-17 | 2011-04-12 | Asml Netherlands B.V. | Imprint lithography |
US7523701B2 (en) | 2005-03-07 | 2009-04-28 | Asml Netherlands B.V. | Imprint lithography method and apparatus |
US7611348B2 (en) | 2005-04-19 | 2009-11-03 | Asml Netherlands B.V. | Imprint lithography |
US7762186B2 (en) | 2005-04-19 | 2010-07-27 | Asml Netherlands B.V. | Imprint lithography |
US7442029B2 (en) | 2005-05-16 | 2008-10-28 | Asml Netherlands B.V. | Imprint lithography |
US7708924B2 (en) | 2005-07-21 | 2010-05-04 | Asml Netherlands B.V. | Imprint lithography |
US20060267231A1 (en) | 2005-05-27 | 2006-11-30 | Asml Netherlands B.V. | Imprint lithography |
US7692771B2 (en) | 2005-05-27 | 2010-04-06 | Asml Netherlands B.V. | Imprint lithography |
US7418902B2 (en) | 2005-05-31 | 2008-09-02 | Asml Netherlands B.V. | Imprint lithography including alignment |
US7377764B2 (en) | 2005-06-13 | 2008-05-27 | Asml Netherlands B.V. | Imprint lithography |
US7878791B2 (en) | 2005-11-04 | 2011-02-01 | Asml Netherlands B.V. | Imprint lithography |
US8011915B2 (en) | 2005-11-04 | 2011-09-06 | Asml Netherlands B.V. | Imprint lithography |
US7517211B2 (en) | 2005-12-21 | 2009-04-14 | Asml Netherlands B.V. | Imprint lithography |
US8015939B2 (en) | 2006-06-30 | 2011-09-13 | Asml Netherlands B.V. | Imprintable medium dispenser |
US8318253B2 (en) | 2006-06-30 | 2012-11-27 | Asml Netherlands B.V. | Imprint lithography |
US7854877B2 (en) | 2007-08-14 | 2010-12-21 | Asml Netherlands B.V. | Lithography meandering order |
US8144309B2 (en) | 2007-09-05 | 2012-03-27 | Asml Netherlands B.V. | Imprint lithography |
WO2013033810A1 (en) * | 2011-09-08 | 2013-03-14 | Day4 Energy Inc. | Forming an oxide layer on a flat conductive surface |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE7603626L (sv) * | 1975-03-27 | 1977-01-04 | Otto Alfred Becker | Anordning for att galvanisera metallytor, serskilt vid snittkantytor hos genom stapling tillskurna platar |
US4163705A (en) * | 1975-05-06 | 1979-08-07 | Korpi Teuvo Tapio | Apparatus for chemical and electrochemical treatment |
IT1177925B (it) * | 1984-07-24 | 1987-08-26 | Centro Speriment Metallurg | Procedimento per elettrodeposizione in continuo di metalli ad elevata denista' di corrente di celle verticali e relativo dispositivo di attuazione |
FR2648157A1 (fr) * | 1989-06-13 | 1990-12-14 | Traitement Surface Mecanique | Dispositif permettant d'assurer un depot electrolytique homogene sur des surfaces cylindriques de grandes dimensions |
US5180438A (en) * | 1989-10-11 | 1993-01-19 | Hockh Metall-Reinigungsanlagen Gmbh | Cleaning and drying system |
SE467976B (sv) * | 1991-02-20 | 1992-10-12 | Dcm Innovation Ab | Anordning foer elektroplaetering, vid framstaellning av matriser foer tillverkning av t ex cd-skivor samt foerfarande foer tillverkning av matriser medelst anordningen |
US5660699A (en) * | 1995-02-20 | 1997-08-26 | Kao Corporation | Electroplating apparatus |
JPH08283995A (ja) * | 1995-04-13 | 1996-10-29 | Seikosha Co Ltd | メッキ装置 |
US5522975A (en) * | 1995-05-16 | 1996-06-04 | International Business Machines Corporation | Electroplating workpiece fixture |
US5683564A (en) * | 1996-10-15 | 1997-11-04 | Reynolds Tech Fabricators Inc. | Plating cell and plating method with fluid wiper |
-
2000
- 2000-04-13 SE SE0001368A patent/SE0001368L/sv not_active Application Discontinuation
-
2001
- 2001-04-12 WO PCT/SE2001/000822 patent/WO2001079591A1/en active Application Filing
- 2001-04-12 AU AU48966/01A patent/AU4896601A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
SE0001368D0 (sv) | 2000-04-13 |
AU4896601A (en) | 2001-10-30 |
WO2001079591A1 (en) | 2001-10-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
NAV | Patent application has lapsed |