MY184023A - Sputtering target for magnetic recording medium, and magnetic thin film - Google Patents

Sputtering target for magnetic recording medium, and magnetic thin film

Info

Publication number
MY184023A
MY184023A MYPI2018702557A MYPI2018702557A MY184023A MY 184023 A MY184023 A MY 184023A MY PI2018702557 A MYPI2018702557 A MY PI2018702557A MY PI2018702557 A MYPI2018702557 A MY PI2018702557A MY 184023 A MY184023 A MY 184023A
Authority
MY
Malaysia
Prior art keywords
sputtering target
recording medium
magnetic recording
thin film
magnetic
Prior art date
Application number
MYPI2018702557A
Inventor
Takashi Kosho
Original Assignee
Jx Nippon Mining & Metals Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jx Nippon Mining & Metals Corp filed Critical Jx Nippon Mining & Metals Corp
Publication of MY184023A publication Critical patent/MY184023A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
    • G11B5/658—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing oxygen, e.g. molecular oxygen or magnetic oxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
    • H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
    • H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
    • H01F10/16—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Powder Metallurgy (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

A sputtering target or a film containing 0.1 to 10 mol% of an oxide of one or more types of elements selected from Ca, K, Na, Pb, and Zn, 45 mol% or less of Cr, 45 mol% or less of Pt, and remainder being Co. An object of the present invention is to provide a sputtering target capable of considerably reducing the particles caused by oxides and significantly improving the yield during deposition. It is thereby possible to deposit a quality magnetic recording layer and improve the yield of a magnetic recording medium.
MYPI2018702557A 2016-02-19 2017-01-04 Sputtering target for magnetic recording medium, and magnetic thin film MY184023A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016030488 2016-02-19
PCT/JP2017/000021 WO2017141557A1 (en) 2016-02-19 2017-01-04 Sputtering target for magnetic recording medium, and magnetic thin film

Publications (1)

Publication Number Publication Date
MY184023A true MY184023A (en) 2021-03-17

Family

ID=59624963

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2018702557A MY184023A (en) 2016-02-19 2017-01-04 Sputtering target for magnetic recording medium, and magnetic thin film

Country Status (5)

Country Link
JP (2) JP6713489B2 (en)
CN (1) CN108699678B (en)
MY (1) MY184023A (en)
SG (1) SG11201805929XA (en)
WO (1) WO2017141557A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6971901B2 (en) * 2018-03-27 2021-11-24 Ｊｘ金属株式会社 Sputtering target
WO2021014760A1 (en) * 2019-07-23 2021-01-28 Ｊｘ金属株式会社 Sputtering target member for non-magnetic layer formation
JP2021193202A (en) * 2020-06-08 2021-12-23 三菱マテリアル株式会社 Sputtering target, manufacturing method of sputtering target, and optical function film

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3522944B2 (en) * 1996-01-26 2004-04-26 株式会社東芝 Magnetic recording media
JP2001014649A (en) * 1999-06-28 2001-01-19 Hitachi Ltd Platelike body, inorganic compound substrate, magnetic recording medium and magnetic storage device
JP2001250222A (en) * 2000-03-01 2001-09-14 Hitachi Ltd Magnetic recording medium, its producing method and magnetic recorder using the method
JP2002197633A (en) * 2000-12-22 2002-07-12 Sony Corp Magnetic recording medium
JP2004206805A (en) * 2002-12-25 2004-07-22 Fuji Electric Device Technology Co Ltd Magnetic recording medium and its manufacturing method
JP4188196B2 (en) * 2003-10-06 2008-11-26 株式会社東芝 Perpendicular magnetic recording medium, manufacturing method thereof, and magnetic recording / reproducing apparatus using the same
WO2005034095A1 (en) * 2003-10-06 2005-04-14 Kabushiki Kaisha Toshiba Perpendicular magnetic recording medium, manufacturing method therefor, and magnetic read/write apparatus using the same
CN101685776B (en) * 2008-09-27 2011-10-05 中国科学院半导体研究所 Method for improving ohmic contact of ZnO film
US20110253926A1 (en) * 2008-12-26 2011-10-20 Mitsui Mining & Smelting Co., Ltd. Sputtering Target and Method of Forming Film
JP5660710B2 (en) * 2010-08-03 2015-01-28 昭和電工株式会社 Target manufacturing method, magnetic recording medium manufacturing method
JP5888664B2 (en) * 2010-12-20 2016-03-22 Ｊｘ金属株式会社 Ferromagnetic sputtering target
JP5876138B2 (en) * 2012-03-15 2016-03-02 Ｊｘ金属株式会社 Magnetic material sputtering target and manufacturing method thereof
JP2016193797A (en) * 2013-09-13 2016-11-17 旭硝子株式会社 Float glass manufacturing apparatus, and float glass manufacturing method using the apparatus
JP6005767B2 (en) * 2014-01-17 2016-10-12 Ｊｘ金属株式会社 Sputtering target for magnetic recording media

Also Published As

Publication number Publication date
JP6881643B2 (en) 2021-06-02
CN108699678B (en) 2020-12-08
CN108699678A (en) 2018-10-23
JP2020147851A (en) 2020-09-17
JPWO2017141557A1 (en) 2018-10-18
JP6713489B2 (en) 2020-06-24
SG11201805929XA (en) 2018-08-30
WO2017141557A1 (en) 2017-08-24

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