PL1788443T3 - Sposób wytwarzania litograficznej płyty drukowej - Google Patents

Sposób wytwarzania litograficznej płyty drukowej

Info

Publication number
PL1788443T3
PL1788443T3 PL05110918T PL05110918T PL1788443T3 PL 1788443 T3 PL1788443 T3 PL 1788443T3 PL 05110918 T PL05110918 T PL 05110918T PL 05110918 T PL05110918 T PL 05110918T PL 1788443 T3 PL1788443 T3 PL 1788443T3
Authority
PL
Poland
Prior art keywords
making
printing plate
lithographic printing
lithographic
plate
Prior art date
Application number
PL05110918T
Other languages
English (en)
Inventor
Damme Marc Van
Original Assignee
Agfa Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agfa Nv filed Critical Agfa Nv
Publication of PL1788443T3 publication Critical patent/PL1788443T3/pl

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3042Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3042Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/38Treatment before imagewise removal, e.g. prebaking
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
PL05110918T 2005-11-18 2005-11-18 Sposób wytwarzania litograficznej płyty drukowej PL1788443T3 (pl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05110918.9A EP1788443B1 (en) 2005-11-18 2005-11-18 Method of making a lithographic printing plate

Publications (1)

Publication Number Publication Date
PL1788443T3 true PL1788443T3 (pl) 2014-12-31

Family

ID=36950332

Family Applications (1)

Application Number Title Priority Date Filing Date
PL05110918T PL1788443T3 (pl) 2005-11-18 2005-11-18 Sposób wytwarzania litograficznej płyty drukowej

Country Status (10)

Country Link
US (1) US8119330B2 (pl)
EP (2) EP1788443B1 (pl)
JP (1) JP2009516222A (pl)
KR (1) KR101290271B1 (pl)
CN (1) CN101331433B (pl)
AU (1) AU2006314571B2 (pl)
BR (1) BRPI0616819B1 (pl)
ES (1) ES2479066T3 (pl)
PL (1) PL1788443T3 (pl)
WO (1) WO2007057348A1 (pl)

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ES2365885T3 (es) 2008-03-31 2011-10-13 Agfa Graphics N.V. Un método para tratar una plancha de impresión litográfica.
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JP5715975B2 (ja) 2012-02-29 2015-05-13 富士フイルム株式会社 平版印刷版原版および平版印刷版の製造方法
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WO2014198820A1 (en) 2013-06-14 2014-12-18 Agfa Graphics Nv A lithographic printing plate precursor
EP2883699B1 (en) 2013-12-11 2017-05-03 Agfa Graphics Nv A lithographic printing plate precursor and monomer
EP2916171B1 (en) * 2014-03-03 2017-05-31 Agfa Graphics Nv A method for making a lithographic printing plate precursor
US20160259243A1 (en) * 2015-03-03 2016-09-08 Eastman Kodak Company Negative-working lithographic printing plate precursor
CN108778745A (zh) 2016-03-16 2018-11-09 爱克发有限公司 加工平版印刷版的方法
EP3392709A1 (en) 2017-04-21 2018-10-24 Agfa Nv A lithographic printing plate precursor
EP3431290B1 (en) 2017-07-20 2021-09-08 Agfa Nv A lithographic printing plate precursor
EP3441223B1 (en) 2017-08-07 2024-02-21 Eco3 Bv A lithographic printing plate precursor
EP3474073B1 (en) 2017-10-17 2022-12-07 Agfa Offset Bv A method for making a printing plate
ES2881270T3 (es) 2017-12-08 2021-11-29 Agfa Nv Procedimiento de fabricación de una plancha de impresión litográfica
CN111867839A (zh) 2018-03-22 2020-10-30 爱克发有限公司 平版印刷版前体
WO2019219565A1 (en) 2018-05-14 2019-11-21 Agfa Nv A lithographic printing plate precursor
EP3587113B1 (en) 2018-06-21 2023-01-04 Agfa Offset Bv A lithographic printing plate precursor
EP3587112B1 (en) * 2018-06-21 2024-04-03 Eco3 Bv A lithographic printing plate precursor
EP3637188A1 (en) 2018-10-08 2020-04-15 Agfa Nv An effervescent developer precursor for processing a lithographic printing plate precursor
EP3650938A1 (en) 2018-11-09 2020-05-13 Agfa Nv A lithographic printing plate precursor
WO2020120402A1 (en) 2018-12-10 2020-06-18 Agfa Nv On-press processing of a uv or violet-sensitized lithographic printing plate
EP3686011A1 (en) 2019-01-23 2020-07-29 Agfa Nv A lithographic printing plate precursor
EP3815900A1 (en) 2019-10-31 2021-05-05 Agfa Nv A lithographic printing plate precursor and method for making hydrophobic resin particles
EP3875271A1 (en) 2020-03-04 2021-09-08 Agfa Nv A lithographic printing plate precursor
EP3892469B1 (en) 2020-04-10 2023-11-08 Eco3 Bv Lithographic printing plate precursor
US20230311474A1 (en) 2020-06-24 2023-10-05 Agfa Offset Bv A Lithographic Printing Plate Precursor
EP3928983B1 (en) 2020-06-24 2023-09-27 Eco3 Bv A lithographic printing plate precursor
WO2021259648A1 (en) 2020-06-24 2021-12-30 Agfa Offset Bv A lithographic printing plate precursor
EP3960455A1 (en) 2020-08-31 2022-03-02 Agfa Offset Bv A lithographic printing plate precursor
US20230382100A1 (en) 2020-10-09 2023-11-30 Agfa Offset Bv A Lithographic Printing Plate Precursor
EP4035897A1 (en) 2021-01-28 2022-08-03 Agfa Offset Bv A lithographic printing plate precursor
EP4129682A1 (en) 2021-08-05 2023-02-08 Agfa Offset Bv A lithographic printing plate precursor
NL2030535B1 (en) * 2022-01-13 2023-07-25 Xsys Prepress N V Method to control the solid content of a development liquid for developing a relief precursor, associated washer apparatus, and associated system
EP4223534A1 (en) 2022-02-07 2023-08-09 Agfa Offset Bv A lithographic printing plate precursor

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Also Published As

Publication number Publication date
EP1788443A1 (en) 2007-05-23
EP2772805A1 (en) 2014-09-03
AU2006314571A1 (en) 2007-05-24
KR20080068070A (ko) 2008-07-22
BRPI0616819B1 (pt) 2018-03-27
ES2479066T3 (es) 2014-07-23
US8119330B2 (en) 2012-02-21
JP2009516222A (ja) 2009-04-16
AU2006314571B2 (en) 2011-08-25
EP1788443B1 (en) 2014-07-02
US20080286695A1 (en) 2008-11-20
KR101290271B1 (ko) 2013-07-29
CN101331433B (zh) 2010-12-01
WO2007057348A1 (en) 2007-05-24
CN101331433A (zh) 2008-12-24
BRPI0616819A2 (pt) 2011-07-05

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