NL2010502C2 - Fluid transfer system and substrate processing apparatus comprising the same. - Google Patents

Description

FLUID TRANSFER SYSTEM AND SUBSTRATE PROCESSING APPARATUS

COMPRISING THE SAME

-1- BACKGROUND OF THE INVENTION 5 1. Field of the Invention

[0001] The invention relates to a fluid transfer system for use in a substrate processing apparatus, such as a lithographic apparatus or an inspection apparatus. The invention further relates to a substrate processing apparatus comprising such fluid transfer system.

10 2. Description of the Related Art

[0002] In the semiconductor industry, an ever increasing desire exists to manufacture smaller structures with high accuracy and reliability. In lithography systems this desire results in extremely high demands with respect to positioning and orientation. External vibrations caused by other machines in a fab environment and/or electrical circuitry may have a negative 15 influence on the positioning accuracy within the lithographic apparatus. Similarly, vibrations within a lithographic apparatus, for example caused by stage movement, may have a negative influence on such accuracy.

[0003] Reduction of vibrations may be realized by isolating the source and the components used to manipulate the radiation, i.e. a radiation projection system or “column”, from the 20 environment. Similarly, the substrate to be processed, in combination with the support structure on which the substrate is placed, may be vibrationally decoupled from the stage. Vibration decoupling may be achieved using bearings, spring elements and/or other components. The precise selection and placement of such components depends on the design at hand.

25 [0004] The reduction of feature sizes in combination with the desire to maintain the present day throughput in semiconductor processing, often results in an increased heat load for both the substrate support structure and components within the radiation projection system of the semiconductor processing apparatus. In some cases, active cooling by means of a cooling fluid running through one or more conduits, is desirable to obtain sufficient cooling.

30 Unfortunately, the use of cooling conduits largely undoes the vibration decoupling of the element being cooled.

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BRIEF SUMMARY OF THE INVENTION

[0005] It is desirable to provide fluid, for example for active cooling, a body within a projection system within a substrate processing apparatus, such as a lithographic apparatus or 5 inspection apparatus, without jeopardizing the design of the apparatus with respect to vibrational decoupling from external vibrations. In particular, vibrations that are coupled in via a fluid transfer system for providing such fluid should be merely a fraction of the vibrations that are coupled into the body without the presence of such fluid transfer system.

[0006] For this purpose, an embodiment of the invention provides a fluid transfer system 10 for use in a substrate processing apparatus, the fluid transfer system comprising at least one tube to be fixed to a first body at a first anchor point, and to be fixed to a second body at a second anchor point, wherein the at least one tube comprises a flexible portion extending between the two anchor points in two dimensions over a single plane, the fluid transfer system being arranged for allowing movement between the first body and the second body.

15 The use of such fluid transfer system enables the maintaining of an effective decoupling of vibrations of the first body from the second body while allowing the supply of fluid to the first body, for example for cooling purposes.

[0007] In some embodiments, the fluid transfer system is arranged for allowing movement between the first body and the second body in a direction within the single plane, as well as in 20 a rotation direction about an axis substantially perpendicular to said plane. In lithographic applications, in particular in case charged particle beamlets are used for exposing of a substrate to be processed, vibration isolation requirements are generally more strict one set of directions, e.g. x-, y- and Rz-directions if the single plane is a substantially horizontal plane representing the xy-plane, than for another set of directions, e.g. z-, Rx- and Ry-directions.

25 The fluid transfer system may be arranged to allow movement between the first body and the second body in directions with more strict requirements.

[0008] In some embodiments, the fluid transfer system is arranged for progressively establishing movement over the entire length of the tube between the two anchor points. By progressively establishing movement, abrupt transitions, which may cause disturbance, are 30 avoided as much as possible.

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[0009] The at least one tube may be oriented in a curved fashion in the plane substantially parallel to the surface of the substrate support structure. In some embodiments, the at least one tube may form a loop. Preferably, the curvature of the at least one tube substantially corresponds to the natural curvature of the at least one tube obtained during fabrication 5 thereof. By using the natural curvature of the tube vibrations may be attenuated most effectively. Furthermore, resilient forces attempting to reshape the tube in its natural way are absent.

[0010] The end portions of the at least one tube may be oriented in a direction substantially perpendicular to the single plane. Such orientation may reduce the footprint of the fluid 10 transfer system.

[0011] Preferably, the flexible portion of the at least one tube is adapted to substantially decouple vibrations at the first anchor point which are above a predetermined maximum frequency from the second anchor point. Such design constraint aids to reduce in-coupling of vibrations to the second body.

15 [0012] In some embodiments, the fluid transfer system further comprises: at least one suspension holder comprising a support structure for holding the at least one tube at a location along its length between the two anchor points, the support structure being arranged for holding the at least one tube; and a support frame connectible to the first body for supporting the at least one suspension holder; wherein the support structure of the at least one 20 suspension holder is moveable with respect to the support frame in a direction within the single plane, as well as in a rotation direction about an axis substantially perpendicular to said plane. Such suspension holder limits tube bending under the influence of gravity.

[0013] In some further embodiments, a tube portion between the first anchor point and the closest suspension holder taken along the tube’s length allows for tube movement in a 25 direction substantially perpendicular to the single plane, as well as in rotation directions about axes in a direction within said plane. This allows for distinguishing between tube movement in one set of directions as compared to another set of directions, which benefits design flexibility.

[0014] In some embodiments, the fluid transfer system comprises a plurality of tubes. The 30 tubes may have different diameters. If a suspension holder is used, the tubes with the larger diameter may be more centrally supported to increase the stability of the flexible portion of -4- the fluid transfer system as compared to an arrangement in which these tubes are supported at a less central position.

[0015] Suitable materials for the at least one tube would be perfluoroalkoxy (PFA) and polytetrafluoroethylene (PTFE), the latter being known under the trade name Teflon®. In 5 some embodiments, PFA is preferred because it is melt-processable using conventional processing techniques including but not limited to injection molding and screw extrusion.

