NL7602708A - Positief werkende fotolak. - Google Patents
Positief werkende fotolak.Info
- Publication number
- NL7602708A NL7602708A NL7602708A NL7602708A NL7602708A NL 7602708 A NL7602708 A NL 7602708A NL 7602708 A NL7602708 A NL 7602708A NL 7602708 A NL7602708 A NL 7602708A NL 7602708 A NL7602708 A NL 7602708A
- Authority
- NL
- Netherlands
- Prior art keywords
- positively working
- working photo
- photo paint
- paint
- positively
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1166075A GB1500541A (en) | 1975-03-20 | 1975-03-20 | Method of producing positive-working electron resist coatings |
Publications (2)
Publication Number | Publication Date |
---|---|
NL7602708A true NL7602708A (nl) | 1976-09-22 |
NL175107C NL175107C (nl) | 1984-09-17 |
Family
ID=9990342
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7602708A NL175107C (nl) | 1975-03-20 | 1976-03-16 | Werkwijze voor het aanbrengen van een laag van een positief werkende elektronenresist en werkwijze ter vervaardiging van een resistpatroon. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4061832A (nl) |
JP (2) | JPS51117577A (nl) |
DE (1) | DE2610301C2 (nl) |
FR (1) | FR2304943A1 (nl) |
GB (1) | GB1500541A (nl) |
NL (1) | NL175107C (nl) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5466829A (en) * | 1977-11-07 | 1979-05-29 | Fujitsu Ltd | Pattern formation materil |
JPS5466122A (en) * | 1977-11-07 | 1979-05-28 | Fujitsu Ltd | Pattern formation material |
DE2757931A1 (de) * | 1977-12-24 | 1979-07-12 | Licentia Gmbh | Verfahren zum herstellen von positiven aetzresistenten masken |
DE2757932A1 (de) * | 1977-12-24 | 1979-07-05 | Licentia Gmbh | Strahlungsempfindliche positiv arbeitende materialien |
JPS54158173A (en) * | 1978-06-05 | 1979-12-13 | Fujitsu Ltd | Micropattern forming method |
DE2828128A1 (de) * | 1978-06-27 | 1980-01-10 | Licentia Gmbh | Strahlungsempfindliche positiv arbeitende materialien |
JPS5590942A (en) * | 1978-12-29 | 1980-07-10 | Fujitsu Ltd | Positive type resist material |
EP0016679B1 (fr) * | 1979-03-09 | 1982-06-09 | Thomson-Csf | Substances de photomasquage, leur procédé de préparation, et masque obtenu |
JPS55133042A (en) * | 1979-04-04 | 1980-10-16 | Fujitsu Ltd | Pattern forming method |
US4276365A (en) * | 1979-07-02 | 1981-06-30 | Fujitsu Limited | Positive resist terpolymer composition and method of forming resist pattern |
DE3246825A1 (de) * | 1982-02-24 | 1983-09-01 | Max Planck Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen | Positives resistmaterial |
US4448875A (en) * | 1983-03-31 | 1984-05-15 | Gaf Corporation | Electron beam sensitive mixture resist |
JP2707785B2 (ja) * | 1990-03-13 | 1998-02-04 | 富士通株式会社 | レジスト組成物およびパターン形成方法 |
US5789140A (en) * | 1996-04-25 | 1998-08-04 | Fujitsu Limited | Method of forming a pattern or via structure utilizing supplemental electron beam exposure and development to remove image residue |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3441545A (en) * | 1963-11-01 | 1969-04-29 | Du Pont | Modification of olefin-carboxylic acid halide copolymers |
US3647771A (en) * | 1964-01-30 | 1972-03-07 | Sumitomo Chemical Co | Alternating copolymers of alpha-olefins and vinyl compounds and a process for manufacturing the same |
GB1275632A (en) * | 1968-06-25 | 1972-05-24 | Hart Schaffner & Marx Inc | A method of making tailored garments |
US3631157A (en) * | 1970-02-09 | 1971-12-28 | Dow Chemical Co | Reactive mixed anhydride-containing polymers and a method for their preparation |
JPS5119047B2 (nl) * | 1972-04-14 | 1976-06-15 | ||
GB1445345A (en) * | 1972-12-21 | 1976-08-11 | Mullard Ltd | Positive-working electron resists |
JPS5639680B2 (nl) * | 1974-04-02 | 1981-09-14 |
-
1975
- 1975-03-20 GB GB1166075A patent/GB1500541A/en not_active Expired
-
1976
- 1976-03-12 DE DE2610301A patent/DE2610301C2/de not_active Expired
- 1976-03-16 NL NL7602708A patent/NL175107C/nl not_active IP Right Cessation
- 1976-03-17 JP JP2907876A patent/JPS51117577A/ja active Granted
- 1976-03-19 US US05/668,486 patent/US4061832A/en not_active Expired - Lifetime
- 1976-03-19 FR FR7608022A patent/FR2304943A1/fr active Granted
-
1981
- 1981-10-27 JP JP17085881A patent/JPS5798517A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2304943B1 (nl) | 1978-12-08 |
US4061832A (en) | 1977-12-06 |
DE2610301A1 (de) | 1976-09-30 |
FR2304943A1 (fr) | 1976-10-15 |
DE2610301C2 (de) | 1985-01-17 |
JPS6342770B2 (nl) | 1988-08-25 |
JPS51117577A (en) | 1976-10-15 |
JPS5719411B2 (nl) | 1982-04-22 |
GB1500541A (en) | 1978-02-08 |
NL175107C (nl) | 1984-09-17 |
JPS5798517A (en) | 1982-06-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NL7603050A (nl) | Reservoir. | |
NL7610294A (nl) | Kinderwagen. | |
NL7604789A (nl) | Combinatie-gereedschap. | |
NL178759C (nl) | Gereedschapswerktuig. | |
NL7611536A (nl) | Niet-ionogene polygehydroxyleerde verbindingen. | |
NL7613381A (nl) | Lakbindmiddelen. | |
NL7602708A (nl) | Positief werkende fotolak. | |
NL7607915A (nl) | Alkylthioureum-mijtdodende verbindingen. | |
NO140131C (no) | Skistav. | |
NL7611441A (nl) | Verfmiddel. | |
BE849303A (fr) | Tranducteur. | |
NL7604892A (nl) | Tuinstolp. | |
NL7610864A (nl) | Behangsel. | |
NL7612970A (nl) | Lakbindmiddel. | |
NL7603855A (nl) | Chinolizineverbindingen. | |
NL7611967A (nl) | Pyridylureumverbindingen. | |
NL7608705A (nl) | Telefilmcamera. | |
ES210804Y (es) | Andamio fijo. | |
NL7602946A (nl) | Kontinu werkende karnmachine. | |
NL162446C (nl) | Grondzuiger. | |
ES211713Y (es) | Nueva caja-envase. | |
ES209316Y (es) | Muneco mecanico. | |
ES212889Y (es) | Cohete-senal. | |
DK151559C (da) | Kartonaeske. | |
NO137912C (no) | Malerstillas. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
BC | A request for examination has been filed | ||
V1 | Lapsed because of non-payment of the annual fee |