NL2006255A - Lithographic apparatus and device manufacturing method. - Google Patents

Lithographic apparatus and device manufacturing method. Download PDF

Info

Publication number
NL2006255A
NL2006255A NL2006255A NL2006255A NL2006255A NL 2006255 A NL2006255 A NL 2006255A NL 2006255 A NL2006255 A NL 2006255A NL 2006255 A NL2006255 A NL 2006255A NL 2006255 A NL2006255 A NL 2006255A
Authority
NL
Netherlands
Prior art keywords
substrate
radiation
lithographic apparatus
lens
individually controllable
Prior art date
Application number
NL2006255A
Other languages
English (en)
Inventor
Johannes Onvlee
Erwin Zwet
Pieter Jager
Erik Fritz
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2006255A publication Critical patent/NL2006255A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Claims (1)

  1. Een lithografieinrichting omvattende: een belichtinginrichting ingericht voor het leveren van een stralingsbundel; een drager geconstrueerd voor het dragen van een patroneerinrichting, welke patroneerinrichting in staat is een patroon aan te brengen in een doorsnede van de st ralingsbundel ter vorming van een gepatroneerde stralingsbundel; een substraattafel geconstrueerd om een substraat te dragen; en een projectieinrichting ingericht voor het projecteren van de gepatroneerde stralingsbundel op een doelgebied van het substraat, met het kenmerk, dat de substraattafel is ingericht voor het positioneren van het doelgebied van het substraat in een brandpuntsvlak van de projectieinrichting.
NL2006255A 2010-02-23 2011-02-18 Lithographic apparatus and device manufacturing method. NL2006255A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US30734310P 2010-02-23 2010-02-23
US30734310 2010-02-23

Publications (1)

Publication Number Publication Date
NL2006255A true NL2006255A (en) 2011-08-24

Family

ID=44065246

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2006255A NL2006255A (en) 2010-02-23 2011-02-18 Lithographic apparatus and device manufacturing method.

Country Status (6)

Country Link
JP (1) JP5584786B2 (nl)
KR (1) KR101496877B1 (nl)
CN (1) CN102782581B (nl)
NL (1) NL2006255A (nl)
TW (1) TWI505039B (nl)
WO (1) WO2011104177A1 (nl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2017892A (en) 2015-12-22 2017-06-28 Asml Netherlands Bv Topography measurement system
CN112034545B (zh) * 2020-09-29 2022-07-26 暨南大学 一种二维孔洞阵列光栅及光栅尺位移测量***
EP4231095A1 (de) * 2022-02-17 2023-08-23 In-Vision Technologies AG Projektionsvorrichtung

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
US5296891A (en) 1990-05-02 1994-03-22 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Illumination device
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
US5216247A (en) * 1992-02-07 1993-06-01 Ying Wang Optical scanning method with circular arc scanning traces
US5481392A (en) * 1993-12-21 1996-01-02 Minnesota Mining And Manufacturing Company Axial mirror scanner system and method
AU2048097A (en) 1997-01-29 1998-08-18 Micronic Laser Systems Ab Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
SE509062C2 (sv) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
AU2549899A (en) * 1998-03-02 1999-09-20 Nikon Corporation Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device
KR101295439B1 (ko) * 2004-01-16 2013-08-09 칼 짜이스 에스엠티 게엠베하 편광변조 광학소자
US7081947B2 (en) * 2004-02-27 2006-07-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007041239A (ja) * 2005-08-02 2007-02-15 Fujifilm Corp カラーフィルタの製造方法、及びカラーフィルタ並びに液晶表示装置
JP4883775B2 (ja) * 2006-08-11 2012-02-22 キヤノン株式会社 光学装置、露光装置及びデバイス製造方法
US20080049202A1 (en) * 2006-08-22 2008-02-28 Carl Zeiss Smt Ag Projection exposure apparatus for semiconductor lithography
DE102006039895A1 (de) * 2006-08-25 2008-03-13 Carl Zeiss Smt Ag Verfahren zur Korrektur von durch Intensitätsverteilungen in optischen Systemen erzeugten Abbildungsveränderungen sowie entsprechendes optisches System
DE102007027985A1 (de) * 2006-12-21 2008-06-26 Carl Zeiss Smt Ag Optisches System, insbesondere Beleuchtungseinrichtung oder Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
US7768627B2 (en) * 2007-06-14 2010-08-03 Asml Netherlands B.V. Illumination of a patterning device based on interference for use in a maskless lithography system
NL1035757A1 (nl) * 2007-08-02 2009-02-03 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
TWI531872B (zh) * 2008-09-22 2016-05-01 Ａｓｍｌ荷蘭公司 微影裝置、可程式化圖案化器件及微影方法

Also Published As

Publication number Publication date
TW201142536A (en) 2011-12-01
JP2013520818A (ja) 2013-06-06
JP5584786B2 (ja) 2014-09-03
TWI505039B (zh) 2015-10-21
WO2011104177A1 (en) 2011-09-01
KR101496877B1 (ko) 2015-03-02
KR20120123706A (ko) 2012-11-09
CN102782581A (zh) 2012-11-14
CN102782581B (zh) 2015-05-20

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Effective date: 20111110