[0016] Some embodiments of the invention relate to a substrate processing apparatus, such as a lithographic apparatus or an inspection apparatus, comprising: a further support frame; a radiation projection system for projecting radiation onto a substrate to be processed, the 10 radiation projection system comprising a cooling arrangement and being supported by and moveable with respect to the further support frame; and a substrate support structure provided with a surface for supporting the substrate to be processed; the substrate processing apparatus further comprising a fluid transfer system according to any one of the preceding claims for providing fluid to and removing fluid from the cooling arrangement of the radiation, wherein 15 the first body comprises the further support frame and the second body comprises the radiation projection system.

[0017] In some embodiments, the further support frame, the radiation projection system, the substrate support structure and the fluid transfer system are placed in a vacuum chamber. In such embodiments, the extent of heat removal away from the radiation projection system may 20 almost entirely depend on the capacity and performance of the fluid transfer system because active heat removal is about the only effective heat transfer mechanism available.

[0018] In some embodiments, the apparatus further comprises: a support body for accommodating the radiation projection system; and an intermediate body connected to the support frame by means of at least one spring element; wherein the support body is connected 25 to the intermediate body by means of at least one pendulum rod. The at least one spring element may be a leaf spring. A leaf spring has well-defined vibrational properties. The leaf spring may comprise at least two substantially parallel elongated plates. The thickness and length of these plates largely determine the eigenfrequency of the leaf spring. In some embodiments, the support body is provided with side walls surrounding the radiation 30 projection system, wherein the side walls comprising a shielding material for shielding the radiation projection system from external electromagnetic fields.

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BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Embodiments of the invention will now be described, by way of example only, with reference to the accompanying schematic drawings in which:

[0020] FIG. 1 shows a simplified schematic drawing of a substrate processing apparatus; 5 [0021] FIG. 2 schematically shows a substrate processing apparatus that may be used in embodiments of the invention;

[0022] FIG. 3 shows a more detailed view of a portion of the substrate processing apparatus of FIG. 2;

[0023] FIG. 4 shows an elevated side view of a support body; 10 [0024] FIG. 5 schematically shows a fluid transfer system according to an embodiment of the invention;

[0025] FIG. 6 schematically shows the fluid transfer system of FIG. 5 connected to a support frame;

[0026] FIG. 7 schematically shows a suspension holder that may be used in the fluid 15 transfer system of FIG. 5;

[0027] FIG. 8 schematically shows a fluid transfer system according to another embodiment of the invention;

[0028] FIG. 9 schematically shows a cross-sectional view of an embodiment of a comer portion for use in the fluid transfer system of FIG. 8; 20 [0029] FIG. 10 schematically shows a cross-sectional view of an embodiment of a stiffening member that may be used in the fluid transfer system of FIG. 8;

[0030] FIG. 11 schematically shows an elevated side view of a fluid transfer system according to yet another embodiment of the invention; and

[0031] FIG. 12 schematically shows a cross-sectional view of an embodiment of a 25 connection between the fluid transfer system of FIG. 11 with a cooling arrangement.

DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

[0032] The following is a description of various embodiments of the invention, given by way of example only and with reference to the figures. The figures are not drawn to scale and 30 are merely intended for illustrative purposes.

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[0033] FIG. 1 shows a simplified schematic drawing of a substrate processing apparatus 10 that may be used in embodiments of the invention. The substrate processing apparatus 10 comprises a radiation projection system 20 for projecting radiation onto a substrate, such as a wafer, to be processed. The radiation projection system 20 may include a beamlet generator 5 for generating a plurality of beamlets, a beamlet modulator for patterning the beamlets to form modulated beamlets, and a beamlet projector for projecting the modulated beamlets onto a surface of a target. The components within the radiation projection system 20 are typically arranged in a column and are usually referred to as the electron-optical column or optical column, but will be referred to herein as simply the “column”. The radiation projection 10 system 20 may be arranged to project any kind of suitable radiation, for example the system 20 may project of charged particle beams, optical beams, or other types of beams.

[0034] The substrate processing apparatus 10 further comprises a substrate support structure 30 for supporting the substrate to be processed. The substrate support structure 30 may be a moveable substrate support structure. The apparatus 10 may then further comprise a 15 control system 40 for moving the substrate support structure 30 with respect to the radiation projection system 20. The control system 40 may base the movement on position information obtained by measurements within the radiation projection system 20, for example by the use of interferometry.

[0035] Hereafter, embodiments of the invention will be described in relation to a 20 lithographic apparatus, although it may also be applied for an inspection apparatus, and the like. In particular, reference is made to a multi-beam charged particle lithographic apparatus. As schematically shown in FIG. 1, such apparatus comprises a beam generator 21 for generating a plurality of charged particle beamlets, a beamlet blanker array 22 for patterning the plurality of beamlets in accordance with a pattern, and a projection system 23 for 25 projecting the patterned beamlets onto a target surface of a substrate provided on the target support structure. An example of such apparatus may be found in international patent publication WO2009/127658, a copy of which is herein incorporated by reference in its entirety.

30 [0036] FIG. 2 schematically shows a substrate processing apparatus 1 that may be used in embodiments of the invention. The vertical direction in FIG. 2 is defined as the z-direction, -7- whereas the horizontal direction shown in FIG. 2 is defined as the y-direction. Additionally, a direction perpendicular to both the y-direction and the z-direction and extending into and out of the paper is defined as the x-direction. Furthermore, a rotational direction corresponding to rotation about an axis directed in the x-direction, i.e. x-axis, is defined as the Rx, a rotational 5 direction corresponding to rotation about an axis directed in the y-direction, i.e. y-axis, is defined as the Ry-direction, and, finally, a rotational direction corresponding to rotation about an axis directed in the z-direction, i.e. z-axis, is defined as the Rz-direction.

[0037] In this embodiment, the apparatus 1 comprises a vacuum chamber 50 positioned on top of a base plate 52. The apparatus 1 further comprises a support frame 60 placed within the 10 vacuum chamber 50. The support frame 60 is preferably made of a material with sufficient stiffness to provide support without deformation, for example a suitable metal such as aluminum. Furthermore, in particular in applications using charged particle beamlets, the material is non-magnetic.

