NL7209297A - - Google Patents
Info
- Publication number
- NL7209297A NL7209297A NL7209297A NL7209297A NL7209297A NL 7209297 A NL7209297 A NL 7209297A NL 7209297 A NL7209297 A NL 7209297A NL 7209297 A NL7209297 A NL 7209297A NL 7209297 A NL7209297 A NL 7209297A
- Authority
- NL
- Netherlands
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/12—Substrate holders or susceptors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7209297A NL7209297A (ja) | 1972-07-01 | 1972-07-01 | |
DE2331664A DE2331664C3 (de) | 1972-07-01 | 1973-06-22 | Vorrichtung zur Beschichtung einkristalliner Scheiben |
CA175,379A CA995565A (en) | 1972-07-01 | 1973-06-26 | Method of treating monocrystalline wafers |
US373944A US3892940A (en) | 1972-07-01 | 1973-06-27 | Apparatus for uniformly heating monocrystalline wafers |
GB3081373A GB1425965A (en) | 1972-07-01 | 1973-06-28 | Method of treating monocrystalline wafers |
FR7323684A FR2190525B1 (ja) | 1972-07-01 | 1973-06-28 | |
IT26018/73A IT991007B (it) | 1972-07-01 | 1973-06-28 | Metodo di trattamento di lastrine monocristalline mediante riscalda mento su di un suscettore riscalda to per induzione ad alta frequenza dispositivo e suscettore per lo svolgimento di tale metodo e prodot ti ottenuti con l ausilio del metodo stesso |
JP7232873A JPS5320351B2 (ja) | 1972-07-01 | 1973-06-28 | |
BE132989A BE801749A (fr) | 1972-07-01 | 1973-06-29 | Procede de traitement de plaques monocristallines a l'aide d'un suscepteur chauffe par induction haute frequence dispositif et suscepteur de mise en oeuvre et produits obtenus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NL7209297A NL7209297A (ja) | 1972-07-01 | 1972-07-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7209297A true NL7209297A (ja) | 1974-01-03 |
Family
ID=19816454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7209297A NL7209297A (ja) | 1972-07-01 | 1972-07-01 |
Country Status (9)
Country | Link |
---|---|
US (1) | US3892940A (ja) |
JP (1) | JPS5320351B2 (ja) |
BE (1) | BE801749A (ja) |
CA (1) | CA995565A (ja) |
DE (1) | DE2331664C3 (ja) |
FR (1) | FR2190525B1 (ja) |
GB (1) | GB1425965A (ja) |
IT (1) | IT991007B (ja) |
NL (1) | NL7209297A (ja) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51135363A (en) * | 1975-05-19 | 1976-11-24 | Matsushita Electric Ind Co Ltd | Method of manufacturing semiconductors and its equipment |
JPS5271171A (en) * | 1975-12-10 | 1977-06-14 | Matsushita Electronics Corp | Production of epitaxial wafer |
JPS5277590A (en) * | 1975-12-24 | 1977-06-30 | Toshiba Corp | Semiconductor producing device |
SE7710800L (sv) * | 1976-10-05 | 1978-04-06 | Western Electric Co | Forfarande for astadkommande av ett epitaxiellt skikt pa ett substrat |
US4099041A (en) * | 1977-04-11 | 1978-07-04 | Rca Corporation | Susceptor for heating semiconductor substrates |
JPS585478Y2 (ja) * | 1978-03-24 | 1983-01-29 | 大日本樹脂株式会社 | 農業用地上保温材 |
JPS5529174U (ja) * | 1978-08-17 | 1980-02-25 | ||
JPS55110044U (ja) * | 1979-01-30 | 1980-08-01 | ||
JPS55143455U (ja) * | 1979-03-16 | 1980-10-14 | ||
JPS56954A (en) * | 1979-06-18 | 1981-01-08 | Sumitomo Chem Co Ltd | Heat-accumulating tube made of film |
US4386255A (en) * | 1979-12-17 | 1983-05-31 | Rca Corporation | Susceptor for rotary disc reactor |
JPS56131322A (en) * | 1980-03-17 | 1981-10-14 | Mitsubishi Monsanto Chem | Cultivation of useful plant |
JPS56131324A (en) * | 1980-03-17 | 1981-10-14 | Mitsubishi Monsanto Chem | Mulching cultivation |
JPS56157965U (ja) * | 1980-04-21 | 1981-11-25 | ||
US4322592A (en) * | 1980-08-22 | 1982-03-30 | Rca Corporation | Susceptor for heating semiconductor substrates |
JPS5820855U (ja) * | 1981-08-04 | 1983-02-08 | 前原 信良 | 太陽熱蓄熱及び放熱体 |
JPS58122951U (ja) * | 1982-02-17 | 1983-08-22 | 株式会社展建築設計事務所 | 農業用ビニ−ル・ハウス |
US5242501A (en) * | 1982-09-10 | 1993-09-07 | Lam Research Corporation | Susceptor in chemical vapor deposition reactors |
