NO942489D0 - Plasma reactor for a deposition or etching process - Google Patents

Plasma reactor for a deposition or etching process

Info

Publication number: NO942489D0
Authority: NO; Norway
Prior art keywords: deposition; etching process; plasma reactor; reactor; plasma
Prior art date: 1993-07-05

Application number

NO942489A

Other languages

Norwegian (no)

Other versions

NO942489L (en

Inventor

David Pearson

Original Assignee

Cit Alcatel

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1993-07-05

Filing date

1994-07-01

Publication date

1994-07-01

1994-07-01 Application filed by Cit Alcatel filed Critical Cit Alcatel

1994-07-01 Publication of NO942489D0 publication Critical patent/NO942489D0/en

1995-01-06 Publication of NO942489L publication Critical patent/NO942489L/en

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H01J37/3211—Antennas, e.g. particular shapes of coils
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Electromagnetism (AREA)
Spectroscopy & Molecular Physics (AREA)
Chemical Vapour Deposition (AREA)
Drying Of Semiconductors (AREA)
Plasma Technology (AREA)
ing And Chemical Polishing (AREA)

NO942489A 1993-07-05 1994-07-01 Plasma reactor for a deposition or etching process NO942489L (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
FR9308204A FR2707449B1 (en)	1993-07-05	1993-07-05	Plasma reactor for a deposition or etching process.

Publications (2)

Publication Number	Publication Date
NO942489D0 true NO942489D0 (en)	1994-07-01
NO942489L NO942489L (en)	1995-01-06

Family

ID=9448909

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NO942489A NO942489L (en)	1993-07-05	1994-07-01	Plasma reactor for a deposition or etching process

Country Status (5)

Country	Link
EP (1)	EP0633713A1 (en)
JP (1)	JPH0773996A (en)
FI (1)	FI943184A (en)
FR (1)	FR2707449B1 (en)
NO (1)	NO942489L (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
AU6405496A (en) *	1995-06-29	1997-01-30	Lam Research Corporation	A scalable helicon wave plasma processing device with a non-cylindrical source chamber
DE19606375A1 (en) *	1996-02-21	1997-08-28	Balzers Prozes Systeme Gmbh	Microwave plasma source with Whistler or Helicon waves
US5868897A (en) *	1996-07-31	1999-02-09	Toyo Technologies, Inc.	Device and method for processing a plasma to alter the surface of a substrate using neutrals
US6085688A (en) *	1998-03-27	2000-07-11	Applied Materials, Inc.	Method and apparatus for improving processing and reducing charge damage in an inductively coupled plasma reactor
RU2196395C1 (en) *	2001-05-30	2003-01-10	Александров Андрей Федорович	Plasma reactor and plasma generating device (alternatives)
JP4741845B2 (en) *	2004-01-13	2011-08-10	株式会社セルバック	Inductively coupled plasma processing equipment
WO2024070562A1 (en) *	2022-09-30	2024-04-04	東京エレクトロン株式会社	Plasma processing device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3958883A (en) *	1974-07-10	1976-05-25	Baird-Atomic, Inc.	Radio frequency induced plasma excitation of optical emission spectroscopic samples
US4658153A (en) *	1984-06-18	1987-04-14	Amnon Brosh	Planar coil apparatus for providing a frequency output vs. position
DE68924413T2 (en) *	1989-01-25	1996-05-02	Ibm	Radio frequency induction / multipole plasma processing device.
GB8905075D0 (en) *	1989-03-06	1989-04-19	Nordiko Ltd	Electrode assembly and apparatus
US4990229A (en) *	1989-06-13	1991-02-05	Plasma & Materials Technologies, Inc.	High density plasma deposition and etching apparatus
US4948458A (en) *	1989-08-14	1990-08-14	Lam Research Corporation	Method and apparatus for producing magnetically-coupled planar plasma
JPH0775226B2 (en) *	1990-04-10	1995-08-09	インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン	Plasma processing method and apparatus

1993
- 1993-07-05 FR FR9308204A patent/FR2707449B1/en not_active Expired - Fee Related
1994
- 1994-06-30 EP EP94401485A patent/EP0633713A1/en not_active Ceased
- 1994-07-01 NO NO942489A patent/NO942489L/en unknown
- 1994-07-01 FI FI943184A patent/FI943184A/en not_active Application Discontinuation
- 1994-07-05 JP JP6153817A patent/JPH0773996A/en active Pending

Also Published As

Publication number	Publication date
EP0633713A1 (en)	1995-01-11
JPH0773996A (en)	1995-03-17
FR2707449B1 (en)	1995-08-11
NO942489L (en)	1995-01-06
FI943184A0 (en)	1994-07-01
FI943184A (en)	1995-01-06
FR2707449A1 (en)	1995-01-13

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