[0038] The radiation projection system 20, which is only partially shown in FIG. 2, takes 15 the form of a column and is placed in a body 62 for accommodating the column. Body 62 will hereafter be referred to as support body 62. The radiation projection system 20 is further supported by and vibrationally decoupled from the support frame 60. In this embodiment, the support body 62 is connected to the support frame 60 via an intermediate body 64. The intermediate body 64 may take the form of a plate or a number of plates connected to each 20 other. The intermediate body 64 may comprise one or more cut-outs and/or may contain portions of smaller thickness to reduce weight. The material of the intermediate body is preferably a non-magnetic material, preferably a non-magnetic metal. The intermediate body 64 enables a decoupling of vibrations in the z-direction and vibrations in the x, y and Rz-directions.

25 [0039] The support frame 60 is connected to the intermediate body 64 by means of one or more spring elements 66, such as leaf springs. A leaf spring has well-defined vibrational properties and may comprise at least two substantially parallel elongated plates. The thickness and length of these plates largely determine the eigenfrequency of the leaf spring. The spring elements 66 may be provided with damping elements to enable vibrational damping, 30 particularly in the z-direction. The spring elements 66 are arranged for decreasing the influence of external vibrations on the position of the support body 62. By suitable selection -8- of parameters such as shape, size and material of the spring elements 66, the incoupling of particular frequency components in external vibrations may be minimized. In particular, the spring elements 66 enable a decoupling of vibrations in the z-direction as well as vibrations in a rotational direction about the x-direction axis and the y-direction axis, i.e. Rx and Ry 5 respectively.

[0040] The support body 62 is also connected to the intermediate body 64. The connection between the body 62 and the body 64 is by means of at least one rod-like structure, further referred to as pendulum rod 68. The at least one pendulum rod 68 should be sufficiently strong to carry the support body 62, which may have a mass of several hundreds of kilograms, 10 and capable of permitting the support body 62 to swing. The intermediate body 64 and/or the support body 62 may be provided with damping elements to dampen vibrations in the horizontal plane and preferably also to dampen vibrations in a rotational direction about the z-direction axis, i.e. Rz.

[0041] The intermediate body 64 enables a decoupling of vibrations in the z-direction and 15 vibrations in the x, y and Rz-directions. Furthermore, by suitable positioning of the connection positions of the intermediate body 64 with the spring elements 66, the eigenfrequencies in the z-direction that may couple into the support body 62 may be set. Similarly, by suitable positioning of the one or more connection positions of the intermediate body 64 with the one or more pendulum rods 68, the eigenfrequencies in Rz-direction that 20 can couple into the support body 62 may be set. The eigenfrequencies in the x and y-directions may be set by choosing the length of the one or more pendulum rods 68. Consequently, the use of an intermediate body 64 provides design freedom regarding the setting of eigenfrequencies of the system.

[0042] In lithographic application, in particular in case charged particle beamlets are used 25 for exposing of a substrate to be processed, the vibration isolation requirements are generally more strict for x-, y- and Rz-directions than for z-, Rx- and Ry-directions. Vibrations in the x, y and Rz-direction may have a significant influence on beamlet positioning, which may lead to exposure position errors. On the other hand, vibrations in the z, Rx and Ry directions have an influence on the beamlet spot size on the target surface of the substrate to be processed.

30 Charged particle beamlets in lithographic systems preferably have a relatively large depth of focus. Consequently, a small deviation in a direction away from the focal plane is of less -9- significance for the quality and reliability of the exposed pattern, than the exposure position errors discussed above.

[0043] In lithographic applications, preferably, the eigenfrequencies in the z-direction are chosen to be below 15 Hz, preferably below 5 Hz, whereas the eigenfrequencies in the x, y 5 and Rz-directions are chosen to be below 3 Hz, preferably below 1 Hz. Specific choices of eigenfrequencies may depend on the bandwidth of the system responsible for compensating vibrations, for example control system 40.

[0044] The substrate support structure 30, which carries a substrate 70 to be processed, is placed on top of a chuck 80. The chuck 80 is provided on top of a Y-stage 90 for moving the 10 chuck 80 in the y-direction, and an X-stage 92 arranged for movement in the x-direction.

[0045] In the shown embodiment, the Y-stage 90 comprises positioners 94 for moving a member 96 in the Y-direction. The positioners 94 typically take the form of electromotors, preferably linear motors, preferably comprising Lorentz-type actuators. In a Lorentz-type actuator the applied force is linearly proportional to the current and the magnetic field.

15 Furthermore, the Y-stage 90 is provided with a gravity compensation spring 98 for decoupling vibrations in the support frame 60 from the substrate support structure 30 and the substrate 70 provided thereon.

[0046] FIG. 3 shows a more detailed view of a portion of the substrate processing apparatus 20 1 of FIG. 2. As described above, the column in a substrate processing apparatus is preferably vibrationally decoupled in such a way that only very low frequencies can couple into the column from the outside world. In particular in lithographic applications, the radiation generated by a radiation source is modulated before being projected in accordance with a predetermined pattern. To supply the pattern, one or more masks may be used. Alternatively, 25 a pattern may be created by sending control data to deflectors which, in dependence of the control signal value that they receive, block a predetermined portion of radiation or allow that radiation portion to be projected on the substrate to be processed. Such control data may be sent via electric signals, but may also be sent optically, for example via optical fibers. Additionally, projecting charged particle beams such as electron beams requires the 30 application of suitable voltages to components within the column.

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[0047] Furthermore, the use of a mask and/or deflectors results in a generation of heat caused by the radiation that is blocked within the column. In view of the ever increasing demand for smaller structures, and the extremely high costs related to occupying space within a semiconductor production facility, there is often insufficient space for sufficient passive 5 cooling. Therefore, in many cases, components within a lithographic apparatus are actively cooled, for example by a suitable supply of cooling fluid.

[0048] In FIG. 3, the area within the dashed lines represents a space 100 reserved for one or more of electrical wires, optical fibers and cooling conduits for abovementioned purposes. It will be clear that the supply lines should not jeopardize the beneficial design with respect to 10 the vibrational decoupling. In other words, the supply lines should be arranged in such a way that vibrations coupling into the system also remain below the desired maximum frequency.