US4488507A (en) * | 1982-09-30 | 1984-12-18 | Jackson Jr David A | Susceptors for organometallic vapor-phase epitaxial (OMVPE) method |
JPS60116229U (ja) * | 1984-01-10 | 1985-08-06 | 日本電気株式会社 | 半導体ウエ−ハの発熱担体 |
JPS6169116A (ja) * | 1984-09-13 | 1986-04-09 | Toshiba Ceramics Co Ltd | シリコンウエハ−の連続cvdコ−テイング用サセプター |
US4794217A (en) * | 1985-04-01 | 1988-12-27 | Qing Hua University | Induction system for rapid heat treatment of semiconductor wafers |
US5119540A (en) * | 1990-07-24 | 1992-06-09 | Cree Research, Inc. | Apparatus for eliminating residual nitrogen contamination in epitaxial layers of silicon carbide and resulting product |
US6217662B1 (en) | 1997-03-24 | 2001-04-17 | Cree, Inc. | Susceptor designs for silicon carbide thin films |
US8603248B2 (en) * | 2006-02-10 | 2013-12-10 | Veeco Instruments Inc. | System and method for varying wafer surface temperature via wafer-carrier temperature offset |
US8164028B2 (en) * | 2008-01-18 | 2012-04-24 | Momentive Performance Materials Inc. | Resistance heater |
US8993939B2 (en) * | 2008-01-18 | 2015-03-31 | Momentive Performance Materials Inc. | Resistance heater |
CN105810630A (zh) * | 2008-08-29 | 2016-07-27 | 威科仪器有限公司 | 具有变化热阻的晶片载体 |
CN102828169A (zh) * | 2011-06-13 | 2012-12-19 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种载片托盘、托盘装置和结晶膜生长设备 |
DE102011055061A1 (de) * | 2011-11-04 | 2013-05-08 | Aixtron Se | CVD-Reaktor bzw. Substrathalter für einen CVD-Reaktor |
KR101928356B1 (ko) * | 2012-02-16 | 2018-12-12 | 엘지이노텍 주식회사 | 반도체 제조 장치 |
US10316412B2 (en) | 2012-04-18 | 2019-06-11 | Veeco Instruments Inc. | Wafter carrier for chemical vapor deposition systems |
US10167571B2 (en) | 2013-03-15 | 2019-01-01 | Veeco Instruments Inc. | Wafer carrier having provisions for improving heating uniformity in chemical vapor deposition systems |
JP2015067878A (ja) * | 2013-09-30 | 2015-04-13 | 東京エレクトロン株式会社 | 熱処理装置及び熱処理方法 |
WO2015112969A1 (en) | 2014-01-27 | 2015-07-30 | Veeco Instruments. Inc. | Wafer carrier having retention pockets with compound radii for chemical vapor deposition systems |
ITUB20154925A1 (it) * | 2015-11-03 | 2017-05-03 | L P E S P A | Suscettore con recessi asimmetrici, reattore per deposizione epitassiale e metodo di produzione |
JP7018744B2 (ja) * | 2017-11-24 | 2022-02-14 | 昭和電工株式会社 | SiCエピタキシャル成長装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1360497A (fr) * | 1963-06-12 | 1964-05-08 | Siemens Ag | Procédé pour réaliser des couches cristallines en des substances peu volatiles, notamment des substances semi-conductrices |
GB1121860A (en) * | 1964-11-21 | 1968-07-31 | Tokushu Denki Kabushiki Kaisha | A heating rotary drum apparatus |
DE1262244B (de) * | 1964-12-23 | 1968-03-07 | Siemens Ag | Verfahren zum epitaktischen Abscheiden einer kristallinen Schicht, insbesondere aus Halbleitermaterial |
US3539759A (en) * | 1968-11-08 | 1970-11-10 | Ibm | Susceptor structure in silicon epitaxy |
NL7103019A (ja) * | 1971-03-06 | 1972-09-08 |
-
1972
- 1972-07-01 NL NL7209297A patent/NL7209297A/xx unknown
-
1973
- 1973-06-22 DE DE2331664A patent/DE2331664C3/de not_active Expired
- 1973-06-26 CA CA175,379A patent/CA995565A/en not_active Expired
- 1973-06-27 US US373944A patent/US3892940A/en not_active Expired - Lifetime
- 1973-06-28 JP JP7232873A patent/JPS5320351B2/ja not_active Expired
- 1973-06-28 FR FR7323684A patent/FR2190525B1/fr not_active Expired
- 1973-06-28 GB GB3081373A patent/GB1425965A/en not_active Expired
- 1973-06-28 IT IT26018/73A patent/IT991007B/it active
- 1973-06-29 BE BE132989A patent/BE801749A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
JPS4945681A (ja) | 1974-05-01 |
GB1425965A (en) | 1976-02-25 |
BE801749A (fr) | 1974-01-02 |
DE2331664C3 (de) | 1979-06-07 |
US3892940A (en) | 1975-07-01 |
FR2190525A1 (ja) | 1974-02-01 |
DE2331664A1 (de) | 1974-03-14 |
JPS5320351B2 (ja) | 1978-06-26 |
DE2331664B2 (de) | 1978-10-19 |
CA995565A (en) | 1976-08-24 |
IT991007B (it) | 1975-07-30 |
FR2190525B1 (ja) | 1976-09-17 |