NL162313B - METHOD OF TREATING A SUBSTRATE OF GALLIUMARSENIDE. - Google Patents

METHOD OF TREATING A SUBSTRATE OF GALLIUMARSENIDE.

Info

Publication number
NL162313B
NL162313B NL7303954A NL7303954A NL162313B NL 162313 B NL162313 B NL 162313B NL 7303954 A NL7303954 A NL 7303954A NL 7303954 A NL7303954 A NL 7303954A NL 162313 B NL162313 B NL 162313B
Authority
NL
Netherlands
Prior art keywords
galliumarsenide
treating
substrate
Prior art date
Application number
NL7303954A
Other languages
Dutch (nl)
Other versions
NL162313C (en
NL7303954A (en
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00237060A external-priority patent/US3808072A/en
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of NL7303954A publication Critical patent/NL7303954A/xx
Publication of NL162313B publication Critical patent/NL162313B/en
Application granted granted Critical
Publication of NL162313C publication Critical patent/NL162313C/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604Chemical etching
    • H01L21/30612Etching of AIIIBV compounds
    • H01L21/30621Vapour phase etching
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02367Substrates
    • H01L21/0237Materials
    • H01L21/02387Group 13/15 materials
    • H01L21/02395Arsenides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02436Intermediate layers between substrates and deposited layers
    • H01L21/02439Materials
    • H01L21/02455Group 13/15 materials
    • H01L21/02463Arsenides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/02521Materials
    • H01L21/02538Group 13/15 materials
    • H01L21/02546Arsenides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02518Deposited layers
    • H01L21/0257Doping during depositing
    • H01L21/02573Conductivity type
    • H01L21/02576N-type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104Forming layers
    • H01L21/02365Forming inorganic semiconducting materials on a substrate
    • H01L21/02612Formation types
    • H01L21/02617Deposition types
    • H01L21/0262Reduction or decomposition of gaseous compounds, e.g. CVD
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
NL7303954A 1972-03-22 1973-03-21 METHOD FOR TREATING A SUBSTRATE OF GALLIUM ARSENIDE. NL162313C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US00237060A US3808072A (en) 1972-03-22 1972-03-22 In situ etching of gallium arsenide during vapor phase growth of epitaxial gallium arsenide
US24931172A 1972-05-01 1972-05-01

Publications (3)

Publication Number Publication Date
NL7303954A NL7303954A (en) 1973-09-25
NL162313B true NL162313B (en) 1979-12-17
NL162313C NL162313C (en) 1980-05-16

Family

ID=26930348

Family Applications (2)

Application Number Title Priority Date Filing Date
NL7303958A NL160989C (en) 1972-03-22 1973-03-21 SCHOTTKY COATING DIODE AND PROCEDURE FOR MANUFACTURING THEREOF.
NL7303954A NL162313C (en) 1972-03-22 1973-03-21 METHOD FOR TREATING A SUBSTRATE OF GALLIUM ARSENIDE.

Family Applications Before (1)

Application Number Title Priority Date Filing Date
NL7303958A NL160989C (en) 1972-03-22 1973-03-21 SCHOTTKY COATING DIODE AND PROCEDURE FOR MANUFACTURING THEREOF.

Country Status (6)

Country Link
JP (2) JPS5232831B2 (en)
FR (2) FR2176998B1 (en)
GB (2) GB1425101A (en)
IT (2) IT979892B (en)
NL (2) NL160989C (en)
SE (2) SE375557B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5244582A (en) * 1975-10-06 1977-04-07 New Japan Radio Co Ltd Semiconductor device and process for production of the same
JPS55114620A (en) * 1979-02-22 1980-09-04 Yoshio Kaneda Driver's cab on tractor or the like
JPS56169331A (en) * 1980-05-30 1981-12-26 Nec Corp Vapor phase etching method for compound semiconductor
JPS5770810A (en) * 1980-10-17 1982-05-01 Lion Corp Cosmetic for hair
JPS60222410A (en) * 1984-04-20 1985-11-07 Asahi Denka Kogyo Kk Shampoo composition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4916231A (en) * 1972-06-06 1974-02-13

Also Published As

Publication number Publication date
DE2313768B2 (en) 1975-11-20
FR2176999A1 (en) 1973-11-02
IT982897B (en) 1974-10-21
NL160989C (en) 1979-12-17
NL162313C (en) 1980-05-16
NL7303954A (en) 1973-09-25
FR2176999B1 (en) 1978-03-03
SE375557B (en) 1975-04-21
GB1425101A (en) 1976-02-18
DE2313768A1 (en) 1973-10-04
NL160989B (en) 1979-07-16
FR2176998A1 (en) 1973-11-02
JPS5433711B2 (en) 1979-10-22
FR2176998B1 (en) 1976-11-05
JPS4948281A (en) 1974-05-10
JPS5019367A (en) 1975-02-28
JPS5232831B2 (en) 1977-08-24
GB1425102A (en) 1976-02-18
NL7303958A (en) 1973-09-25
SE388972B (en) 1976-10-18
IT979892B (en) 1974-09-30

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee