NL2002935A1 - Object support positioning device and lithographic apparatus. - Google Patents

Object support positioning device and lithographic apparatus. Download PDF

Info

Publication number
NL2002935A1
NL2002935A1 NL2002935A NL2002935A NL2002935A1 NL 2002935 A1 NL2002935 A1 NL 2002935A1 NL 2002935 A NL2002935 A NL 2002935A NL 2002935 A NL2002935 A NL 2002935A NL 2002935 A1 NL2002935 A1 NL 2002935A1
Authority
NL
Netherlands
Prior art keywords
slider
object support
sliders
positioning device
cross
Prior art date
Application number
NL2002935A
Other languages
English (en)
Inventor
Edwin Buis
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2002935A1 publication Critical patent/NL2002935A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Machine Tool Units (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Details Of Measuring And Other Instruments (AREA)
NL2002935A 2008-06-27 2009-05-27 Object support positioning device and lithographic apparatus. NL2002935A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12946108P 2008-06-27 2008-06-27

Publications (1)

Publication Number Publication Date
NL2002935A1 true NL2002935A1 (nl) 2009-12-29

Family

ID=41446989

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2002935A NL2002935A1 (nl) 2008-06-27 2009-05-27 Object support positioning device and lithographic apparatus.

Country Status (3)

Country Link
US (1) US8279408B2 (nl)
JP (1) JP4977174B2 (nl)
NL (1) NL2002935A1 (nl)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH519661A (de) * 1969-08-21 1972-02-29 Oerlikon Buehrle Ag Hydrostatisches Gleitlager
JPS566919A (en) * 1979-06-26 1981-01-24 Canon Inc Fluid bearing
JPS63172988A (ja) * 1987-01-12 1988-07-16 キヤノン株式会社 移動機構
JPS63231019A (ja) 1987-03-19 1988-09-27 Canon Inc 静圧軸受装置
WO1998028665A1 (en) 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
US5815246A (en) * 1996-12-24 1998-09-29 U.S. Philips Corporation Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device
JP3626504B2 (ja) 1997-03-10 2005-03-09 アーエスエム リソグラフィ ベスローテン フェンノートシャップ ２個の物品ホルダを有する位置決め装置
US5971614A (en) * 1997-09-08 1999-10-26 Aesop, Inc. Modular hydrostatic bearing with carriage form-fit to PR
DE69926753T2 (de) * 1998-06-17 2006-01-19 Nikon Corp. Statischdrucklager,dieses verwendende einrichtung und optisches gerät versehen mit solch einer einrichtung
JP2001143984A (ja) 1999-11-16 2001-05-25 Canon Inc 位置決め装置
DE60032568T2 (de) * 1999-12-01 2007-10-04 Asml Netherlands B.V. Positionierungsapparat und damit versehener lithographischer Apparat
TWI264617B (en) * 1999-12-21 2006-10-21 Asml Netherlands Bv Balanced positioning system for use in lithographic apparatus
US20040252287A1 (en) * 2003-06-11 2004-12-16 Michael Binnard Reaction frame assembly that functions as a reaction mass
TWI288306B (en) * 2003-11-05 2007-10-11 Asml Netherlands Bv Lithographic apparatus and method for manufacturing a lithographic device

Also Published As

Publication number Publication date
JP2010067949A (ja) 2010-03-25
JP4977174B2 (ja) 2012-07-18
US20090323038A1 (en) 2009-12-31
US8279408B2 (en) 2012-10-02

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
WDAP Patent application withdrawn

Effective date: 20100504