NL8601278A - Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. - Google Patents

Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. Download PDF

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Publication number
NL8601278A
NL8601278A NL8601278A NL8601278A NL8601278A NL 8601278 A NL8601278 A NL 8601278A NL 8601278 A NL8601278 A NL 8601278A NL 8601278 A NL8601278 A NL 8601278A NL 8601278 A NL8601278 A NL 8601278A
Authority
NL
Netherlands
Prior art keywords
grating
grids
radiation
detectors
beams
Prior art date
Application number
NL8601278A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8601278A priority Critical patent/NL8601278A/nl
Priority to US06/918,758 priority patent/US4772119A/en
Priority to DE3788158T priority patent/DE3788158T2/de
Priority to EP87200873A priority patent/EP0247665B1/de
Priority to JP62122672A priority patent/JPS631031A/ja
Publication of NL8601278A publication Critical patent/NL8601278A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
    • G03F9/7026—Focusing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Projection-Type Copiers In General (AREA)
  • Variable Magnification In Projection-Type Copying Machines (AREA)
NL8601278A 1986-05-21 1986-05-21 Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. NL8601278A (nl)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL8601278A NL8601278A (nl) 1986-05-21 1986-05-21 Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem.
US06/918,758 US4772119A (en) 1986-05-21 1986-10-14 Device for detecting a magnification error in an optical imaging system
DE3788158T DE3788158T2 (de) 1986-05-21 1987-05-12 Vorrichtung für die Erkennung von Vergrösserungsfehlern in einem optischen Abbildungssystem.
EP87200873A EP0247665B1 (de) 1986-05-21 1987-05-12 Vorrichtung für die Erkennung von Vergrösserungsfehlern in einem optischen Abbildungssystem
JP62122672A JPS631031A (ja) 1986-05-21 1987-05-21 倍率誤差検出装置及びこの倍率誤差検出装置を用いる結像装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8601278A NL8601278A (nl) 1986-05-21 1986-05-21 Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem.
NL8601278 1986-05-21

Publications (1)

Publication Number Publication Date
NL8601278A true NL8601278A (nl) 1987-12-16

Family

ID=19848039

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8601278A NL8601278A (nl) 1986-05-21 1986-05-21 Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem.

Country Status (5)

Country Link
US (1) US4772119A (de)
EP (1) EP0247665B1 (de)
JP (1) JPS631031A (de)
DE (1) DE3788158T2 (de)
NL (1) NL8601278A (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4893195A (en) * 1987-08-27 1990-01-09 Minolta Camera Kabushiki Kaisha Image processing apparatus capable of eliminating moire pattern
US4908656A (en) * 1988-01-21 1990-03-13 Nikon Corporation Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision
US5062705A (en) * 1989-09-13 1991-11-05 Matsushita Electric Industrial Co., Ltd. Apparatus for evaluating a lens
JP3218657B2 (ja) * 1991-12-04 2001-10-15 キヤノン株式会社 ロータリーエンコーダ
US5300786A (en) * 1992-10-28 1994-04-05 International Business Machines Corporation Optical focus phase shift test pattern, monitoring system and process
US6160628A (en) * 1999-06-29 2000-12-12 Nikon Corporation Interferometer system and method for lens column alignment
US6956659B2 (en) * 2001-05-22 2005-10-18 Nikon Precision Inc. Measurement of critical dimensions of etched features
US6717676B2 (en) * 2002-03-12 2004-04-06 Eastman Kodak Company Method for measuring magnification of an afocal optical system
US6974653B2 (en) * 2002-04-19 2005-12-13 Nikon Precision Inc. Methods for critical dimension and focus mapping using critical dimension test marks
US7268891B2 (en) 2003-01-15 2007-09-11 Asml Holding N.V. Transmission shear grating in checkerboard configuration for EUV wavefront sensor
US6867846B2 (en) 2003-01-15 2005-03-15 Asml Holding Nv Tailored reflecting diffractor for EUV lithographic system aberration measurement
US7113255B2 (en) 2003-12-19 2006-09-26 Asml Holding N.V. Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby
WO2005069079A1 (de) * 2004-01-16 2005-07-28 Carl Zeiss Smt Ag Vorrichtung und verfahren zur wellenfrontvermessung eines optischen abbildungssystems und mikrolithographie-projektionsbelichtungsanlage
US7561280B2 (en) * 2007-03-15 2009-07-14 Agilent Technologies, Inc. Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components
US7545507B2 (en) * 2007-03-15 2009-06-09 Agilent Technologies, Inc. Displacement measurement system
DE102008029970A1 (de) * 2008-06-26 2009-12-31 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zum Überwachen einer lateralen Abbildungsstabilität
US7924433B2 (en) * 2008-09-08 2011-04-12 Agilent Technologies, Inc. Displacement measurement system and method of use
US20100302523A1 (en) * 2009-05-18 2010-12-02 Nikon Corporation Method and apparatus for measuring wavefront, and exposure method and apparatus
US8492703B2 (en) * 2009-08-04 2013-07-23 Mitutoyo Corporation Lens aberration correction in a doubly telecentric displacement sensor
NL2005414A (en) * 2009-10-28 2011-05-02 Asml Netherlands Bv Lithographic apparatus and patterning device.
JP5598033B2 (ja) * 2010-03-15 2014-10-01 ソニー株式会社 情報処理装置、情報処理方法、およびプログラム
DE102012212662A1 (de) * 2012-07-19 2013-08-22 Carl Zeiss Smt Gmbh Vorrichtung zur Vermessung eines abbildenden optischen Systems
JP6462883B2 (ja) * 2014-12-22 2019-01-30 エーエスエムエル ネザーランズ ビー．ブイ． レベルセンサ、リソグラフィ装置、及びデバイス製造方法
CN108489930A (zh) * 2018-01-30 2018-09-04 中国科学院上海技术物理研究所 基于单元胞立体相位光栅的被动式THz光谱仪

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
DE3071858D1 (en) * 1980-07-31 1987-01-22 Ibm Method and device for optical distance measurement
US4629313A (en) * 1982-10-22 1986-12-16 Nippon Kogaku K.K. Exposure apparatus
US4631416A (en) * 1983-12-19 1986-12-23 Hewlett-Packard Company Wafer/mask alignment system using diffraction gratings

Also Published As

Publication number Publication date
JPS631031A (ja) 1988-01-06
EP0247665B1 (de) 1993-11-18
EP0247665A1 (de) 1987-12-02
DE3788158D1 (de) 1993-12-23
JPH0482175B2 (de) 1992-12-25
DE3788158T2 (de) 1994-05-19
US4772119A (en) 1988-09-20

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