NL183679C - Vloeibaarkristal-afbeeldinrichting. - Google Patents

Vloeibaarkristal-afbeeldinrichting.

Info

Publication number
NL183679C
NL183679C NLAANVRAGE7714154,A NL7714154A NL183679C NL 183679 C NL183679 C NL 183679C NL 7714154 A NL7714154 A NL 7714154A NL 183679 C NL183679 C NL 183679C
Authority
NL
Netherlands
Prior art keywords
liquid crystal
image device
crystal image
liquid
image
Prior art date
Application number
NLAANVRAGE7714154,A
Other languages
English (en)
Other versions
NL183679B (nl
NL7714154A (nl
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of NL7714154A publication Critical patent/NL7714154A/nl
Publication of NL183679B publication Critical patent/NL183679B/nl
Application granted granted Critical
Publication of NL183679C publication Critical patent/NL183679C/nl

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136277—Active matrix addressed cells formed on a semiconductor substrate, e.g. of silicon
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • G02F2201/123—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode pixel
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/02—Function characteristic reflective
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
NLAANVRAGE7714154,A 1976-12-20 1977-12-20 Vloeibaarkristal-afbeeldinrichting. NL183679C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/752,037 US4103297A (en) 1976-12-20 1976-12-20 Light-insensitive matrix addressed liquid crystal display system

Publications (3)

Publication Number Publication Date
NL7714154A NL7714154A (nl) 1978-06-22
NL183679B NL183679B (nl) 1988-07-18
NL183679C true NL183679C (nl) 1988-12-16

Family

ID=25024582

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7714154,A NL183679C (nl) 1976-12-20 1977-12-20 Vloeibaarkristal-afbeeldinrichting.

Country Status (7)

Country Link
US (1) US4103297A (nl)
JP (1) JPS5820434B2 (nl)
DE (1) DE2755151C3 (nl)
FR (1) FR2374714A1 (nl)
GB (1) GB1541374A (nl)
IL (1) IL53260A (nl)
NL (1) NL183679C (nl)