[0049] FIG. 4 shows an elevated side view of a support body 62 provided with an arrangement to accommodate electrical wiring 110, optical fibers 120 and a cooling 15 arrangement 130 comprising one or more fluid conduits. The radiation projection system is not shown to enhance clarity. The wiring 110, fibers 120 and cooling arrangement 130 are all provided within the space denoted by area 100 in FIG. 3.

[0050] In the embodiment of FIG. 4 the cooling arrangement 130 comprises a plurality of tubes 131. The tubes 131 are preferably rigid and attached to the support body 62 to avoid 20 movement of the tubes 131 relative to the support body 62 due to varying amounts of fluid running through them. FIG. 4 merely shows an example of a configuration of tubes 131. As shown in FIG. 4, the tubes 131 may be grouped together.

[0051] The support body 62 is further provided with side walls 135, of which only two walls 140 are shown for clarity. The walls 135 may comprise a shielding material, such as a 25 mu metal or the like, for shielding the radiation projection system 20 from external electromagnetic fields.

[0052] One or more of the side walls 135 may be provided with one or more protrusions 112,122 arranged to enable draping the electrical wiring 110 and the optical fibers 120 respectively in such a way that the electrical wires 110 and the fibers 120 form a U-shaped 30 bend at a height level below the respective protrusion 112,122. By hanging the wires 110 and/or fibers 120 in such a way, vibrations will not reach the support body 62. The U-shaped -11- bend effectively inhibits the vibrations to progress. Unfortunately, it is impossible to use a similar arrangement to inhibit vibrations to couple into the support body 62 via ordinary cooling tubes.

5 [0053] FIG. 5 schematically shows a fluid transfer system 150 according to an embodiment of the invention. The fluid transfer system 150 is arranged for providing fluid to and removing fluid from the cooling arrangement of the radiation projection system 20. The fluid transfer system 150 comprises at least one tube 140 fixed at two points 151,152 within the substrate processing apparatus 10. The points 151,152 may be referred to as anchor points or 10 fixed points 151,152. The portion of the fluid transfer system 150 that is arranged for transferring fluid between the fixed points 151,152 may be referred to as the flexible portion of the fluid transfer system 150.

[0054] In the fluid transfer system 150 depicted in FIG. 5 the system comprises a plurality of tubes 140 for providing fluid to the cooling arrangement, and another plurality of tubes 140 15 for removing fluid from the cooling arrangement. As will be explained with reference to FIG. 6, the tubes 140 for providing fluid and the tubes 140 for removing fluid may be specifically arranged to avoid heat transfer between the tubes 140. Alternatively, the fluid transfer system 150 may comprise only one tube 140, or merely one tube 140 for providing fluid to the cooling arrangement and merely one tube 140 for removing fluid from the cooling 20 arrangement. In fact, any number of tubes 140 may be possible.

[0055] The first anchor point 151 is preferably connected to the support frame 60 whereas the second anchor point 152 is preferably connected to the radiation projection system 20 which comprises the cooling arrangement. The main portions of the tubes 140 are arranged in curved fashion in a plane, preferably the xy-plane. The radius of curvature preferably 25 coincides with the natural curvature tubes obtain while they are being manufactured. End portions of the tubes 140 have an orientation substantially perpendicular to the plane. In FIGS. 5 and 6, the tube end portions facing upwards are arranged for connection with the support frame 60, whereas the tube end portions facing downwards are arranged for connection with the cooling arrangement of the radiation projection system 20.

30 [0056] Because the tubes 140 do not form a straight connection between the anchor points 151,152, but instead form a curved connection, in FIG. 5 in the form of a loop, vibrations are -12- attenuated over a longer distance, which allows for more efficient vibration decoupling. The orientation of the tubes 140 in a curved fashion in a single plane allows for vibration attenuation in that plane. For example, in case the plane corresponds with the xy-plane, as preferably the case if the substrate processing apparatus corresponds to the apparatus depicted 5 in FIG. 2, the curved tubing arrangement allows for attenuation of the vibrations in the x-direction, the y-direction, and the rotational direction substantially perpendicular to the xy-plane, i.e. the Rz-direction.

[0057] Preferably, the tubes 140 are supported by one or more suspension holders 160 along their trajectory between the anchor points 151,152. The use of one or more suspension 10 holders 160 reduces tube bending under the influence of gravity. As a result of such bending, one or more tubes may contact the support frame 60 or a structure connected thereto, which would eliminate the vibration decoupling. An embodiment of a suspension holder 160 is schematically depicted in FIG. 7.

[0058] By suitable selection of the type and number of tubes as well as the number of 15 suspension holders, if any, the stiffness of the fluid transfer system may be defined such that vibrations above a predetermined maximum frequency as suppressed. In particular, in the embodiment depicted in FIG. 5, attenuation of vibrations in the x, y and Rz direction is progressively established over the entire length between anchor points 151 and 152. On the other hand, attenuation of vibrations in the Rx, Ry and z-directions effectively take place 20 between the anchor point 152 and the suspension holder 160 closest to the anchor point 152. As a result, the predetermined maximum frequency that is allowed to advance to the radiation projection system may differ per vibration direction. In particular, in the embodiment depicted in FIG. 5 the predetermined maximum frequency in the x, y and Rz-directions is typically lower than the predetermined maximum frequency in the Rx, Ry and z-directions.

25 [0059] Suitable materials for the one or more tubes 140 would be perfluoroalkoxy (PFA) and polytetrafluoroethylene (PTFE), the latter being known under the trade name Teflon®. In this embodiment, PFA is preferred because it is melt-processable using conventional processing techniques including but not limited to injection molding and screw extrusion. [0060] The use of curved tubes, preferably with a curvature that substantially corresponds 30 to the curvature that is naturally provided to the tubes during manufacturing or fabrication, i.e. their “natural curvature”, allows for attenuation of vibrations along a relatively long -13- trajectory. In particular, the tubes may be oriented and placed in such a way that the fluid transfer system has a predetermined maximum stiffness. Preferably, the predetermined maximum stiffness is lower than 500 N/m, more preferably lower than 400 N/m. A low stiffness results in a reduced incoupling of vibrations. In particular, the cut-off frequency of 5 vibrations that are coupled into the cooling arrangement is lower in case the maximum stiffness of the fluid transfer system is reduced.

