NL1033024A1 - Interferometer met geringe afwijking ('walk-off'). - Google Patents

Interferometer met geringe afwijking ('walk-off').

Info

Publication number
NL1033024A1
NL1033024A1 NL1033024A NL1033024A NL1033024A1 NL 1033024 A1 NL1033024 A1 NL 1033024A1 NL 1033024 A NL1033024 A NL 1033024A NL 1033024 A NL1033024 A NL 1033024A NL 1033024 A1 NL1033024 A1 NL 1033024A1
Authority
NL
Netherlands
Prior art keywords
interferometer
walk
slight deviation
slight
deviation
Prior art date
Application number
NL1033024A
Other languages
English (en)
Other versions
NL1033024C2 (nl
Inventor
William Clay Schluchter
Original Assignee
Agilent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agilent Technologies Inc filed Critical Agilent Technologies Inc
Publication of NL1033024A1 publication Critical patent/NL1033024A1/nl
Application granted granted Critical
Publication of NL1033024C2 publication Critical patent/NL1033024C2/nl

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02018—Multipass interferometers, e.g. double-pass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007—Two or more frequencies or sources used for interferometric measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02021—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different faces of object, e.g. opposite faces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02041—Interferometers characterised by particular imaging or detection techniques
    • G01B9/02045—Interferometers characterised by particular imaging or detection techniques using the Doppler effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
NL1033024A 2005-12-09 2006-12-08 Interferometer met geringe afwijking ('walk-off'). NL1033024C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/297,968 US7362447B2 (en) 2004-02-20 2005-12-09 Low walk-off interferometer
US29796805 2005-12-09

Publications (2)

Publication Number Publication Date
NL1033024A1 true NL1033024A1 (nl) 2007-06-12
NL1033024C2 NL1033024C2 (nl) 2009-07-21

Family

ID=38056191

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1033024A NL1033024C2 (nl) 2005-12-09 2006-12-08 Interferometer met geringe afwijking ('walk-off').

Country Status (5)

Country Link
US (1) US7362447B2 (nl)
JP (1) JP2007163479A (nl)
CN (1) CN1979086A (nl)
DE (1) DE102006042007A1 (nl)
NL (1) NL1033024C2 (nl)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8693006B2 (en) * 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
DE102007018115B4 (de) * 2006-05-16 2009-09-24 Vistec Semiconductor Systems Gmbh Verfahren zum Steigern der Messgenauigkeit beim Bestimmen der Koordinaten von Strukturen auf einem Substrat
SG172681A1 (en) * 2006-06-09 2011-07-28 Nikon Corp Movable-body apparatus, exposure apparatus, exposure method, and device manufacturing method
EP2364553A2 (de) * 2008-11-24 2011-09-14 Carl Zeiss Optronics GmbH Stereokameraeinrichtungen, verfahren zur fortlaufenden automatischen kalibrierung einer stereokameraeinrichtung, computerprogramm, computerprogrammprodukt und überwachungsvorrichtung für windkraftanlagen, gebäude mit transparenten bereichen, start- und landebahnen und/oder flugkorridore von flughäfen
DE102012201393A1 (de) * 2012-02-01 2013-08-01 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung und Anordnung mit mehreren Positionsmesseinrichtungen
JP6206295B2 (ja) * 2014-03-29 2017-10-04 株式会社Ｊｖｃケンウッド 傾き調整機構を備えた光学機器及び傾き調整方法
CN107255451B (zh) * 2017-07-07 2023-07-18 浙江理工大学 角度补偿式激光外差干涉位移测量装置及方法
TWI641805B (zh) * 2018-04-02 2018-11-21 國立雲林科技大學 Laser interference calibrator

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5117303B1 (nl) * 1970-12-30 1976-06-01
SE354115B (nl) * 1971-10-13 1973-02-26 Lasergruppen Konsuit Ab
US4891526A (en) 1986-12-29 1990-01-02 Hughes Aircraft Company X-Y-θ-Z positioning stage
US5151749A (en) * 1989-06-08 1992-09-29 Nikon Corporation Method of and apparatus for measuring coordinate position and positioning an object
JP3164960B2 (ja) 1994-02-18 2001-05-14 キヤノン株式会社 ステージ装置
US6020407A (en) 1995-11-07 2000-02-01 Rheox, Inc. Super dispersable thickening composition for aqueous systems and a method of thickening said aqueous systems
US6020964A (en) * 1997-12-02 2000-02-01 Asm Lithography B.V. Interferometer system and lithograph apparatus including an interferometer system
US6208407B1 (en) 1997-12-22 2001-03-27 Asm Lithography B.V. Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
JP3413122B2 (ja) * 1998-05-21 2003-06-03 キヤノン株式会社 位置決め装置及びこれを用いた露光装置並びにデバイス製造方法
TW490596B (en) 1999-03-08 2002-06-11 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
EP1285222A4 (en) 2000-05-17 2006-11-15 Zygo Corp INTERFEROMETRIC DEVICE AND INTERFEROMETRIC PROCEDURE
US7130056B2 (en) * 2004-02-20 2006-10-31 Agilent Technologies, Inc. System and method of using a side-mounted interferometer to acquire position information

Also Published As

Publication number Publication date
CN1979086A (zh) 2007-06-13
JP2007163479A (ja) 2007-06-28
US7362447B2 (en) 2008-04-22
NL1033024C2 (nl) 2009-07-21
US20060087659A1 (en) 2006-04-27
DE102006042007A1 (de) 2007-06-14

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Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
RD2N Patents in respect of which a decision has been taken or a report has been made (novelty report)

Effective date: 20090317

PD2B A search report has been drawn up
V1 Lapsed because of non-payment of the annual fee

Effective date: 20100701