NZ215095A - Photosensitive resin compositions - Google Patents

Photosensitive resin compositions

Info

Publication number
NZ215095A
NZ215095A NZ21509586A NZ21509586A NZ215095A NZ 215095 A NZ215095 A NZ 215095A NZ 21509586 A NZ21509586 A NZ 21509586A NZ 21509586 A NZ21509586 A NZ 21509586A NZ 215095 A NZ215095 A NZ 215095A
Authority
NZ
New Zealand
Prior art keywords
photosensitive resin
resin compositions
compositions
photosensitive
resin
Prior art date
Application number
NZ21509586A
Inventor
Mamoru Seio
Kusuda Hidefumi
Kawabata Masami
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of NZ215095A publication Critical patent/NZ215095A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12Polymers provided for in subclasses C08C or C08F
    • C08F290/126Polymers of unsaturated carboxylic acids or derivatives thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • AHUMAN NECESSITIES
    • A63SPORTS; GAMES; AMUSEMENTS
    • A63FCARD, BOARD, OR ROULETTE GAMES; INDOOR GAMES USING SMALL MOVING PLAYING BODIES; VIDEO GAMES; GAMES NOT OTHERWISE PROVIDED FOR
    • A63F9/00Games not otherwise provided for
    • A63F9/24Electric games; Games using electronic circuits not otherwise provided for
    • A63F2009/2448Output devices
    • A63F2009/247Output devices audible, e.g. using a loudspeaker
    • A63F2009/2476Speech or voice synthesisers, e.g. using a speech chip

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
NZ21509586A 1985-02-12 1986-02-11 Photosensitive resin compositions NZ215095A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US70064985A 1985-02-12 1985-02-12

Publications (1)

Publication Number Publication Date
NZ215095A true NZ215095A (en) 1989-04-26

Family

ID=24814355

Family Applications (1)

Application Number Title Priority Date Filing Date
NZ21509586A NZ215095A (en) 1985-02-12 1986-02-11 Photosensitive resin compositions

Country Status (6)

Country Link
JP (1) JPH06100828B2 (en)
AU (1) AU582628B2 (en)
CA (1) CA1271870A (en)
DE (1) DE3604402C2 (en)
GB (1) GB2171107B (en)
NZ (1) NZ215095A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5344747A (en) * 1988-04-15 1994-09-06 Tokyo Ohka Kogyo Co., Ltd. Photopolymerizable compositions
JPH01263645A (en) * 1988-04-15 1989-10-20 Tokyo Ohka Kogyo Co Ltd Photopolymerizing composition
DE3837324A1 (en) * 1988-11-03 1990-05-10 Basf Ag LIGHT-SENSITIVE RECORDING MATERIAL
AU634214B2 (en) * 1989-03-14 1993-02-18 Robert Koch Procaine double salt complexes
JP2639728B2 (en) * 1989-04-27 1997-08-13 富士写真フイルム株式会社 Photosensitive lithographic printing plate
US5143819A (en) * 1991-01-25 1992-09-01 W. R. Grace & Co.-Conn. Aqueous developing, photocurable composition, photosensitive articles having layers made therefrom and method of improving those articles
DE4211390A1 (en) * 1992-04-04 1993-10-07 Hoechst Ag Light-curable elastomeric mixture and recording material obtained therefrom for the production of relief printing plates
US5736298A (en) * 1992-10-02 1998-04-07 Japan Synthetic Rubber Co., Ltd. Water developable photosensitive resin composition
WO1994023341A1 (en) * 1993-03-31 1994-10-13 Toyo Ink Manufacturing Co., Ltd. Reactive microgel, photosensitive resin composition containing the same, and flexographic plate material
JP3415260B2 (en) * 1993-05-12 2003-06-09 セイコーエプソン株式会社 Ink jet recording head and method of manufacturing the same
JP3011864B2 (en) * 1994-12-09 2000-02-21 日本ペイント株式会社 Water developable photosensitive resin composition
JP2000305267A (en) 1999-04-22 2000-11-02 Jsr Corp Photosensitive resin composition
EP1788434B2 (en) 2005-11-18 2019-01-02 Agfa Nv Method of making a lithographic printing plate
JP5206434B2 (en) * 2009-01-14 2013-06-12 星光Pmc株式会社 Photosensitive resin composition for letterpress production
CN116199822B (en) * 2023-04-24 2023-08-15 有研工程技术研究院有限公司 Carboxyl-containing gold resinate and negative-tone photo-etching organic gold slurry and preparation method thereof

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5190603A (en) 1975-01-31 1976-08-09 HIKARIKAYOGATAKANKOSEIJUSHISOSEIBUTSU
JPS5310648A (en) * 1976-07-19 1978-01-31 Japan Synthetic Rubber Co Ltd Photosensitive resin compositions
GB1599281A (en) * 1977-01-10 1981-09-30 Ici Ltd Photopolymerisable composition
DE3215513C3 (en) * 1981-04-27 1994-07-14 Hitachi Chemical Co Ltd Photosensitive resin composition
JPS57190045A (en) * 1981-05-19 1982-11-22 Toyobo Co Ltd Photosensitive resin composition
JPS57192461A (en) * 1981-05-22 1982-11-26 Toyobo Co Ltd Photosensitive resin composition
US4440850A (en) * 1981-07-23 1984-04-03 Ciba-Geigy Corporation Photopolymerisation process with two exposures of a single layer
JPS5868740A (en) * 1981-10-21 1983-04-23 Japan Synthetic Rubber Co Ltd Photoresist laminate of heat resistant film
JPS58102230A (en) 1981-12-15 1983-06-17 Hitachi Chem Co Ltd Photosensitive resin compositon
CA1203107A (en) * 1982-08-31 1986-04-15 Uniroyal, Inc. Photosensitive elastomeric polymer composition for flexographic printing plates, processable in semi- aqueous basic solution or solvent
JPS6051833A (en) * 1983-07-01 1985-03-23 Toray Ind Inc Photosensitive resin composition
JPS61128243A (en) * 1984-11-28 1986-06-16 Asahi Chem Ind Co Ltd Photosensitive resin composition

Also Published As

Publication number Publication date
JPH06100828B2 (en) 1994-12-12
GB2171107B (en) 1989-08-02
DE3604402C2 (en) 1994-12-01
AU582628B2 (en) 1989-04-06
DE3604402A1 (en) 1986-08-28
CA1271870A (en) 1990-07-17
JPS61246742A (en) 1986-11-04
AU5337786A (en) 1986-08-21
GB8603366D0 (en) 1986-03-19
GB2171107A (en) 1986-08-20

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