[0061] Providing a predetermined stiffness for the flexible portion of the fluid transfer system may include different selections of suitable parameters and conditions. For example, the length, diameter and wall thickness of the one or more tubes 140 may be suitably selected.

10 Alternatively, or additionally, the curvature of the one or more tubes 140 may be suitably selected. Furthermore, as the stiffness of the flexible portion may depend on the fluid that is transferred through the fluid transfer system during operational use, the fluid transfer system may comprise a fluid supply system for regulating parameters of the fluid flow in the fluid transfer system. Exemplary parameters include, but are not limited to fluid type, fluid volume 15 and fluid pressure.

[0062] The fluid being transferred via the fluid transfer system towards and from the cooling arrangement may be liquid, a gas or a combination of the two. In many applications, water is a suitable cooling fluid.

20 [0063] FIG. 6 schematically shows the fluid transfer system 150 of FIG. 5 connected to an additional support frame 170. The additional support frame 170 is connected to the support frame 60 by via coupling structures 171. Furthermore, the additional support frame 170 is arranged to support the suspension holders 160 used to support the weight of the tubes 140. Furthermore, the additional support frame 170 may be used to outline the position of the fluid 25 transfer system 150 within the substrate processing apparatus. The additional support frame 170 may be manufactured by cutting and bending plate material, for example aluminum, optionally in combination with welding techniques.

[0064] FIG. 6 further shows that the end portions of the tubes 140 facing upwards are connected with the support frame 60 via flanges 180 and 181, each flange preferably 180,181 30 being arranged to accommodate solely tubes that transfer fluid towards or away from the radiation projection system 20 respectively. Similarly, the end portions of the tubes 140 -14- facing downwards are connected to the radiation projection system 20, preferably to the cooling arrangement provided therein, via flanges 190 and 191. Again, each flange 190,191 is preferably arranged to accommodate solely tubes that transfer fluid towards or away from the radiation projection system 20 respectively.

5

[0065] FIG. 7 schematically shows a suspension holder 160 that may be used in the fluid transfer system of FIG. 5. The suspension holder 160 comprising a frame 200 in which one or more support elements 210 are provided for supporting the one or more tubes 140. Preferably, multiple support elements 210 are used that can be connected in such a way that the support 10 elements form a support structure provided with a plurality of holes for accommodating the tubes 140. The support structure is vibrationally decoupled in x, y and Rz-directions from the frame 200 by means of supporting poles 220 and spring elements 230. The supporting poles 220 have rounded ends 221 that allow for movement in the x, y and Rz-directions. The spring elements 230 may take the form of springs.

15 [0066] Preferably, the support elements 210 have dimensions that allow the creation of the support structure in a modular fashion. In such embodiment, first, the lowest support element 210 is provided on top of which one or more tubes are placed. Subsequently, a second support element 210 is placed on top of the lowest support element 210, thereby enclosing the tubes 140 already resting on the lowest support element 210. The second support element 210, in its 20 turn, may be provided with recessions that allow placement of further tubes 140. Then a third support element 210 may be placed on top of the second support element 210 to enclose the tubes 140 that are placed in the recessions of the second support element 210. This stacking of support elements 210 continues until all tubes are suitably enclosed as depicted in FIG. 7.

[0067] Preferably, in case tubes 140 of different diameter are used, the tubes with largest 25 diameter are supported at a relatively centered position, whereas tubes 140 with a smaller diameter may be located near the edge of the support structure. Such allocation of tubes results in a more stable structure.

[0068] Preferably, the holes in the support structure for allowing the tubes to pass therethrough are of such dimensions that the tubes may move somewhat in a transverse 30 direction within the holes. In other words, in some embodiments, the tubes do not fit tightly in the holes, but rather fit loosely. In particular if the curvature of a tube differs from its -15- natural curvature, resilient forces may occur which may move the tube slight inwards or outwards. If the tubes would fit tightly, such sideways transfer could result in a similar movement of the support structure of the suspension holder 160, which, in its turn, may result in contact between the suspension holder 160 and the support frame 60 or a structure 5 connected thereto, for example additional support frame 170. Consequently, the vibrational decoupling of the support structure would be eliminated.

[0069] FIG. 8 schematically shows a fluid transfer system 250 according to another embodiment of the invention. The fluid transfer system 250 is arranged for providing fluid to 10 and removing fluid from the cooling arrangement of the radiation projection system 20 and comprises at least one tube 240 fixed at two points within the substrate processing apparatus 10. The tube 240 comprises at least two straight portions 252 and at least one comer portion 254 between the two points. The straight portions 252 are flexible compared to the one or more comer portions 254. In other words, the one or more comer portions 254 have a higher 15 stiffness than the straight portions 252.

[0070] The straight portions 252 make up the largest part of the tube 240, i.e. sum of the lengths of the straight portions 252 exceeds 50% of the length of the tube 240. Preferably the sum of the lengths of the straight portions 252 makes up at least 70% of the length of the tube 240. Consequently, the tube 240 is mostly flexible, but stiff in the comers. The flexible 20 straight portions 252 within the fluid transfer system 250 enable attenuation of vibrations progressing towards the support body 62 above a predetermined maximum frequency. The one or more stiff corner portions 254 are capable of sustaining pressure increases, which for example may avoid straightening of the tube 240 due to fluid mnning through the tube. Suitable materials for the one or more tubes 140 would again be perfluoroalkoxy (PFA) and 25 polytetrafluoroethylene (PTFE), the latter being known under the trade name Teflon®.

[0071] The use of one or more tubes having straight portions 252 and one or more comer portions 254 provides design freedom with respect to the stiffness of the fluid transfer system. In particular, the fluid transfer system may be designed to have a predetermined maximum stiffness. Preferably, the predetermined maximum stiffness is smaller than 500 N/m.

30 Providing a predetermined maximum stiffness may involve similar selections and considerations discussed with reference to the embodiment shown in FIG. 5.