Families Citing this family (76)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5848908B2 (ja) * 1978-01-20 1983-10-31 松下電器産業株式会社 画像表示装置およびその製造方法
US4257041A (en) * 1978-06-19 1981-03-17 Izon Corporation Electro optical display device
US4233603A (en) * 1978-11-16 1980-11-11 General Electric Company Multiplexed varistor-controlled liquid crystal display
US4239346A (en) * 1979-05-23 1980-12-16 Hughes Aircraft Company Compact liquid crystal display system
US4223308A (en) * 1979-07-25 1980-09-16 Northern Telecom Limited LCDs (Liquid crystal displays) controlled by thin film diode switches
JPS5694386A (en) * 1979-12-27 1981-07-30 Suwa Seikosha Kk Liquiddcrystal display unit
US4319239A (en) * 1980-05-27 1982-03-09 Hughes Aircraft Company CCD Capacitance modulation matrix for liquid crystal displays
EP0044618A3 (en) * 1980-06-19 1982-06-30 Itt Industries, Inc. Liquid crystal display devices
US4409724A (en) * 1980-11-03 1983-10-18 Texas Instruments Incorporated Method of fabricating display with semiconductor circuits on monolithic structure and flat panel display produced thereby
JPS57124785A (en) * 1981-01-27 1982-08-03 Seiko Instr & Electronics Semiconductor substrate for display body driving electrode
JPS582871A (ja) * 1981-06-29 1983-01-08 株式会社東芝 液晶表示装置
JPS5854679U (ja) * 1981-10-09 1983-04-13 セイコーインスツルメンツ株式会社 液晶表示装置
JPS58140781A (ja) * 1982-02-17 1983-08-20 株式会社日立製作所 画像表示装置
US4704002A (en) * 1982-06-15 1987-11-03 Matsushita Electric Industrial Co., Ltd. Dot matrix display panel with a thin film transistor and method of manufacturing same
JPS5949580A (ja) * 1982-09-14 1984-03-22 松下電器産業株式会社 マトリクス表示パネルの製造方法
JPS5910988A (ja) * 1982-07-12 1984-01-20 ホシデン株式会社 カラ−液晶表示器
HU186106B (en) * 1982-08-19 1985-06-28 Gabor David Display-hard copy unit cooperating with ancomputer or other information source
FR2551244B1 (fr) * 1983-08-26 1985-10-11 Thomson Csf Procede de fabrication d'un substrat pour dispositif a commande electrique et ecran de visualisation elabore a partir d'un tel substrat
US4698627A (en) * 1984-04-25 1987-10-06 Energy Conversion Devices, Inc. Programmable semiconductor switch for a light influencing display and method for making same
US4667189A (en) * 1984-04-25 1987-05-19 Energy Conversion Devices, Inc. Programmable semiconductor switch for a display matrix or the like and method for making same
FR2571878B1 (fr) * 1984-10-12 1987-10-16 Thomson Csf Dispositif de visualisation d'images
JPH061313B2 (ja) * 1985-02-06 1994-01-05 シャープ株式会社 液晶表示装置
US4699469A (en) * 1985-04-17 1987-10-13 International Business Machines Corporation Liquid crystal display
JPS62104066A (ja) * 1985-10-31 1987-05-14 Toshiba Corp 半導体保護装置
US4704559A (en) * 1986-02-25 1987-11-03 Seiko Instruments & Electronics Ltd. Matrix type multi-color display device
US4839707A (en) * 1987-08-27 1989-06-13 Hughes Aircraft Company LCMOS displays fabricated with implant treated silicon wafers
US6288561B1 (en) * 1988-05-16 2001-09-11 Elm Technology Corporation Method and apparatus for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus
US5042918A (en) * 1988-11-15 1991-08-27 Kabushiki Kaisha Toshiba Liquid crystal display device
US5022750A (en) * 1989-08-11 1991-06-11 Raf Electronics Corp. Active matrix reflective projection system
US5024524A (en) * 1989-08-11 1991-06-18 Raf Electronics Corp. Reflective image plane module
JP2604867B2 (ja) * 1990-01-11 1997-04-30 松下電器産業株式会社 反射型液晶表示デバイス
JP2875363B2 (ja) * 1990-08-08 1999-03-31 株式会社日立製作所 液晶表示装置
US7115902B1 (en) 1990-11-20 2006-10-03 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method for manufacturing the same
US5849601A (en) 1990-12-25 1998-12-15 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method for manufacturing the same
KR950013784B1 (ko) 1990-11-20 1995-11-16 가부시키가이샤 한도오따이 에네루기 겐큐쇼 반도체 전계효과 트랜지스터 및 그 제조방법과 박막트랜지스터
KR950001360B1 (ko) * 1990-11-26 1995-02-17 가부시키가이샤 한도오따이 에네루기 겐큐쇼 전기 광학장치와 그 구동방법
US7154147B1 (en) 1990-11-26 2006-12-26 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and driving method for the same
US8106867B2 (en) 1990-11-26 2012-01-31 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and driving method for the same
US7576360B2 (en) * 1990-12-25 2009-08-18 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device which comprises thin film transistors and method for manufacturing the same
US7098479B1 (en) 1990-12-25 2006-08-29 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method for manufacturing the same
EP0499979A3 (en) * 1991-02-16 1993-06-09 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device
JP2794499B2 (ja) 1991-03-26 1998-09-03 株式会社半導体エネルギー研究所 半導体装置の作製方法
US6778231B1 (en) 1991-06-14 2004-08-17 Semiconductor Energy Laboratory Co., Ltd. Electro-optical display device
US6975296B1 (en) 1991-06-14 2005-12-13 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method of driving the same
