NL7401407A - PHOTOPOLYMER. - Google Patents
PHOTOPOLYMER.Info
- Publication number
- NL7401407A NL7401407A NL7401407A NL7401407A NL7401407A NL 7401407 A NL7401407 A NL 7401407A NL 7401407 A NL7401407 A NL 7401407A NL 7401407 A NL7401407 A NL 7401407A NL 7401407 A NL7401407 A NL 7401407A
- Authority
- NL
- Netherlands
- Prior art keywords
- photopolymer
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/48—Polymers modified by chemical after-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7401407A NL7401407A (en) | 1974-02-01 | 1974-02-01 | PHOTOPOLYMER. |
DE19752503526 DE2503526A1 (en) | 1974-02-01 | 1975-01-29 | PHOTOPOLYMERS |
FR7502907A FR2259863A1 (en) | 1974-02-01 | 1975-01-30 | Photo-sensitive polymers for lithographic plates, etc. - consisting of 3-(2-furyl) acrylic acid esters of phenoxy resins |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7401407A NL7401407A (en) | 1974-02-01 | 1974-02-01 | PHOTOPOLYMER. |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7401407A true NL7401407A (en) | 1975-08-05 |
Family
ID=19820669
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7401407A NL7401407A (en) | 1974-02-01 | 1974-02-01 | PHOTOPOLYMER. |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE2503526A1 (en) |
FR (1) | FR2259863A1 (en) |
NL (1) | NL7401407A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3679453D1 (en) * | 1985-06-05 | 1991-07-04 | Siemens Ag | METHOD FOR PRODUCING PRINTED CIRCUITS USING A RADIATION NETWORKING PHOTOPOLYMER SYSTEM. |
DE3850689D1 (en) * | 1987-03-12 | 1994-08-25 | Siemens Ag | Radiation-crosslinkable polymer system for use as a photoresist and dielectric for microwiring. |
-
1974
- 1974-02-01 NL NL7401407A patent/NL7401407A/en unknown
-
1975
- 1975-01-29 DE DE19752503526 patent/DE2503526A1/en active Pending
- 1975-01-30 FR FR7502907A patent/FR2259863A1/en active Granted
Also Published As
Publication number | Publication date |
---|---|
FR2259863B3 (en) | 1977-10-21 |
FR2259863A1 (en) | 1975-08-29 |
DE2503526A1 (en) | 1975-08-07 |
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