NL7406178A - - Google Patents
Info
- Publication number
- NL7406178A NL7406178A NL7406178A NL7406178A NL7406178A NL 7406178 A NL7406178 A NL 7406178A NL 7406178 A NL7406178 A NL 7406178A NL 7406178 A NL7406178 A NL 7406178A NL 7406178 A NL7406178 A NL 7406178A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
- G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Organic Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Laminated Bodies (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US00358729A US3833396A (en) | 1973-05-09 | 1973-05-09 | Pattern delineation method and product so produced |
US00358727A US3837855A (en) | 1973-05-09 | 1973-05-09 | Pattern delineation method and product so produced |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7406178A true NL7406178A (en) | 1974-11-12 |
Family
ID=27000166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7406178A NL7406178A (en) | 1973-05-09 | 1974-05-08 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5019427A (en) |
DE (1) | DE2421834B2 (en) |
FR (1) | FR2229142A1 (en) |
NL (1) | NL7406178A (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59146954A (en) * | 1982-12-28 | 1984-08-23 | Seiko Epson Corp | See-through mask |
JPS6068992A (en) * | 1983-09-27 | 1985-04-19 | Mitsui Toatsu Chem Inc | Image-forming system |
KR102352740B1 (en) * | 2015-04-30 | 2022-01-18 | 삼성디스플레이 주식회사 | Method of manufacturing mask and method of manufacturing display apparatus |
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1974
- 1974-05-06 DE DE19742421834 patent/DE2421834B2/en active Pending
- 1974-05-08 NL NL7406178A patent/NL7406178A/xx unknown
- 1974-05-08 FR FR7415905A patent/FR2229142A1/fr not_active Withdrawn
- 1974-05-09 JP JP5079374A patent/JPS5019427A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
DE2421834B2 (en) | 1976-01-22 |
JPS5019427A (en) | 1975-02-28 |
FR2229142A1 (en) | 1974-12-06 |
DE2421834A1 (en) | 1974-12-05 |