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[0072] The fluid being transferred via the fluid transfer system towards and from the cooling arrangement may be liquid, a gas or a combination of the two. In many applications, water is a suitable cooling fluid.

5 [0073] FIG. 9 schematically shows a cross-sectional view of an embodiment of a comer portion 254 for use in the fluid transfer system of FIG. 8. The comer portion 254 comprises a stiffening member 260. The stiffening member 260 is a structure provided with a hollow opening 262 in the shape of a bended tube. Preferably, the hollow opening 262 accommodates the tube 240 and guides the tube around a comer. Alternatively, the hollow opening 262 can 10 be used as a conduit to which straight portions 252 of the tube are attached. The stiffening member 260 prevents the tube from straightening due to fluid running through the tube. The stiffening member 260 is preferably made of a non-magnetic material. Furthermore, the material preferably enables easy manufacturing and is a material of limited weight. A suitable material for the stiffening member 260 is aluminum.

15 [0074] The stiffening member 260 may be connected to the support frame 60 by means of a spring element 270. Such connection provides structural integrity to the cooling transfer system 250 within the substrate processing apparatus, while limiting the influence of external vibrations. The size and shape of the spring element 270 depends on the desired structural integrity and the requirements regarding the (frequencies of the) vibrations that are to be 20 attenuated.

[0075] FIGS. 8 and 9 show a fluid transfer system 250 with a single tube 240. However, in some embodiments, the fluid transfer system 250 comprises a plurality of tubes. In such system 250, each tube may be arranged as shown in FIGS. 8 and 9, i.e. fixed at two points and 25 comprising at least two relatively flexible straight portions and at least one relatively stiff comer portion between the two points.

[0076] FIG. 10 schematically shows a cross-sectional view of an embodiment of a stiffening member 260 that may be used in embodiments of the invention in which the fluid transfer system 250 comprises a plurality of tubes, such as the fluid transfer system of FIG. 8.

30 The stiffening member 260 is provided with a plurality of openings 262 for guiding fluid in a -17- desired direction. Similar to the embodiment shown in FIG. 9, the openings 262 may either be used as conduits for guiding the fluid, or they may accommodate a portion of the tubes 240.

[0077] The fluid transfer system 250 may be surrounded by a tubular housing 280. The tubular housing 280 may be used to protect the fluid transfer system 250. Furthermore, in case 5 the fluid transfer system 250 is provided in a vacuum environment, for example in a vacuum chamber 50 as shown in FIG. 2, the tubular housing 280 may be arranged for blocking particles emitted from the tubes 240 from entering into the vacuum. Preferably, the tubes 240 do not directly contact the housing 280. The stiffening members 260 are connected to the housing 280, preferably via one or more spring elements 290 to ensure vibrational decoupling 10 from the environment. The tubular housing 280 is preferably relatively stiff, and is preferably rigidly connected to the support frame 60 via a connection 272 to provide sufficient structural integrity to the tubular housing 280.

[0078] Alternatively, the tubular housing 280 may be connected to the support frame 60 via one or more spring elements, such as spring elements 270. In such case, the stiffness of the 15 spring elements 270 and 290 is to be properly tuned to achieve an effective vibrational decoupling of the stiffening member 260 from the support frame 60.

[0079] FIG. 11 shows an elevated side view of a fluid transfer system 250 within a tubular housing 280. The system 250 comprises a plurality of tubes 240. The straight portions 252 of 20 each tube are free of contacting straight portions of other tubes 240. As a result, vibrations within neighboring tubes 240 have a negligible effect on the vibration attenuation performance of a tube 240. In addition to stiffening members 260 in comer portions 254 of the tubes 240, the fluid transfer system 250 comprises a further stiffening member 265 at an end of the tubes. The further stiffening member 265 fixates the connection positions of the 25 fluid transfer system 250 at its end points. For example, the further stiffening member 265 may be used to fixate the end points of the tubes 240 of the fluid transfer system for connection to corresponding conduits within the cooling arrangement 230 of the radiation projection system 20. The further stiffening member 265 may be similar to stiffening member 260. However, the one or more openings 262 do not necessarily have a curved portion for 30 guiding fluid around a comer.

-18-

[0080] FIG. 12 schematically shows a cross-sectional view of a connection of a fluid transfer system 250 with a cooling arrangement 230 according to an embodiment of the invention. In the embodiment depicted in FIG. 12, the fluid transfer system 250 comprises a plurality of tubes 240 surrounded by a housing 280. The housing 280 is preferably shaped in a 5 way substantially corresponding to the shape formed by the plurality of tubes 240. In the shown embodiment, the housing thus takes the form of a tubular housing 280.

[0081] The cooling arrangement 230 comprises a corresponding plurality of tubes 231. The way in which the tube ends of the cooling arrangement and the tube ends of the fluid transfer system 250 are connected to each other is not explicitly shown. However, it will be 10 understood that this may be done in a way generally known in the art. The tubular housing 280 is provided with a membrane 300. The membrane 300 is arranged for separating a space within the tubular housing 280 from external influences, in particular from a vacuum environment. The membrane 300 is provided with one or more openings through which the one or more tubes of the fluid transfer system 250 protrude.

15 [0082] In case the cooling arrangement 230 is subjected to a vacuum environment, particles created within the tubular housing 280, for example due to outgassing, may leak towards the vacuum environment via the membrane openings. To reduce such leakage, the tubular housing 280 is preferably provided with an outlet 310 that may be connected to a pump, preferably a vacuum pump. Alternatively, or additionally, leakage is reduced by providing 20 flexible portions 305 to positions in close proximity of or at the edges of the membrane openings. The flexible portions 305 extend from the membrane 300 onto the tubes forming a weak seal. The flexible portions 305 reduce the size of the openings, and may therefore further reduce leakage of particles from the internal space of the housing 280 towards the vacuum environment. Furthermore, since the portions 305 form a weak seal, the advancement 25 of any undesired vibrations via the housing 280 and the membrane 300 towards the radiation projection system is avoided.

[0083] The invention has been described by reference to certain embodiments discussed above. It will be recognized that these embodiments are susceptible to various modifications 30 and alternative forms well known to those of skill in the art without departing from the spirit and scope of the invention. Accordingly, although specific embodiments have been described, -19- these are examples only and are not limiting upon the scope of the invention, which is defined in the accompanying claims.

