NL283850A - - Google Patents
Info
- Publication number
- NL283850A NL283850A NL283850DA NL283850A NL 283850 A NL283850 A NL 283850A NL 283850D A NL283850D A NL 283850DA NL 283850 A NL283850 A NL 283850A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/38—Phosphonic acids [RP(=O)(OH)2]; Thiophosphonic acids ; [RP(=X1)(X2H)2(X1, X2 are each independently O, S or Se)]
- C07F9/40—Esters thereof
- C07F9/4071—Esters thereof the ester moiety containing a substituent or a structure which is considered as characteristic
- C07F9/4075—Esters with hydroxyalkyl compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F30/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F30/02—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D143/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium, or a metal; Coating compositions based on derivatives of such polymers
- C09D143/02—Homopolymers or copolymers of monomers containing phosphorus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- General Health & Medical Sciences (AREA)
- Wood Science & Technology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Biochemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Plural Heterocyclic Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK0044931 | 1961-10-13 | ||
DEK46079A DE1237899B (de) | 1961-10-13 | 1962-03-03 | Verfahren zur Herstellung von vorsensibilisierten Flachdruckfolien |
Publications (1)
Publication Number | Publication Date |
---|---|
NL283850A true NL283850A (de) |
Family
ID=25983475
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL283850D NL283850A (de) | 1961-10-13 | ||
NL289167D NL289167A (de) | 1961-10-13 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL289167D NL289167A (de) | 1961-10-13 |
Country Status (6)
Country | Link |
---|---|
US (2) | US3197308A (de) |
BE (1) | BE629055A (de) |
CH (1) | CH416326A (de) |
DE (2) | DE1237899B (de) |
GB (2) | GB947471A (de) |
NL (2) | NL289167A (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE606888A (de) * | 1960-08-05 | 1900-01-01 | ||
DE1447956A1 (de) * | 1965-01-02 | 1968-11-21 | Kalle Ag | Verfahren zur Herstellung einer mit einem Diazoniumsalz vorsensibilisierten Druckform |
DE1447955C3 (de) * | 1965-01-02 | 1978-10-05 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung einer vorsensibilisierten Druckplatte |
US3958994A (en) * | 1974-08-26 | 1976-05-25 | American Hoechst Corporation | Photosensitive diazo steel lithoplate structure |
GB1569021A (en) | 1976-03-17 | 1980-06-11 | Kuraray Co | Adhesive cementing agents containing partial phosphonic orphosphonic acid esters |
US4299906A (en) * | 1979-06-01 | 1981-11-10 | American Hoechst Corporation | Light-sensitive color proofing film with surfactant in a light-sensitive coating |
US4446028A (en) * | 1982-12-20 | 1984-05-01 | Betz Laboratories, Inc. | Isopropenyl phosphonic acid copolymers used to inhibit scale formation |
US4446046A (en) * | 1981-06-17 | 1984-05-01 | Betz Laboratories, Inc. | Poly (alkenyl) phosphonic acid and methods of use thereof |
US4785062A (en) * | 1984-07-31 | 1988-11-15 | W. R. Grace & Co.-Conn. | Reaction product of O-epoxyalkylated tetrakis(hydroxyphenyl)ethane resin and phenol with product having no remaining epoxy groups |
US4942644A (en) * | 1985-03-18 | 1990-07-24 | Rowley William W | Strap hanger |
DE3615612A1 (de) * | 1986-05-09 | 1987-11-12 | Hoechst Ag | Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
DE3817424A1 (de) * | 1988-05-21 | 1989-11-23 | Hoechst Ag | Alkenylphosphon- und -phosphinsaeureester, verfahren zu ihrer herstellung und durch strahlung polymerisierbares gemisch, das diese verbindungen enthaelt |
JP2652804B2 (ja) * | 1989-04-27 | 1997-09-10 | 富士写真フイルム株式会社 | 感光性平版印刷版 |
DE3922330A1 (de) * | 1989-07-07 | 1991-01-17 | Hoechst Ag | Durch strahlung polymerisierbares gemisch und dieses enthaltendes aufzeichnungsmaterial |
US5736256A (en) * | 1995-05-31 | 1998-04-07 | Howard A. Fromson | Lithographic printing plate treated with organo-phosphonic acid chelating compounds and processes relating thereto |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2557805A (en) * | 1949-01-18 | 1951-06-19 | Du Pont | Dialkyl vinyl phosphates and polymers |
BE510563A (de) * | 1949-07-23 | |||
BE507657A (de) * | 1950-12-06 | |||
US2787546A (en) * | 1955-02-08 | 1957-04-02 | Eastman Kodak Co | Light-sensitive photographic elements for photomechanical processes |
US2784208A (en) * | 1955-02-17 | 1957-03-05 | Standard Oil Co | Monomethyl esters of aliphatic phosphonic acids |
BE565433A (de) * | 1956-12-28 |
-
0
- NL NL283850D patent/NL283850A/xx unknown
- DE DEK44931A patent/DE1302833B/de active Pending
- NL NL289167D patent/NL289167A/xx unknown
- BE BE629055D patent/BE629055A/xx unknown
-
1962
- 1962-03-03 DE DEK46079A patent/DE1237899B/de not_active Withdrawn
- 1962-10-05 GB GB37847/62A patent/GB947471A/en not_active Expired
- 1962-10-11 US US229965A patent/US3197308A/en not_active Expired - Lifetime
-
1963
- 1963-02-25 GB GB7520/63A patent/GB1019919A/en not_active Expired
- 1963-03-01 US US262188A patent/US3179518A/en not_active Expired - Lifetime
- 1963-03-01 CH CH261263A patent/CH416326A/de unknown
Also Published As
Publication number | Publication date |
---|---|
BE629055A (de) | |
DE1302833B (de) | |
US3197308A (en) | 1965-07-27 |
NL289167A (de) | |
GB1019919A (en) | 1966-02-09 |
US3179518A (en) | 1965-04-20 |
CH416326A (de) | 1966-06-30 |
DE1237899B (de) | 1967-03-30 |
GB947471A (en) | 1964-01-22 |