MY197819A - Photomask-forming substrate and method of manufacturing photomask-forming substrate - Google Patents
Photomask-forming substrate and method of manufacturing photomask-forming substrateInfo
- Publication number
- MY197819A MY197819A MYPI2018001109A MYPI2018001109A MY197819A MY 197819 A MY197819 A MY 197819A MY PI2018001109 A MYPI2018001109 A MY PI2018001109A MY PI2018001109 A MYPI2018001109 A MY PI2018001109A MY 197819 A MY197819 A MY 197819A
- Authority
- MY
- Malaysia
- Prior art keywords
- photomask
- forming substrate
- face
- manufacturing
- roughness
- Prior art date
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
A photomask-forming substrate (1), which has at least a main surface (2) and an end face (3), has high cleanliness on the main surface (2), and dust generation from the end face (3) made non-specular can be suppressed. The end face (3) of the photomask-forming substrate (1) is convex with twisted-positioned vertices. A method of manufacturing the photomask-forming substrate (1) is provided. In this photomask-forming substrate (1), roughness of an arithmetic mean height of a line at the end face (3) is not less than 0.05 ?m and not more than 0.5 ?m, and roughness of an arithmetic mean height of any 10 ?m square area of a surface on the end face (3) is not less than 0.001 ?m and not more than 0.015 ?m. Fig. 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017126625A JP2019008254A (en) | 2017-06-28 | 2017-06-28 | Substrate for photomask and manufacturing method therefor |
| JP2017128630A JP6727170B2 (en) | 2017-06-30 | 2017-06-30 | Substrate for photomask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY197819A true MY197819A (en) | 2023-07-18 |
Family
ID=87663369
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2018001109A MY197819A (en) | 2017-06-28 | 2018-06-26 | Photomask-forming substrate and method of manufacturing photomask-forming substrate |
Country Status (1)
| Country | Link |
|---|---|
| MY (1) | MY197819A (en) |
-
2018
- 2018-06-26 MY MYPI2018001109A patent/MY197819A/en unknown
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