NL8601278A - Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. - Google Patents
Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. Download PDFInfo
- Publication number
- NL8601278A NL8601278A NL8601278A NL8601278A NL8601278A NL 8601278 A NL8601278 A NL 8601278A NL 8601278 A NL8601278 A NL 8601278A NL 8601278 A NL8601278 A NL 8601278A NL 8601278 A NL8601278 A NL 8601278A
- Authority
- NL
- Netherlands
- Prior art keywords
- grating
- grids
- radiation
- detectors
- beams
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
- G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface
- G03F9/7026—Focusing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Projection-Type Copiers In General (AREA)
- Variable Magnification In Projection-Type Copying Machines (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8601278A NL8601278A (nl) | 1986-05-21 | 1986-05-21 | Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. |
US06/918,758 US4772119A (en) | 1986-05-21 | 1986-10-14 | Device for detecting a magnification error in an optical imaging system |
DE3788158T DE3788158T2 (de) | 1986-05-21 | 1987-05-12 | Vorrichtung für die Erkennung von Vergrösserungsfehlern in einem optischen Abbildungssystem. |
EP87200873A EP0247665B1 (de) | 1986-05-21 | 1987-05-12 | Vorrichtung für die Erkennung von Vergrösserungsfehlern in einem optischen Abbildungssystem |
JP62122672A JPS631031A (ja) | 1986-05-21 | 1987-05-21 | 倍率誤差検出装置及びこの倍率誤差検出装置を用いる結像装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL8601278A NL8601278A (nl) | 1986-05-21 | 1986-05-21 | Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. |
NL8601278 | 1986-05-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL8601278A true NL8601278A (nl) | 1987-12-16 |
Family
ID=19848039
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL8601278A NL8601278A (nl) | 1986-05-21 | 1986-05-21 | Inrichting voor het detekteren van een vergrotingsfout in een optisch afbeeldingssysteem. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4772119A (de) |
EP (1) | EP0247665B1 (de) |
JP (1) | JPS631031A (de) |
DE (1) | DE3788158T2 (de) |
NL (1) | NL8601278A (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4893195A (en) * | 1987-08-27 | 1990-01-09 | Minolta Camera Kabushiki Kaisha | Image processing apparatus capable of eliminating moire pattern |
US4908656A (en) * | 1988-01-21 | 1990-03-13 | Nikon Corporation | Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision |
US5062705A (en) * | 1989-09-13 | 1991-11-05 | Matsushita Electric Industrial Co., Ltd. | Apparatus for evaluating a lens |
JP3218657B2 (ja) * | 1991-12-04 | 2001-10-15 | キヤノン株式会社 | ロータリーエンコーダ |
US5300786A (en) * | 1992-10-28 | 1994-04-05 | International Business Machines Corporation | Optical focus phase shift test pattern, monitoring system and process |
US6160628A (en) * | 1999-06-29 | 2000-12-12 | Nikon Corporation | Interferometer system and method for lens column alignment |
US6956659B2 (en) * | 2001-05-22 | 2005-10-18 | Nikon Precision Inc. | Measurement of critical dimensions of etched features |
US6717676B2 (en) * | 2002-03-12 | 2004-04-06 | Eastman Kodak Company | Method for measuring magnification of an afocal optical system |
US6974653B2 (en) * | 2002-04-19 | 2005-12-13 | Nikon Precision Inc. | Methods for critical dimension and focus mapping using critical dimension test marks |
US7268891B2 (en) | 2003-01-15 | 2007-09-11 | Asml Holding N.V. | Transmission shear grating in checkerboard configuration for EUV wavefront sensor |
US6867846B2 (en) | 2003-01-15 | 2005-03-15 | Asml Holding Nv | Tailored reflecting diffractor for EUV lithographic system aberration measurement |
US7113255B2 (en) | 2003-12-19 | 2006-09-26 | Asml Holding N.V. | Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby |
WO2005069079A1 (de) * | 2004-01-16 | 2005-07-28 | Carl Zeiss Smt Ag | Vorrichtung und verfahren zur wellenfrontvermessung eines optischen abbildungssystems und mikrolithographie-projektionsbelichtungsanlage |
US7561280B2 (en) * | 2007-03-15 | 2009-07-14 | Agilent Technologies, Inc. | Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components |
US7545507B2 (en) * | 2007-03-15 | 2009-06-09 | Agilent Technologies, Inc. | Displacement measurement system |
DE102008029970A1 (de) * | 2008-06-26 | 2009-12-31 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zum Überwachen einer lateralen Abbildungsstabilität |
US7924433B2 (en) * | 2008-09-08 | 2011-04-12 | Agilent Technologies, Inc. | Displacement measurement system and method of use |
US20100302523A1 (en) * | 2009-05-18 | 2010-12-02 | Nikon Corporation | Method and apparatus for measuring wavefront, and exposure method and apparatus |
US8492703B2 (en) * | 2009-08-04 | 2013-07-23 | Mitutoyo Corporation | Lens aberration correction in a doubly telecentric displacement sensor |
NL2005414A (en) * | 2009-10-28 | 2011-05-02 | Asml Netherlands Bv | Lithographic apparatus and patterning device. |
JP5598033B2 (ja) * | 2010-03-15 | 2014-10-01 | ソニー株式会社 | 情報処理装置、情報処理方法、およびプログラム |
DE102012212662A1 (de) * | 2012-07-19 | 2013-08-22 | Carl Zeiss Smt Gmbh | Vorrichtung zur Vermessung eines abbildenden optischen Systems |
JP6462883B2 (ja) * | 2014-12-22 | 2019-01-30 | エーエスエムエル ネザーランズ ビー.ブイ. | レベルセンサ、リソグラフィ装置、及びデバイス製造方法 |
CN108489930A (zh) * | 2018-01-30 | 2018-09-04 | 中国科学院上海技术物理研究所 | 基于单元胞立体相位光栅的被动式THz光谱仪 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7606548A (nl) * | 1976-06-17 | 1977-12-20 | Philips Nv | Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat. |
FR2450468A1 (fr) * | 1979-02-27 | 1980-09-26 | Thomson Csf | Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme |
DE3071858D1 (en) * | 1980-07-31 | 1987-01-22 | Ibm | Method and device for optical distance measurement |
US4629313A (en) * | 1982-10-22 | 1986-12-16 | Nippon Kogaku K.K. | Exposure apparatus |
US4631416A (en) * | 1983-12-19 | 1986-12-23 | Hewlett-Packard Company | Wafer/mask alignment system using diffraction gratings |
-
1986
- 1986-05-21 NL NL8601278A patent/NL8601278A/nl not_active Application Discontinuation
- 1986-10-14 US US06/918,758 patent/US4772119A/en not_active Expired - Lifetime
-
1987
- 1987-05-12 EP EP87200873A patent/EP0247665B1/de not_active Expired - Lifetime
- 1987-05-12 DE DE3788158T patent/DE3788158T2/de not_active Expired - Lifetime
- 1987-05-21 JP JP62122672A patent/JPS631031A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS631031A (ja) | 1988-01-06 |
EP0247665B1 (de) | 1993-11-18 |
EP0247665A1 (de) | 1987-12-02 |
DE3788158D1 (de) | 1993-12-23 |
JPH0482175B2 (de) | 1992-12-25 |
DE3788158T2 (de) | 1994-05-19 |
US4772119A (en) | 1988-09-20 |
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A1B | A search report has been drawn up | ||
BV | The patent application has lapsed |