RU94036273A - Method for coat deposition by centrifuging - Google Patents

Method for coat deposition by centrifuging

Info

Publication number
RU94036273A
RU94036273A RU94036273/25A RU94036273A RU94036273A RU 94036273 A RU94036273 A RU 94036273A RU 94036273/25 A RU94036273/25 A RU 94036273/25A RU 94036273 A RU94036273 A RU 94036273A RU 94036273 A RU94036273 A RU 94036273A
Authority
RU
Russia
Prior art keywords
plate
deposition
solution
photoresist
speed
Prior art date
Application number
RU94036273/25A
Other languages
Russian (ru)
Other versions
RU2094903C1 (en
Inventor
Г.В. Абрамов
В.К. Битюков
Г.В. Попов
В.В. Рыжков
Original Assignee
Воронежский технологический институт
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Воронежский технологический институт filed Critical Воронежский технологический институт
Priority to RU94036273A priority Critical patent/RU2094903C1/en
Publication of RU94036273A publication Critical patent/RU94036273A/en
Application granted granted Critical
Publication of RU2094903C1 publication Critical patent/RU2094903C1/en

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  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

FIELD: semiconductor engineering; deposition of coats (such as photoresist) on plates. SUBSTANCE: upon deposition of metered portion of solution on plate rotating at speed of 5000-7000 rpm and coating of plate entire surface with solution, uniform layer is formed for 10-15 s while varying plate speed according to law: ω=A/t, where t is time from beginning of deposition; w is angular velocity of plate; A is experimental constant depending on physical properties of photoresist (viscosity, etc.). Irregularity of layer obtained by this method is 9-10% lower. EFFECT: improved uniformity of layer obtained.

Claims (1)

Изобретение относится к области полупроводникового производства и может быть использовано при нанесении покрытий (например, из фоторезиста) на пластины. Технической задачей изобретения является повышение равномерности слоя покрытия. Сущность способа в том, что после нанесения дозы раствора на вращающийся со скоростью 5000-7000 об/мин пластину, полного покрытия раствором всей поверхности, в течение 10-15 с формируют равномерный слой, изменяя скорость вращения пластины. Предлагаемый способ позволяет уменьшить неравномерность получаемого слоя на 9-10%.The invention relates to the field of semiconductor production and can be used in coating (for example, from photoresist) on a plate. An object of the invention is to increase the uniformity of the coating layer. The essence of the method is that after applying a dose of the solution to a plate rotating at a speed of 5000-7000 rpm, completely covering the entire surface with a solution, a uniform layer is formed within 10-15 seconds, changing the speed of rotation of the plate. The proposed method allows to reduce the unevenness of the resulting layer by 9-10%.
RU94036273A 1994-09-19 1994-09-19 Method for depositing coats by centrifuging RU2094903C1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
RU94036273A RU2094903C1 (en) 1994-09-19 1994-09-19 Method for depositing coats by centrifuging

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
RU94036273A RU2094903C1 (en) 1994-09-19 1994-09-19 Method for depositing coats by centrifuging

Publications (2)

Publication Number Publication Date
RU94036273A true RU94036273A (en) 1996-07-10
RU2094903C1 RU2094903C1 (en) 1997-10-27

Family

ID=20160991

Family Applications (1)

Application Number Title Priority Date Filing Date
RU94036273A RU2094903C1 (en) 1994-09-19 1994-09-19 Method for depositing coats by centrifuging

Country Status (1)

Country Link
RU (1) RU2094903C1 (en)

Also Published As

Publication number Publication date
RU2094903C1 (en) 1997-10-27

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