Claims (21)

1. Fluïdumtransfersysteem (150) voor gebruik in een substraatverwerkingsinrichting, waarbij het fluïdumtransfersysteem ten minste één buis omvat om bevestigd te 5 worden aan een eerste lichaam (60) op een eerste ankerpunt (151), en om beves tigd te worden aan een tweede lichaam (20) op een tweede ankerpunt (152), waarbij de ten minste één buis een flexibel gedeelte omvat dat zich uitstrekt tussen de twee ankerpunten in twee dimensies over een enkel vlak, waarbij het flu-idumtransfersysteem ingericht is voor het toestaan van beweging tussen het eer- 10 ste lichaam en het tweede lichaam, waarbij het fluïdumtransfersysteem verder omvat: - ten minste één suspensiehouder (160) omvattende een steunstructuur voor het houden van de ten minste één buis op een plaats langs de lengte ervan tussen de twee ankerpunten, waarbij de steunstructuur ingericht is voor het houden 15 van de ten minste één buis ; en - een steunraamwerk (170) dat bevestigbaar is aan het eerste lichaam voor het ondersteunen van de ten minste één suspensiehouder; waarbij de steunstructuur van de ten minste één suspensiehouder beweegbaar is ten opzichte van het steunraamwerk in een richting in het enkele vlak, evenals in 20 een rotatierichting rondom een as hoofdzakelijk loodrecht op genoemd vlak.A fluid transfer system (150) for use in a substrate processing device, wherein the fluid transfer system comprises at least one tube for being attached to a first body (60) at a first anchor point (151), and for being attached to a second body (20) at a second anchor point (152), the at least one tube comprising a flexible portion extending between the two anchor points in two dimensions over a single plane, the fluid transfer system being adapted to allow movement between the first body and the second body, the fluid transfer system further comprising: - at least one suspension container (160) comprising a support structure for holding the at least one tube at a location along its length between the two anchor points, the support structure is adapted to hold the at least one tube; and - a support frame (170) attachable to the first body for supporting the at least one suspension container; wherein the support structure of the at least one suspension container is movable with respect to the support frame in a direction in the single plane, as well as in a direction of rotation about an axis substantially perpendicular to said plane. 2. Systeem volgens conclusie 1, waarbij het fluïdumtransfersysteem ingericht is voor het toestaan van beweging tussen het eerste lichaam en het tweede lichaam in een richting in het enkele vlak, evenals in een rotatierichting rondom een as 25 hoofdzakelijk loodrecht op genoemd vlak.2. System as claimed in claim 1, wherein the fluid transfer system is adapted to allow movement between the first body and the second body in a direction in the single plane, as well as in a direction of rotation about an axis substantially perpendicular to said plane. 3. Systeem volgens conclusie 1 of 2, waarbij het fluïdumtransfersysteem ingericht is voor het geleidelijk opbouwen van beweging tussen de twee ankerpunten over de gehele lengte van de buis. 30The system of claim 1 or 2, wherein the fluid transfer system is adapted to gradually build up movement between the two anchor points along the entire length of the tube. 30 4. Systeem volgens eenieder van de voorgaande conclusies, waarbij ten minste een aanzienlijk deel van het flexibele gedeelte van de ten minste één buis zich uitstrekt in twee dimensies over het enkele vlak op een gekromde wijze.A system according to any of the preceding claims, wherein at least a substantial portion of the flexible portion of the at least one tube extends in two dimensions over the single plane in a curved manner. 5. Systeem volgens conclusie 4, waarbij de kromming van de ten minste één buis in hoofdzaak overeenkomt met de natuurlijke kromming van de ten minste één buis, verkregen tijdens de productie daarvan.The system of claim 4, wherein the curvature of the at least one tube substantially corresponds to the natural curvature of the at least one tube obtained during its production. 6. Inrichting volgens eenieder van de voorgaande conclusies, waarbij eindgedeelten 10 van de ten minste één buis georiënteerd zijn in een richting hoofdzakelijk loodrecht op het enkele vlak.Device according to any of the preceding claims, wherein end portions 10 of the at least one tube are oriented in a direction substantially perpendicular to the single plane. 7. Systeem volgens eenieder van de voorgaande conclusies, waarbij het flexibele gedeelte ingericht is om trillingen bij het eerste ankerpunt die boven een vooraf 15 bepaalde maximale frequentie liggen, aanzienlijk te ontkoppelen van het tweede ankerpunt.7. System as claimed in any of the foregoing claims, wherein the flexible part is adapted to substantially decouple vibrations at the first anchor point that are above a predetermined maximum frequency from the second anchor point. 8. Systeem volgens eenieder van de voorgaande conclusies, waarbij een buisge-deelte tussen het eerste ankerpunt en de dichtstbijzijnde suspensiehouder, ge- 20 nomen langsheen de lengte van de buis, beweging van de buis toelaat in een richting hoofdzakelijk loodrecht op het enkele vlak, evenals in draairichtingen rondom assen in een richting in genoemd vlak.8. System as claimed in any of the foregoing claims, wherein a tube section between the first anchor point and the nearest suspension container, taken along the length of the tube, allows movement of the tube in a direction substantially perpendicular to the single plane, as well as in directions of rotation around axes in a direction in said plane. 9. Systeem volgens eenieder van de voorgaande conclusies, waarbij de suspensie- 25 houder een raamwerk (200) omvat, verbonden met de steunstructuur door middel van ten minste twee steunpalen (220) en één of meer veerelementen (230).9. System as claimed in any of the foregoing claims, wherein the suspension holder comprises a frame (200) connected to the support structure by means of at least two support posts (220) and one or more spring elements (230). 10. Systeem volgens eenieder van de voorgaande conclusies, waarbij het fluïdum-transfersysteem meerdere buizen (140) omvat, waarbij elke buis vastgemaakt is 30 op twee punten en elke buis georiënteerd is op een gekromde wijze in het enkele vlak, en waarbij de steunstructuur van de ten minste één suspensiehouder inge- richt is voor het houden van de meerdere buizen op een plaats langs de lengte ervan zodat de buizen elkaar niet raken.10. System according to any of the preceding claims, wherein the fluid transfer system comprises a plurality of tubes (140), each tube being fixed at two points and each tube oriented in a curved manner in the single plane, and wherein the support structure of the at least one suspension container is arranged to hold the plurality of tubes in a location along their length so that the tubes do not touch each other. 