US5414442A (en) * 1991-06-14 1995-05-09 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method of driving the same
JP2845303B2 (ja) * 1991-08-23 1999-01-13 株式会社 半導体エネルギー研究所 半導体装置とその作製方法
JP2651972B2 (ja) * 1992-03-04 1997-09-10 株式会社半導体エネルギー研究所 液晶電気光学装置
US6693681B1 (en) 1992-04-28 2004-02-17 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method of driving the same
JP2814161B2 (ja) 1992-04-28 1998-10-22 株式会社半導体エネルギー研究所 アクティブマトリクス表示装置およびその駆動方法
US5461501A (en) * 1992-10-08 1995-10-24 Hitachi, Ltd. Liquid crystal substrate having 3 metal layers with slits offset to block light from reaching the substrate
US6686976B2 (en) 1992-10-08 2004-02-03 Hitachi, Ltd. Liquid crystal light valve and projection type display using same
US5477359A (en) * 1993-01-21 1995-12-19 Sharp Kabushiki Kaisha Liquid crystal projector having a vertical orientating polyimide film
US5396261A (en) * 1993-03-01 1995-03-07 Wah-Iii Technology Corporation Polysilicon gate bus with interspersed buffers for driving a row of pixels in an active matrix liquid crystal display
US5365355A (en) * 1993-03-10 1994-11-15 Wah-Iii Technology Corporation Light blocking, pixel enhancement and photocurrent reduction in active matrix liquid crystal displays
US7081938B1 (en) 1993-12-03 2006-07-25 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and method for manufacturing the same
JPH07302912A (ja) 1994-04-29 1995-11-14 Semiconductor Energy Lab Co Ltd 半導体装置
JP3105408B2 (ja) * 1994-10-19 2000-10-30 シャープ株式会社 液晶表示素子
JP2900229B2 (ja) * 1994-12-27 1999-06-02 株式会社半導体エネルギー研究所 半導体装置およびその作製方法および電気光学装置
US5834327A (en) * 1995-03-18 1998-11-10 Semiconductor Energy Laboratory Co., Ltd. Method for producing display device
JP3143592B2 (ja) * 1995-09-14 2001-03-07 キヤノン株式会社 表示装置
JP3604106B2 (ja) * 1995-09-27 2004-12-22 シャープ株式会社 液晶表示装置
TWI228625B (en) * 1995-11-17 2005-03-01 Semiconductor Energy Lab Display device
US6800875B1 (en) 1995-11-17 2004-10-05 Semiconductor Energy Laboratory Co., Ltd. Active matrix electro-luminescent display device with an organic leveling layer
US5940732A (en) 1995-11-27 1999-08-17 Semiconductor Energy Laboratory Co., Method of fabricating semiconductor device
US6294799B1 (en) * 1995-11-27 2001-09-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of fabricating same
TW309633B (nl) 1995-12-14 1997-07-01 Handotai Energy Kenkyusho Kk
US6225218B1 (en) 1995-12-20 2001-05-01 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and its manufacturing method
JP3725266B2 (ja) 1996-11-07 2005-12-07 株式会社半導体エネルギー研究所 配線形成方法
JP3856901B2 (ja) 1997-04-15 2006-12-13 株式会社半導体エネルギー研究所 表示装置
US6124912A (en) * 1997-06-09 2000-09-26 National Semiconductor Corporation Reflectance enhancing thin film stack in which pairs of dielectric layers are on a reflector and liquid crystal is on the dielectric layers
US6452652B1 (en) 1998-06-12 2002-09-17 National Semiconductor Corporation Light absorbing thin film stack in a light valve structure
US6300241B1 (en) 1998-08-19 2001-10-09 National Semiconductor Corporation Silicon interconnect passivation and metallization process optimized to maximize reflectance
US5982472A (en) * 1998-12-14 1999-11-09 National Semiconductor Corporation Self-aligned pixel with support pillars for a liquid crystal light valve
US6475836B1 (en) 1999-03-29 2002-11-05 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP4472073B2 (ja) * 1999-09-03 2010-06-02 株式会社半導体エネルギー研究所 表示装置及びその作製方法
TWI612689B (zh) * 2013-04-15 2018-01-21 半導體能源研究所股份有限公司 發光裝置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4836598B1 (nl) * 1969-09-05 1973-11-06
US4011653A (en) * 1971-08-23 1977-03-15 Tokyo Shibaura Electric Co., Ltd. Method for manufacturing a semiconductor integrated circuit including an insulating gate type semiconductor transistor
DE2345679A1 (de) * 1972-09-22 1974-04-04 Philips Nv Halbleiterkaltkathode
US3862360A (en) * 1973-04-18 1975-01-21 Hughes Aircraft Co Liquid crystal display system with integrated signal storage circuitry
US3824003A (en) * 1973-05-07 1974-07-16 Hughes Aircraft Co Liquid crystal display panel
US3882531A (en) * 1973-05-29 1975-05-06 Gen Electric Apparatus for sensing radiation and providing electrical read out
DE2553739A1 (de) * 1974-12-09 1976-06-10 Hughes Aircraft Co Transistorfeld zum ansteuern eines optischen mediums und verfahren zu dessen herstellung
US4024626A (en) * 1974-12-09 1977-05-24 Hughes Aircraft Company Method of making integrated transistor matrix for flat panel liquid crystal display

Also Published As

Publication number Publication date
DE2755151A1 (de) 1978-06-22
FR2374714A1 (fr) 1978-07-13
JPS5820434B2 (ja) 1983-04-22
JPS5377495A (en) 1978-07-08
NL183679B (nl) 1988-07-18
US4103297A (en) 1978-07-25
IL53260A (en) 1980-03-31
DE2755151B2 (de) 1979-09-20
GB1541374A (en) 1979-02-28
DE2755151C3 (de) 1980-06-12
FR2374714B1 (nl) 1984-08-10
NL7714154A (nl) 1978-06-22

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee