NO20035380D0 - Fremgangsmåte for dannelse av m degree nster - Google Patents

Fremgangsmåte for dannelse av m degree nster

Info

Publication number
NO20035380D0
NO20035380D0 NO20035380A NO20035380A NO20035380D0 NO 20035380 D0 NO20035380 D0 NO 20035380D0 NO 20035380 A NO20035380 A NO 20035380A NO 20035380 A NO20035380 A NO 20035380A NO 20035380 D0 NO20035380 D0 NO 20035380D0
Authority
NO
Norway
Prior art keywords
patterns
procedure
formation
Prior art date
Application number
NO20035380A
Other languages
English (en)
Inventor
Gregory Peter Wade Fixter
Daniel Robert Johnson
William Norman Damerell
Stephen George Appleton
Original Assignee
Qinetiq Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0113408A external-priority patent/GB0113408D0/en
Priority claimed from GB0128571A external-priority patent/GB0128571D0/en
Application filed by Qinetiq Ltd filed Critical Qinetiq Ltd
Publication of NO20035380D0 publication Critical patent/NO20035380D0/no

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1651Two or more layers only obtained by electroless plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/285Sensitising or activating with tin based compound or composition

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Catalysts (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Printing Methods (AREA)
NO20035380A 2001-06-04 2003-12-03 Fremgangsmåte for dannelse av m degree nster NO20035380D0 (no)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0113408A GB0113408D0 (en) 2001-06-04 2001-06-04 Autocatalytic coating method
GB0128571A GB0128571D0 (en) 2001-11-29 2001-11-29 Patterning method
PCT/GB2002/002412 WO2002099162A2 (en) 2001-06-04 2002-05-23 Patterning method

Publications (1)

Publication Number Publication Date
NO20035380D0 true NO20035380D0 (no) 2003-12-03

Family

ID=26246144

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20035380A NO20035380D0 (no) 2001-06-04 2003-12-03 Fremgangsmåte for dannelse av m degree nster

Country Status (13)

Country Link
US (1) US20040146647A1 (no)
EP (1) EP1392886A2 (no)
JP (1) JP2004527663A (no)
KR (1) KR20040007643A (no)
CN (1) CN1539028A (no)
BR (1) BR0210147A (no)
CA (1) CA2449358A1 (no)
IL (1) IL159175A0 (no)
NO (1) NO20035380D0 (no)
PL (1) PL365417A1 (no)
RU (1) RU2003135208A (no)
TW (1) TWI226384B (no)
WO (1) WO2002099162A2 (no)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5968547A (en) 1997-02-24 1999-10-19 Euro-Celtique, S.A. Method of providing sustained analgesia with buprenorphine
GB2393736A (en) * 2002-10-01 2004-04-07 Qinetiq Ltd A Cathode for use in an Electroplating Cell
US20050006339A1 (en) 2003-07-11 2005-01-13 Peter Mardilovich Electroless deposition methods and systems
US7794629B2 (en) 2003-11-25 2010-09-14 Qinetiq Limited Composite materials
EP1760171B1 (en) 2004-01-29 2011-04-27 Nippon Mining & Metals Co., Ltd. Pretreating agent for electroless plating and method of electroless plating using the same
US20050241951A1 (en) * 2004-04-30 2005-11-03 Kenneth Crouse Selective catalytic activation of non-conductive substrates
US7732330B2 (en) * 2005-06-30 2010-06-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method using an ink-jet method of the same
DE102006030822A1 (de) * 2006-06-30 2008-01-03 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Herstellen einer metallischen Kontaktstruktur einer Solarzelle
TWI361208B (en) * 2007-08-07 2012-04-01 Univ Nat Defense Process for forming a metal pattern on a substrate
JP4507126B2 (ja) * 2007-10-29 2010-07-21 ソニー株式会社 偏光板の製造方法
JP5227570B2 (ja) * 2007-11-13 2013-07-03 セーレン株式会社 透明導電性部材の製造方法
KR100857615B1 (ko) * 2008-01-22 2008-09-09 (주)휴먼테크 Rfid안테나 제조방법
TWI403239B (zh) * 2008-05-23 2013-07-21 Zhen Ding Technology Co Ltd 油墨及利用該油墨製作導電線路之方法
JP2010053435A (ja) * 2008-08-29 2010-03-11 Showa Denko Kk 無電解めっき用センシタイジング液および無電解めっき方法
TWI433957B (zh) * 2008-09-23 2014-04-11 Univ Nat Defense 基材表面及通孔的金屬化方法及其所使用的觸媒
CN103773143B (zh) 2012-10-26 2017-02-22 比亚迪股份有限公司 白色涂料组合物、绝缘基材表面选择性金属化的方法及复合制品
TWI507672B (zh) * 2013-05-29 2015-11-11 Univ Nat Yang Ming 檢測試紙的製造方法、使用方法以及用於該製造方法之藥物組合
TW201643277A (zh) * 2015-06-03 2016-12-16 Hoey Co Ltd 印刷層之電鍍方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3226256A (en) * 1963-01-02 1965-12-28 Jr Frederick W Schneble Method of making printed circuits
US3745045A (en) * 1971-01-06 1973-07-10 R Brenneman Electrical contact surface using an ink containing a plating catalyst
DK153337C (da) * 1979-04-11 1988-11-14 Platonec Aps Fremgangsmaade til toer sensibilisering af en isolerende overflade
DE3006117C2 (de) * 1980-02-19 1981-11-26 Ruwel-Werke Spezialfabrik für Leiterplatten GmbH, 4170 Geldern Verfahren zum Herstellen von Leiterplatten mit mindestens zwei Leiterzugebenen
US4425378A (en) * 1981-07-06 1984-01-10 Sprague Electric Company Electroless nickel plating activator composition a method for using and a ceramic capacitor made therewith
US4461785A (en) * 1982-11-19 1984-07-24 E. I. Du Pont De Nemours And Company Process for electrical terminal contact metallization
DE3326508A1 (de) * 1983-07-22 1985-02-07 Bayer Ag, 5090 Leverkusen Verfahren zum aktivieren von substratoberflaechen fuer die direkte partielle metallisierung von traegermaterialien
US4668533A (en) * 1985-05-10 1987-05-26 E. I. Du Pont De Nemours And Company Ink jet printing of printed circuit boards
DE3537161C2 (de) * 1985-10-18 1995-08-03 Bosch Gmbh Robert Verfahren zur Herstellung festhaftender, lötfähiger und strukturierbarer Metallschichten auf Aluminiumoxid-haltiger Keramik
US5318803A (en) * 1990-11-13 1994-06-07 International Business Machines Corporation Conditioning of a substrate for electroless plating thereon
DE4036592A1 (de) * 1990-11-16 1992-05-21 Bayer Ag Spritzgegossene leiterplatten durch hinterspritzen von flexiblen schaltungen mit thermoplastischen materialien
US5462897A (en) * 1993-02-01 1995-10-31 International Business Machines Corporation Method for forming a thin film layer
JP3819421B2 (ja) * 1993-07-01 2006-09-06 トーンジェット リミテッド 液体インクジェットインク
WO1999018255A1 (en) * 1997-10-03 1999-04-15 Massachusetts Institute Of Technology Selective substrate metallization
DE19823112A1 (de) * 1998-05-22 1999-11-25 Htw Dresden Verfahren zur Sensibilisierung von dielektrischen Oberflächen zur stromlosen Abscheidung haftfester Metallschichten

Also Published As

Publication number Publication date
PL365417A1 (en) 2005-01-10
KR20040007643A (ko) 2004-01-24
WO2002099162A2 (en) 2002-12-12
EP1392886A2 (en) 2004-03-03
WO2002099162A3 (en) 2003-07-31
CN1539028A (zh) 2004-10-20
JP2004527663A (ja) 2004-09-09
IL159175A0 (en) 2004-06-01
TWI226384B (en) 2005-01-11
US20040146647A1 (en) 2004-07-29
RU2003135208A (ru) 2005-05-10
BR0210147A (pt) 2004-06-08
CA2449358A1 (en) 2002-12-12

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Legal Events

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FC2A Withdrawal, rejection or dismissal of laid open patent application