NL7413844A - Lithografische kopieerfilm. - Google Patents

Lithografische kopieerfilm.

Info

Publication number
NL7413844A
NL7413844A NL7413844A NL7413844A NL7413844A NL 7413844 A NL7413844 A NL 7413844A NL 7413844 A NL7413844 A NL 7413844A NL 7413844 A NL7413844 A NL 7413844A NL 7413844 A NL7413844 A NL 7413844A
Authority
NL
Netherlands
Prior art keywords
lithographic
copy film
copy
film
lithographic copy
Prior art date
Application number
NL7413844A
Other languages
English (en)
Original Assignee
Oce Van Der Grinten Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oce Van Der Grinten Nv filed Critical Oce Van Der Grinten Nv
Priority to NL7413844A priority Critical patent/NL7413844A/nl
Priority to SE7511027A priority patent/SE7511027L/xx
Priority to JP50122394A priority patent/JPS5166002A/ja
Priority to FR7532134A priority patent/FR2288994A1/fr
Priority to GB43385/75A priority patent/GB1525757A/en
Priority to DE19752547335 priority patent/DE2547335A1/de
Publication of NL7413844A publication Critical patent/NL7413844A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795—Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
NL7413844A 1974-10-23 1974-10-23 Lithografische kopieerfilm. NL7413844A (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL7413844A NL7413844A (nl) 1974-10-23 1974-10-23 Lithografische kopieerfilm.
SE7511027A SE7511027L (sv) 1974-10-23 1975-10-01 Litografisk tryckfilm
JP50122394A JPS5166002A (nl) 1974-10-23 1975-10-09
FR7532134A FR2288994A1 (fr) 1974-10-23 1975-10-21 Film d'impression lithographique
GB43385/75A GB1525757A (en) 1974-10-23 1975-10-22 Light-sensitive printing material
DE19752547335 DE2547335A1 (de) 1974-10-23 1975-10-22 Lichtempfindliches vervielfaeltigungsmaterial

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7413844A NL7413844A (nl) 1974-10-23 1974-10-23 Lithografische kopieerfilm.

Publications (1)

Publication Number Publication Date
NL7413844A true NL7413844A (nl) 1976-04-27

Family

ID=19822318

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7413844A NL7413844A (nl) 1974-10-23 1974-10-23 Lithografische kopieerfilm.

Country Status (6)

Country Link
JP (1) JPS5166002A (nl)
DE (1) DE2547335A1 (nl)
FR (1) FR2288994A1 (nl)
GB (1) GB1525757A (nl)
NL (1) NL7413844A (nl)
SE (1) SE7511027L (nl)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
US4472494A (en) * 1980-09-15 1984-09-18 Napp Systems (Usa), Inc. Bilayer photosensitive imaging article
JPS5837639A (ja) * 1981-07-31 1983-03-04 Konishiroku Photo Ind Co Ltd 画像形成材料
US4729935A (en) * 1982-03-18 1988-03-08 Hoechst Celanese Corporation Process for the production of photographic images utilizing a negative working diazo contact film
US4511640A (en) * 1983-08-25 1985-04-16 American Hoechst Corporation Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
EP0151191A1 (de) * 1984-01-25 1985-08-14 American Hoechst Corporation Lichtempfindliches Material zur Herstellung von Kopiervorlagen
US4564589A (en) * 1984-02-06 1986-01-14 Advanced Imaging Systems Ltd. Image-forming composite with film
US4618562A (en) * 1984-12-27 1986-10-21 American Hoechst Corporation Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor

Also Published As

Publication number Publication date
JPS5166002A (nl) 1976-06-08
DE2547335A1 (de) 1976-04-29
FR2288994A1 (fr) 1976-05-21
SE7511027L (sv) 1976-04-26
GB1525757A (en) 1978-09-20

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Legal Events

Date Code Title Description
BV The patent application has lapsed