MY191633A - Sputtering target for forming magnetic recording film and method for producing same - Google Patents

Sputtering target for forming magnetic recording film and method for producing same

Info

Publication number
MY191633A
MY191633A MYPI2019002518A MYPI2019002518A MY191633A MY 191633 A MY191633 A MY 191633A MY PI2019002518 A MYPI2019002518 A MY PI2019002518A MY PI2019002518 A MYPI2019002518 A MY PI2019002518A MY 191633 A MY191633 A MY 191633A
Authority
MY
Malaysia
Prior art keywords
sputtering target
magnetic recording
recording film
producing same
forming magnetic
Prior art date
Application number
MYPI2019002518A
Inventor
Shin-Ichi Ogino
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY191633A publication Critical patent/MY191633A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/04—Alloys based on a platinum group metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C2202/00—Physical properties
    • C22C2202/02—Magnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)

Abstract

A C-containing FePt-based sputtering target for forming a magnetic recording film, wherein an average thickness of an Fe-Pt alloy phase in a polished surface of a cross section vertical to a sputtering surface is 10 ?m or more. An object of this invention is to provide a ferromagnetic material sputtering target capable of suppressing the generation of particles caused by an abnormal discharge during sputtering. (Fig. 1)
MYPI2019002518A 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same MY191633A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013241537 2013-11-22

Publications (1)

Publication Number Publication Date
MY191633A true MY191633A (en) 2022-07-04

Family

ID=53179455

Family Applications (2)

Application Number Title Priority Date Filing Date
MYPI2016701306A MY177997A (en) 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same
MYPI2019002518A MY191633A (en) 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same

Family Applications Before (1)

Application Number Title Priority Date Filing Date
MYPI2016701306A MY177997A (en) 2013-11-22 2014-11-14 Sputtering target for forming magnetic recording film and method for producing same

Country Status (6)

Country Link
JP (2) JP6125661B2 (en)
CN (2) CN105793465B (en)
MY (2) MY177997A (en)
SG (1) SG11201602163YA (en)
TW (1) TWI642799B (en)
WO (1) WO2015076190A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023079857A1 (en) * 2021-11-05 2023-05-11 Ｊｘ金属株式会社 Fe-Pt-C-BASED SPUTTERING TARGET MEMBER, SPUTTERING TARGET ASSEMBLY, METHOD FOR FORMING FILM, AND METHOD FOR PRODUCING SPUTTERING TARGET MEMBER

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2610575B2 (en) * 1993-11-25 1997-05-14 株式会社 ジャパンエナジー W-Ti alloy target
US20070189916A1 (en) * 2002-07-23 2007-08-16 Heraeus Incorporated Sputtering targets and methods for fabricating sputtering targets having multiple materials
KR100470151B1 (en) * 2002-10-29 2005-02-05 한국과학기술원 HIGH-DENSITY MAGNETIC RECORDING MEDIA USING FePtC FILM AND MANUFACTURING METHOD THEREOF
JP5590322B2 (en) * 2010-11-12 2014-09-17 三菱マテリアル株式会社 Sputtering target for forming a magnetic recording medium film and method for producing the same
CN102087858B (en) * 2010-11-26 2012-07-18 山西师范大学 Gradient composite magnetic recording media and preparation method thereof
SG189255A1 (en) * 2010-12-20 2013-05-31 Jx Nippon Mining & Metals Corp Fe-pt-based sputtering target with dispersed c grains
JP5041262B2 (en) * 2011-01-31 2012-10-03 三菱マテリアル株式会社 Sputtering target for forming a magnetic recording medium film and method for producing the same
JP5912559B2 (en) * 2011-03-30 2016-04-27 田中貴金属工業株式会社 Method for producing FePt-C sputtering target
CN103717781B (en) * 2011-09-26 2016-02-24 吉坤日矿日石金属株式会社 Fe-Pt-C type sputtering target
JP6212419B2 (en) * 2014-03-17 2017-10-11 株式会社Ｓｕｂａｒｕ Engine exhaust condensate drainage device

Also Published As

Publication number Publication date
TWI642799B (en) 2018-12-01
JP6125661B2 (en) 2017-05-17
CN105793465A (en) 2016-07-20
TW201531575A (en) 2015-08-16
CN105793465B (en) 2019-03-22
CN109943814A (en) 2019-06-28
WO2015076190A1 (en) 2015-05-28
JP6484276B2 (en) 2019-03-13
CN109943814B (en) 2021-04-20
MY177997A (en) 2020-09-29
SG11201602163YA (en) 2016-04-28
JPWO2015076190A1 (en) 2017-03-16
JP2017197840A (en) 2017-11-02

Similar Documents

Publication Publication Date Title
MY166492A (en) Sputtering target for forming magnetic recording film and process for producing same
MY182369A (en) Aluminum alloy substrate for magnetic disk
MY157110A (en) Sputtering target for magnetic recording film and method for producing same
MY169260A (en) Fe-pt-based magnetic materials sintered compact
MY186238A (en) Ferromagnetic material sputtering target
MY172839A (en) Fept-c-based sputtering target and method for manufacturing same
MY179890A (en) Sputtering target for magnetic recording film formation and production method therefor
SG11201903540XA (en) Magnetic thin film deposition chamber and thin film deposition apparatus
MY160775A (en) Ferromagnetic material sputtering target
MY169053A (en) Magnetic material sputtering target and manufacturing method for same
SG11201701836YA (en) Sputtering target for forming magnetic recording film and method for producing same
MY175025A (en) Fe-pt based sintered compact sputtering target and manufacturing method therefor
SG11201609093UA (en) Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium
SG10202111088SA (en) Non-magnetic substrate for magnetic disk, and magnetic disk
MY185389A (en) Sputtering target containing co or fe
SG11201600474SA (en) Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, SOFT MAGNETIC THIN FILM LAYER, AND VERTICAL MAGNETIC RECORDING MEDIUM PRODUCED USING SAID SOFT MAGNETIC THIN FILM LAYER
EP3401933A4 (en) Mn-Bi-BASED MAGNETIC POWDER, METHOD FOR PRODUCING SAME, COMPOUND FOR BOND MAGNET, BOND MAGNET, Mn-Bi-BASED METAL MAGNET AND METHOD FOR PRODUCING SAME
MX2013012200A (en) High power impulse magnetron sputtering method providing enhanced ionization of the sputtered particles and apparatus for its implementation.
MY184033A (en) Sputtering target for forming magnetic thin film
MY191633A (en) Sputtering target for forming magnetic recording film and method for producing same
SG11201408794VA (en) Fe-Co ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING SAME, AND SOFT MAGNETIC THIN FILM LAYER AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING SAME
MY183150A (en) Protective layer for a magnetic recording medium, and a method of manufacturing the same
MY191374A (en) Magnetic material sputtering target and method for manufacturing same
EP3756200A4 (en) Magnetocaloric alloys useful for magnetic refrigeration applications
MY179241A (en) Sputtering target