11. Systeem volgens conclusie 10, waarbij de buizen verschillende diameters heb- 5 ben, en waarbij de buizen met een grotere diameter meer centraal ondersteund worden door de steun structuur van de ten minste één suspensiehouder.11. System as claimed in claim 10, wherein the tubes have different diameters, and wherein the tubes with a larger diameter are more centrally supported by the support structure of the at least one suspension container. 12. Systeem volgens eenieder van de voorgaande conclusies, waarbij één of meer buizen van het fluïdumtransfersysteem gemaakt zijn van een materiaal dat ten 10 minste één van perfluoralkoxy en polytetrafluorethyleen omvat.12. System according to any of the preceding claims, wherein one or more tubes of the fluid transfer system are made of a material comprising at least one of perfluoroalkoxy and polytetrafluoroethylene. 13. Het systeem volgens eenieder van de voorgaande conclusies, waarbij het enkele vlak een in hoofdzaak horizontaal vlak is.The system of any one of the preceding claims, wherein the single face is a substantially horizontal face. 14. Substraatverwerkingsinrichting (10), zoals een lithografische inrichting of een in- spectie-inrichting, omvattende : - een verder steunraamwerk (60); - een stralingsprojectiesysteem (20) voor het projecteren van straling op een te verwerken substraat (70), waarbij het stralingsprojectiesysteem een koelin- 20 richting (130) omvat en ondersteund wordt door en beweegbaar is ten opzichte van het verdere steunraamwerk; en - een substraatsteunstructuur (30), voorzien van een oppervlak voor het ondersteunen van het te verwerken substraat; waarbij de substraatverwerkingsinrichting verder een fluïdumtransfersysteem om-25 vat volgens eenieder van de voorgaande conclusies voor het verschaffen van flu ïdum aan en het verwijderen van fluïdum uit de koelinrichting van de straling, waarbij het eerste lichaam het verdere steunraamwerk omvat en het tweede lichaam het stralingsprojectiesysteem omvat.A substrate processing device (10), such as a lithographic device or an inspection device, comprising: - a further support frame (60); - a radiation projection system (20) for projecting radiation onto a substrate (70) to be processed, wherein the radiation projection system comprises a cooling device (130) and is supported and movable with respect to the further supporting frame; and - a substrate support structure (30) provided with a surface for supporting the substrate to be processed; wherein the substrate processing device further comprises a fluid transfer system according to any of the preceding claims for providing fluid to and removing fluid from the radiation cooling device, the first body comprising the further support frame and the second body comprising the radiation projection system . 15. Inrichting volgens conclusie 14, waarbij de koelinrichting één of meer leidingen omvat, en waarbij één of meer buizen van het fluïdumtransfersysteem verbonden zijn met een overeenkomstige leiding.The apparatus of claim 14, wherein the cooling device comprises one or more conduits, and wherein one or more tubes of the fluid transfer system are connected to a corresponding conduit. 16. Inrichting volgens conclusie 14 of 15, waarbij het verdere steunraamwerk, het stralingsprojectiesysteem, de substraatsteunstructuur, en het fluïdumtransfersys-teem geplaatst zijn in een vacuümkamer (50). 5The device of claim 14 or 15, wherein the further support frame, the radiation projection system, the substrate support structure, and the fluid transfer system are disposed in a vacuum chamber (50). 5 17. Inrichting volgens een van de conclusies 14-16, verder omvattende : - een steunlichaam (62) voor het opnemen van het stralingsprojectiesysteem; en - een tussenlichaam (64), verbonden met het steunraamwerk door middel 10 van ten minste één veerelement (66); waarbij het steunlichaam verbonden is met het tussenlichaam door middel van ten minste één slingerstang (68).Device according to any of claims 14-16, further comprising: - a support body (62) for receiving the radiation projection system; and - an intermediate body (64) connected to the support frame by means of at least one spring element (66); wherein the support body is connected to the intermediate body by means of at least one pendulum rod (68). 18. Inrichting volgens conclusie 17, waarbij het ten minste één veerelement een blad- 15 veeris.18. Device as claimed in claim 17, wherein the at least one spring element is a leaf spring. 19. Inrichting volgens conclusie 17 of 18, waarbij het steunlichaam voorzien is van zijwanden (135) die het stralingsprojectiesysteem omringen, waarbij de zijwanden een afschermend materiaal omvatten voor het afschermen van het stralingspro- 20 jectiesysteem van externe elektromagnetische velden.19. Device as claimed in claim 17 or 18, wherein the support body is provided with side walls (135) surrounding the radiation projection system, the side walls comprising a shielding material for shielding the radiation projection system from external electromagnetic fields. 20. Inrichting volgens een van de conclusies 14-19, waarbij het stralingsprojectiesysteem een multi-deelbundel geladen deeltjes lithografische inrichting is.The device of any one of claims 14-19, wherein the radiation projection system is a multi-part beam charged particle lithographic device. 21. Inrichting volgens conclusie 20, waarbij de multi-deelbundel geladen deeltjes li thografische inrichting omvat: - een bundelgenerator (21) voor het genereren van meerdere geladen deeltjes deelbundels ; - een deelbundel afdekarray (22) voor patroonvorming van de meerdere 30 deelbundels volgens een patroon; en - een projectiesysteem (23) voor het projecteren van de patroongevormde deelbundels op een doeloppervlak van een substraat verschaft op de doelsteun-structuur.Device according to claim 20, wherein the multi-sub-beam charged particle sub-device comprises: - a beam generator (21) for generating a plurality of charged particle sub-beams; - a sub-bundle cover array (22) for patterning the plurality of sub-bundles according to a pattern; and - a projection system (23) for projecting the patterned sub-beams onto a target surface of a substrate provided on the target support structure.