RU2017126041A3 - - Google Patents

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Publication number
RU2017126041A3
RU2017126041A3 RU2017126041A RU2017126041A RU2017126041A3 RU 2017126041 A3 RU2017126041 A3 RU 2017126041A3 RU 2017126041 A RU2017126041 A RU 2017126041A RU 2017126041 A RU2017126041 A RU 2017126041A RU 2017126041 A3 RU2017126041 A3 RU 2017126041A3
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RU
Russia
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RU2017126041A
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RU2017126041A (ru
RU2696352C2 (ru
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02373Group 14 semiconducting materials
    • H01L21/02381Silicon, silicon germanium, germanium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/02433Crystal orientation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02455Group 13/15 materials
    • H01L21/02463Arsenides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02455Group 13/15 materials
    • H01L21/02466Antimonides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02516Crystal orientation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02538Group 13/15 materials
    • H01L21/02546Arsenides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02609Crystal orientation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/0256Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
    • H01L31/0264Inorganic materials
    • H01L31/0304Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
    • H01L31/03046Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds including ternary or quaternary compounds, e.g. GaAlAs, InGaAs, InGaAsP
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/072Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
    • H01L31/0735Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising only AIIIBV compound semiconductors, e.g. GaAs/AlGaAs or InP/GaInAs solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/184Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
    • H01L31/1844Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP comprising ternary or quaternary compounds, e.g. Ga Al As, In Ga As P
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/184Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
    • H01L31/1852Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP comprising a growth substrate not being an AIIIBV compound
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/543Solar cells from Group II-VI materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/544Solar cells from Group III-V materials

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electromagnetism (AREA)
  • Materials Engineering (AREA)
  • Sustainable Energy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Recrystallisation Techniques (AREA)
  • Photovoltaic Devices (AREA)
RU2017126041A 2014-12-23 2015-12-23 Способ эпитаксиального выращивания границы раздела между материалами из iii-v групп и кремниевой пластиной, обеспечивающий нейтрализацию остаточных деформаций RU2696352C2 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP14200021 2014-12-23
EP14200021.5 2014-12-23
PCT/NO2015/050261 WO2016105211A1 (en) 2014-12-23 2015-12-23 A method of epitaxial growth of a material interface between group iii-v materials and silicon wafers providing counterbalancing of residual strains

Publications (3)

Publication Number Publication Date
RU2017126041A RU2017126041A (ru) 2019-01-25
RU2017126041A3 true RU2017126041A3 (ru) 2019-06-04
RU2696352C2 RU2696352C2 (ru) 2019-08-01

Family

ID=52146316

Family Applications (1)

Application Number Title Priority Date Filing Date
RU2017126041A RU2696352C2 (ru) 2014-12-23 2015-12-23 Способ эпитаксиального выращивания границы раздела между материалами из iii-v групп и кремниевой пластиной, обеспечивающий нейтрализацию остаточных деформаций

Country Status (8)

Country Link
US (1) US20170352536A1 (ru)
EP (1) EP3238229A1 (ru)
JP (2) JP6882980B2 (ru)
KR (1) KR20170095912A (ru)
CN (1) CN107278323B (ru)
CA (1) CA2971128C (ru)
RU (1) RU2696352C2 (ru)
WO (1) WO2016105211A1 (ru)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10249780B1 (en) * 2016-02-03 2019-04-02 Stc.Unm High quality AlSb for radiation detection
US11367802B2 (en) * 2018-02-08 2022-06-21 Alliance For Sustainable Energy, Llc Two-junction photovoltaic devices
NO20230297A1 (en) 2022-03-22 2023-09-25 Integrated Solar As A method of manufacturing group III-V based semiconductor materials comprising strain relaxed buffers providing possibility for lattice constant adjustment when growing on (111)Si substrates
CN117558644B (zh) * 2023-12-21 2024-03-26 苏州焜原光电有限公司 标定InGaxAs/InAsSby超晶格组分的方法

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JPH0296325A (ja) * 1988-09-30 1990-04-09 Fujitsu Ltd 半導体装置の製造方法
JP2557546B2 (ja) * 1990-03-30 1996-11-27 三菱電機株式会社 半導体装置の製造方法
JPH06181174A (ja) * 1991-04-12 1994-06-28 Nec Corp Si基板上へのIII−V族化合物半導体のヘテロエピタキシャル成長法
JPH06349733A (ja) * 1993-06-11 1994-12-22 Sumitomo Metal Ind Ltd 化合物半導体基板及びその製造方法
JP3752810B2 (ja) * 1997-11-26 2006-03-08 昭和電工株式会社 エピタキシャルウェハおよびその製造方法並びに半導体素子
JP2003526203A (ja) * 2000-03-02 2003-09-02 アイクストロン、アーゲー III族−N、(III−V)族−Nおよび金属−窒素の所定成分による層構造をSi基板上に作成する方法および装置
JP5093740B2 (ja) * 2001-07-26 2012-12-12 株式会社Ihi 半導体結晶膜の成長方法
JP2004128415A (ja) * 2002-10-07 2004-04-22 Toshiba Corp トランジスタ、ウェーハ、トランジスタの製造方法、ウェーハの製造方法および半導体層の形成方法
JP2007088426A (ja) * 2005-08-25 2007-04-05 Furukawa Electric Co Ltd:The 半導体電子デバイス
US7928471B2 (en) * 2006-12-04 2011-04-19 The United States Of America As Represented By The Secretary Of The Navy Group III-nitride growth on silicon or silicon germanium substrates and method and devices therefor
JP2009105231A (ja) * 2007-10-24 2009-05-14 Sony Corp 半導体基板およびその製造方法、ならびに半導体装置
US8299351B2 (en) * 2009-02-24 2012-10-30 Hong Kong Applied Science And Technology Research Institute Co., Ltd. Epitaxial growth of III-V compounds on (111) silicon for solar cells
NO20093193A1 (no) * 2009-10-22 2011-04-26 Integrated Solar As Fremgangsmate for fremstilling av fotoelektriske solceller og en multifunksjonell solcelle
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US9595438B2 (en) * 2011-09-12 2017-03-14 Nasp Iii/V Gmbh Method for producing a III/V Si template
US20150255668A1 (en) * 2011-09-30 2015-09-10 Microlink Devices, Inc. Thin film inp-based solar cells using epitaxial lift-off
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KR20140121192A (ko) * 2013-04-05 2014-10-15 삼성전자주식회사 기판 구조체 및 이를 포함하는 반도체 소자

Also Published As

Publication number Publication date
KR20170095912A (ko) 2017-08-23
EP3238229A1 (en) 2017-11-01
CA2971128A1 (en) 2016-06-30
WO2016105211A1 (en) 2016-06-30
CA2971128C (en) 2024-01-02
CN107278323A (zh) 2017-10-20
JP6882980B2 (ja) 2021-06-02
JP2021073721A (ja) 2021-05-13
RU2017126041A (ru) 2019-01-25
JP2018516448A (ja) 2018-06-21
RU2696352C2 (ru) 2019-08-01
US20170352536A1 (en) 2017-12-07
CN107278323B (zh) 2021-02-12

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