NL2023105B1 - Lithographic apparatus - Google Patents

Lithographic apparatus Download PDF

Info

Publication number
NL2023105B1
NL2023105B1 NL2023105A NL2023105A NL2023105B1 NL 2023105 B1 NL2023105 B1 NL 2023105B1 NL 2023105 A NL2023105 A NL 2023105A NL 2023105 A NL2023105 A NL 2023105A NL 2023105 B1 NL2023105 B1 NL 2023105B1
Authority
NL
Netherlands
Prior art keywords
fluid
region
substrate
outlets
radiation beam
Prior art date
Application number
NL2023105A
Other languages
English (en)
Dutch (nl)
Other versions
NL2023105A (en
Inventor
Adrianus Van De Kerkhof Marcus
Anton Gertruda Merkx Maarten
Van Zwol Pieter-Jan
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2023105A publication Critical patent/NL2023105A/en
Application granted granted Critical
Publication of NL2023105B1 publication Critical patent/NL2023105B1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
NL2023105A 2018-05-31 2019-05-10 Lithographic apparatus NL2023105B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP18175342 2018-05-31

Publications (2)

Publication Number Publication Date
NL2023105A NL2023105A (en) 2019-12-09
NL2023105B1 true NL2023105B1 (en) 2020-05-01

Family

ID=62495621

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2023105A NL2023105B1 (en) 2018-05-31 2019-05-10 Lithographic apparatus

Country Status (5)

Country Link
KR (1) KR20210016368A (ko)
CN (1) CN112166382A (ko)
NL (1) NL2023105B1 (ko)
TW (1) TW202004363A (ko)
WO (1) WO2019228784A1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3862813A1 (en) * 2020-02-07 2021-08-11 ASML Netherlands B.V. Methods and systems for maskless lithography

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004519868A (ja) * 2001-04-17 2004-07-02 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ Ｅｕｖに透明な境界構造
JPWO2003105203A1 (ja) * 2002-06-11 2005-10-13 株式会社ニコン 露光装置及び露光方法
KR20110055601A (ko) * 2008-08-06 2011-05-25 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치용 광학 요소, 이러한 광학 요소를 포함하는 리소그래피 장치 및 광학 요소 생성 방법
US8988652B2 (en) * 2012-10-18 2015-03-24 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for ultraviolet (UV) patterning with reduced outgassing
US10908496B2 (en) * 2016-04-25 2021-02-02 Asml Netherlands B.V. Membrane for EUV lithography

Also Published As

Publication number Publication date
NL2023105A (en) 2019-12-09
KR20210016368A (ko) 2021-02-15
WO2019228784A1 (en) 2019-12-05
CN112166382A (zh) 2021-01-01
TW202004363A (zh) 2020-01-16

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