NL1012854A1 - Sulphony oximes for i-line photoresists with a high sensitivity and a large resist thickness. - Google Patents

Sulphony oximes for i-line photoresists with a high sensitivity and a large resist thickness.

Info

Publication number
NL1012854A1
NL1012854A1 NL1012854A NL1012854A NL1012854A1 NL 1012854 A1 NL1012854 A1 NL 1012854A1 NL 1012854 A NL1012854 A NL 1012854A NL 1012854 A NL1012854 A NL 1012854A NL 1012854 A1 NL1012854 A1 NL 1012854A1
Authority
NL
Netherlands
Prior art keywords
sulphony
oximes
high sensitivity
resist thickness
large resist
Prior art date
Application number
NL1012854A
Other languages
Dutch (nl)
Other versions
NL1012854C2 (en
Inventor
Toshikage Asakura
Hartmut Bleier
Christoph De Leo
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Publication of NL1012854A1 publication Critical patent/NL1012854A1/en
Application granted granted Critical
Publication of NL1012854C2 publication Critical patent/NL1012854C2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07H—SUGARS; DERIVATIVES THEREOF; NUCLEOSIDES; NUCLEOTIDES; NUCLEIC ACIDS
    • C07H9/00—Compounds containing a hetero ring sharing at least two hetero atoms with a saccharide radical
    • C07H9/02—Compounds containing a hetero ring sharing at least two hetero atoms with a saccharide radical the hetero ring containing only oxygen as ring hetero atoms
    • C07H9/04—Cyclic acetals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • General Health & Medical Sciences (AREA)
  • Biotechnology (AREA)
  • Biochemistry (AREA)
  • Genetics & Genomics (AREA)
  • Molecular Biology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Filters (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NL1012854A 1998-08-18 1999-08-18 Sulphony oximes for i-line photoresists with a high sensitivity and a large resist thickness. NL1012854C2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP98810796 1998-08-18
EP98810796 1998-08-18

Publications (2)

Publication Number Publication Date
NL1012854A1 true NL1012854A1 (en) 2000-02-21
NL1012854C2 NL1012854C2 (en) 2000-12-19

Family

ID=8236258

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1012854A NL1012854C2 (en) 1998-08-18 1999-08-18 Sulphony oximes for i-line photoresists with a high sensitivity and a large resist thickness.

Country Status (17)

Country Link
JP (1) JP2000066385A (en)
KR (1) KR20000017347A (en)
CN (1) CN1246655A (en)
AU (1) AU4452799A (en)
BE (1) BE1012410A3 (en)
BR (1) BR9903726A (en)
CA (1) CA2280365A1 (en)
DE (1) DE19938796A1 (en)
DK (1) DK199901098A (en)
ES (1) ES2155799B1 (en)
FI (1) FI19991731A (en)
FR (1) FR2782560A1 (en)
GB (1) GB2340494A (en)
IT (1) IT1313611B1 (en)
NL (1) NL1012854C2 (en)
SE (1) SE9902913L (en)
SG (1) SG80060A1 (en)

Families Citing this family (173)

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US6482567B1 (en) * 2000-08-25 2002-11-19 Shipley Company, L.L.C. Oxime sulfonate and N-oxyimidosulfonate photoacid generators and photoresists comprising same
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CN105607417A (en) * 2015-12-30 2016-05-25 苏州瑞红电子化学品有限公司 Coumarin-based sulphonate photo-acid generator and preparation method therefor
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JPWO2022059706A1 (en) 2020-09-18 2022-03-24
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JPWO2022130773A1 (en) 2020-12-17 2022-06-23
CN112650024B (en) * 2020-12-17 2023-08-01 江苏艾森半导体材料股份有限公司 High-film-thickness negative photoresist applied to chip packaging technology
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JPWO2022210175A1 (en) 2021-03-29 2022-10-06
WO2023032545A1 (en) 2021-08-31 2023-03-09 富士フイルム株式会社 Cured product production method, laminate production method, semiconductor device manufacturing method, and processing liquid
JPWO2023054142A1 (en) 2021-09-29 2023-04-06
EP4410902A1 (en) 2021-09-30 2024-08-07 FUJIFILM Corporation Method for producing magnetic particle-containing composition, magnetic particle-containing composition, magnetic particle-containing cured product, magnetic particle-introduced substrate, and electronic material
WO2023054324A1 (en) 2021-09-30 2023-04-06 富士フイルム株式会社 Head-up display system and transport
JPWO2023080115A1 (en) 2021-11-05 2023-05-11
JP7354479B1 (en) 2021-12-23 2023-10-02 富士フイルム株式会社 Method for manufacturing a bonded body, method for manufacturing a bonded body, a laminate, a method for manufacturing a laminate, a device, a device, and a composition for forming a polyimide-containing precursor portion

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
GB8608528D0 (en) * 1986-04-08 1986-05-14 Ciba Geigy Ag Production of positive images
KR900005226A (en) * 1988-09-29 1990-04-13 윌리엄 비이 해리스 Photosensitive composition and method of producing positive and negative phases
JPH07159992A (en) * 1993-12-07 1995-06-23 Hitachi Ltd Pattern forming material and pattern forming method
JP3587413B2 (en) * 1995-12-20 2004-11-10 東京応化工業株式会社 Chemically amplified resist composition and acid generator used therein
WO1998010335A1 (en) * 1996-09-02 1998-03-12 Ciba Specialty Chemicals Holding Inc. Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity
JP3053072B2 (en) * 1996-09-10 2000-06-19 東京応化工業株式会社 Resist laminate and pattern forming method using the same
JP3655030B2 (en) * 1996-12-10 2005-06-02 東京応化工業株式会社 Negative chemically amplified resist composition

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